Method and apparatus for evaporating a liquid organic metal

Claim 1

A bubbling evaporator for evaporating a liquid organic metal to be used in a vapor deposition process for manufacturing semiconductor devices and the like, said evaporator comprising: a vessel (11) in a constant temperature bath, a partition plate (11a) for dividing said vessel (11) into an upper chamber (11b) for temporarily storing carrier gas and a lower chamber (11c) for containing liquid (2), means for admitting carrier gas into the upper chamber, an inlet pipe (12 or 14) for allowing said carrier gas to blow from said upper chamber (11b) into said liquid (2) in said lower chamber (11c) through said partition plate (11a) to bubble and evaporate said liquid (2), wherein said inlet pipe (12) has an upper end located above said partition plate and within the upper chamber, said upper end terminating within an upper region of the upper chamber, and an outlet pipe (13) for leading the evaporated vapor together with said carrier gas to the exterior of said vessel (11).

Claim 5

A method of evaporating a liquid organic metal to be used in a vapor deposition process for manufacturing semiconductor devices and the like, comprising the steps of supplying a carrier gas into an upper chamber of a vessel containing liquid organic metal in a lower chamber thereof, said upper and lower chambers being maintained at substantially constant temperature; directing said carrier gas from the upper chamber so that the gas passes directly into said liquid organic metal to bubble upward through the liquid so that when the bubbles float up to the liquid surface metal vapor evaporated from the liquid is absorbed into the bubbles; and directing said bubbles containing evaporated liquid vapor from a region in the lower chamber formed above the liquid into an outlet pipe for carrying said bubbles to a vapor deposition station, wherein said step of supplying said carrier gas into the upper chamber includes the further step of directing said carrier gas into a bottom part of the upper chamber and allowing said gas to flow upwards in the upper chamber prior to being supplied to the lower chamber, said upward flow of gas allowing the gas a residence time in the upper chamber so as to approach the constant temperature.

Claim 6

A method of evaporating a liquid organic metal to be used in a vapor deposition process for manufacturing semiconductor devices and the like, comprising the steps of supplying a carrier gas into an upper chamber of a vessel containing liquid organic metal in a lower chamber thereof, said upper and lower chambers being maintained at substantially constant temperature; directing said carrier gas from the upper chamber so that the gas passes directly into said liquid organic metal to bubble upward through the liquid so that when the bubbles float up to the liquid surface metal vapor evaporated from the liquid is absorbed into the bubbles; and directing said bubbles containing evaporated liquid vapor from a region in the lower chamber formed above the liquid into an outlet pipe for carrying said bubbles to a vapor deposition station, wherein said step of supplying said carrier gas into the upper chamber includes the further step of directing said carrier gas into a bottom part of the upper chamber and allowing said gas to flow upwards in the upper chamber prior to being supplied to the lower chamber, said upward flow of gas allowing the gas a residence time in the upper chamber so as to approach the constant temperature.