US4600600A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for the galvanic manufacture of metallic bump-like lead contacts
Assignee: Siemens AG
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Filing: 1984-10-29
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Granted: 1986-07-15
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Expires: 2004-10-29
Abstract
Abstract A method of galvanic manufacture of bump-like lead contacts of semiconductor components. The lead contacts are formed of etchable metals having a surface coating of gold. The gold is chemically deposited onto the lead contacts in a first and in a second work step. In the first work step, the deposition occurs to a thickness of 10 to 200 nm, and in the second work step to a thickness of 50 to 200 nm. Etching processes and a tempering occur between the two work steps. The surface layer applied in the first work step is employed during the etching processes as an etching mask for the lead contacts. This surface layer then diffuses into the lead contacts during the tempering. The solderablity of the lead contacts is thus preserved over a longer than usual time span (factor of 20).
Inventors
- 👤 Erich Pammer
- 👤 Otfried Bischofberger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 16:13
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/46; H10P14/47; H10W; H10W72/00; H10W72/01; H10W72/012; H10W72/019; H10W72/20; H10W72/251; H10W72/90; H10W72/921; H10W72/923; H10W72/951; H10W72/952
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
197 words
In a method for galvanic manufacture of bump-like lead contacts on a semiconductor circuit, and wherein the lead contacts are formed of an etchable metal having a surface coating of gold, and wherein under the bump-like lead contacts a thin, metallic layer sequence is provided as an adhesion layer and diffusion barrier between the lead contacts and a surface of the semiconductor circuit, wherein the improvement comprises: after forming the metallic layer sequence on the surface of the semiconductor circuit, electrodepositing the bump-like lead contacts on the thin, metallic layer sequence, and thereafter applying a first coating of gold on the bump-like lead contacts; employing the first gold coating as an etching protection for a subsequent etching to remove portions of the thin, metallic layer sequence not lying beneath the bump-like lead contacts; tempering the circuit and lead contacts so that the first gold layer diffuses into the bump-like lead contacts in a region of a surface of the lead contacts; and providing a second gold layer on the lead contacts, said second gold layer being substantially prevented from diffusing into the lead contacts by the diffused-in first gold layer near the surface of the lead contacts.
Claim 2
Dependent Claim
197 words
In a method for galvanic manufacture of bump-like lead contacts on a semiconductor circuit, and wherein the lead contacts are formed of an etchable metal having a surface coating of gold, and wherein under the bump-like lead contacts a thin, metallic layer sequence is provided as an adhesion layer and diffusion barrier between the lead contacts and a surface of the semiconductor circuit, wherein the improvement comprises: after forming the metallic layer sequence on the surface of the semiconductor circuit, electrodepositing the bump-like lead contacts on the thin, metallic layer sequence, and thereafter applying a first coating of gold on the bump-like lead contacts; employing the first gold coating as an etching protection for a subsequent etching to remove portions of the thin, metallic layer sequence not lying beneath the bump-like lead contacts; tempering the circuit and lead contacts so that the first gold layer diffuses into the bump-like lead contacts in a region of a surface of the lead contacts; and providing a second gold layer on the lead contacts, said second gold layer being substantially prevented from diffusing into the lead contacts by the diffused-in first gold layer near the surface of the lead contacts.
Claim 3
Dependent Claim
37 words
A method according to claim 1 wherein the application of said first gold layer occurs in current-free manner by means of a chemical deposition onto said lead contacts and having a thickness of 10 to 200 nm.
Claim 4
Dependent Claim
27 words
A method according to claim 1 wherein said tempering occurs in a nitrogen forming gas atmosphere, whereby said first gold coating completely diffuses into said lead contacts.
Claim 5
Dependent Claim
23 words
A method according to claim 1 wherein said tempering ensues at 200° to 450° C. for a duration of 5 to 30 minutes.
Claim 6
Dependent Claim
34 words
A method according to claim 1 wherein the application of said second gold coating ensues current-free by means of chemical deposition onto said lead contacts and having a thickness of 50 to 200 nm.
Claim 7
Independent Claim
115 words
A method for galvanic manufacture of bump-like lead contacts on a semiconductor component, comprising the steps of: depositing a thin, metallic layer sequence as an adhesion layer and diffusion barrier on a surface of the semiconductor component; electro-depositing bump-like lead contacts on the metallic layer sequence; depositing a first coating of gold on the bump-like lead contacts; etching the metallic layer sequence at regions beyond the bump-like lead contacts while using the first gold coating as an etching protection; diffusing the first gold layer into the bump-like lead contacts; and providing a second gold layer on the lead contacts, said second gold layer preventing substantial in-diffusion of the second gold layer into the lead contacts.
Claim 8
Independent Claim
115 words
A method for galvanic manufacture of bump-like lead contacts on a semiconductor component, comprising the steps of: depositing a thin, metallic layer sequence as an adhesion layer and diffusion barrier on a surface of the semiconductor component; electro-depositing bump-like lead contacts on the metallic layer sequence; depositing a first coating of gold on the bump-like lead contacts; etching the metallic layer sequence at regions beyond the bump-like lead contacts while using the first gold coating as an etching protection; diffusing the first gold layer into the bump-like lead contacts; and providing a second gold layer on the lead contacts, said second gold layer preventing substantial in-diffusion of the second gold layer into the lead contacts.
Claim 9
Independent Claim
133 words
A method for the manufacture of terminal contacts of semiconductor components, comprising the steps of: providing on a semiconductor component a layer; voltaically applying an etchable metal on the layer as a terminal contact; applying a surface coating of gold on the etchable metal terminal contact; etching the thin metallic layer system by using the surface coating of gold for protecting the terminal contact during such etching; after the etching, tempering the semiconductor component with the etched layer sequence and terminal contact, the coating of gold diffusing into the terminal contact during the tempering; and applying another relatively thin coating of gold at a surface of the terminal contact so as to protect it against oxidation and corrosion which would otherwise occur due to the diffusing in of the first coating of gold.
Claim 10
Independent Claim
133 words
A method for the manufacture of terminal contacts of semiconductor components, comprising the steps of: providing on a semiconductor component a layer; voltaically applying an etchable metal on the layer as a terminal contact; applying a surface coating of gold on the etchable metal terminal contact; etching the thin metallic layer system by using the surface coating of gold for protecting the terminal contact during such etching; after the etching, tempering the semiconductor component with the etched layer sequence and terminal contact, the coating of gold diffusing into the terminal contact during the tempering; and applying another relatively thin coating of gold at a surface of the terminal contact so as to protect it against oxidation and corrosion which would otherwise occur due to the diffusing in of the first coating of gold.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-07-14 | 1990-01-13 | 1990-07-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-07-14 | 1994-01-13 | 1994-07-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-07-14 | 1998-01-13 | 1998-07-15 | $7700.00 | Window Closed / Lapsed |