US4584078A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing fine particles
Assignee: SHIGEHIRO OHNUMA
•
Filing: 1984-08-01
•
Granted: 1986-04-22
•
Expires: 2004-08-01
Abstract
Abstract A method of producing fine particles with a particle size of submicron or finer which comprises the steps of: forming closely fine projections on a substrate surface, preferably by sputter-etching using an ionized gas; and then sputtering metallic or non-metallic materials onto the thus treated substrate in an inert gas or a mixed gas of an inert gas and a reactive gas, such as oxygen, the gas pressure of the inert gas or the mixed gas being in the range of from 1x10-4 torr to 1x10-1 torr, and thereby depositing the purposed fine particles in crystalline or amorphous form. The invention method can successfully provide fine particles with desired properties, for example, in size, shape and structure, by adjusting producing conditions or selection of substrate materials and the thus obtained fine particles are very useful in various applications with or without the substrate.
Inventors
- 👤 Yukio Nakanouchi
- 👤 Shigehiro Ohnuma
- 👤 Tsuyoshi Masumoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 23:58
CPC Classifications
H; H01; H01F; H01F41/00; H01F41/14; H01F41/18; B; B22; B22F; B22F9/00; B22F9/002; B22F9/008; B22F9/02; B22F9/14; C; C23; C23C; C23C14/00; C23C14/0005; C23C14/0021; C23C14/0036; C23C14/02; C23C14/021; C23C14/022; C23C14/22; C23C14/34; G; G11; G11B; G11B5/00; G11B5/62; G11B5/68; G11B5/70; G11B5/714; H01F1/00; H01F1/01; H01F1/03; H01F1/12; H01F1/14; H01F1/147; H01F1/153; H01F1/15341; H01F1/1535; H01F1/15358
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
117 words
A method of producing fine particles comprising sputtering metallic or non-metallic materials onto a substrate having fine projections densely formed on the surface thereof, said fine projections having a height of at least 0.05 μm and a diameter ranging essentially from 0.01 to 5 μm and the number of said projections per unit area of said substrate being essentially in the range of 1×10 3 to 2×10 8 projections/mm 2 , in an inert gas or a mixture of an inert gas and a reactive gas at a pressure in the range of 1×10 -4 torr to 1×10 -1 torr, and thereby depositing metallic or non-metallic fine particles having a crystalline or amorphous structure on said substrate.
Claim 2
Independent Claim
117 words
A method of producing fine particles comprising sputtering metallic or non-metallic materials onto a substrate having fine projections densely formed on the surface thereof, said fine projections having a height of at least 0.05 μm and a diameter ranging essentially from 0.01 to 5 μm and the number of said projections per unit area of said substrate being essentially in the range of 1×10 3 to 2×10 8 projections/mm 2 , in an inert gas or a mixture of an inert gas and a reactive gas at a pressure in the range of 1×10 -4 torr to 1×10 -1 torr, and thereby depositing metallic or non-metallic fine particles having a crystalline or amorphous structure on said substrate.
Claim 3
Dependent Claim
28 words
A method as claimed in claim 1, wherein said fine projections are uniformly formed on said surface of said substrate by the sputter-etching method using an ionized gas.
Claim 4
Dependent Claim
26 words
A method as claimed in claim 1, wherein the temperature of said substrate during said sputtering is maintained within a temperature range not exceeding 300° C.
Claim 5
Dependent Claim
18 words
A method as claimed in claim 1, wherein the material sputtered on said substrate is a ferromagnetic material.
Claim 6
Dependent Claim
55 words
A method according to claim 1 in which said fine projections are made of a substance that is soluble in a solvent that does not dissolve said particles and wherein, after said fine particles have been deposited on said fine projections, said fine projections are dissolved with said solvent and said fine particles are recovered.
Claim 7
Dependent Claim
13 words
A method as claimed in claim 5 in which said substance is sucrose.
Claim 8
Dependent Claim
13 words
A method as claimed in claim 5 in which said substance is polystyrene.
Claim 9
Dependent Claim
15 words
A method as claimed in claim 4 in which said substrate is an acrylic film.
References Cited (Backward Citations)
US4396643A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-04-21 | 1989-10-21 | 1990-04-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-04-21 | 1993-10-21 | 1994-04-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-04-21 | 1997-10-21 | 1998-04-22 | $7700.00 | Window Closed / Lapsed |