US4569745A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering apparatus
Assignee: Fujitsu Ltd
•
Filing: 1983-10-05
•
Granted: 1986-02-11
•
Expires: 2003-10-05
Abstract
Abstract A sputtering apparatus having a vacuum treatment chamber, a backing plate arranged within the chamber, a sputtering target secured to the backing plate, evacuation means and a voltage source for applying a voltage to the sputtering target. The peripheral portion of the backing plate adjacent to the sputtering target is covered with a material having a high heat resistance temperature and excellent electrical insulating properties or the same material as the material of the sputtering target. The peripheral edge of the sputtering target can also be made larger than the peripheral edge of the backing plate so that the peripheral portion of the backing plate adjacent to the sputtering target is covered with or hidden by the sputtering target. In this sputtering apparatus, at least the peripheral portion of the backing plate adjacent to the sputtering target is not sputtered, and therefore, a metal film formed on a substrate by sputtering is not contaminated and this metal film is, therefore, easily dry-etched.
Inventors
- 👤 Setsuo Nagashima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 02:42
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3435; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/3488; H01J37/3497
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
117 words
A sputtering apparatus comprising: a vacuum treatment chamber; a backing plate arranged within said vacuum treatment chamber, said backing plate having a peripheral portion; a sputtering target secured to said backing plate; evacuation means, operatively connected to said vacuum treatment chamber, for evacuating the vacuum treatment chamber; means for applying a voltage to said sputtering target; and a covering material covering at least the peripheral portion of the backing plate adjacent to the sputtering target, said covering material being in contact with the peripheral portion of the backing plate, and being a material having a high heat resistance temperature and an excellent electrically insulating property or being the same material as the material of the sputtering target.
Claim 2
Dependent Claim
117 words
A sputtering apparatus comprising: a vacuum treatment chamber; a backing plate arranged within said vacuum treatment chamber, said backing plate having a peripheral portion; a sputtering target secured to said backing plate; evacuation means, operatively connected to said vacuum treatment chamber, for evacuating the vacuum treatment chamber; means for applying a voltage to said sputtering target; and a covering material covering at least the peripheral portion of the backing plate adjacent to the sputtering target, said covering material being in contact with the peripheral portion of the backing plate, and being a material having a high heat resistance temperature and an excellent electrically insulating property or being the same material as the material of the sputtering target.
Claim 3
Dependent Claim
51 words
A sputtering apparatus as set forth in claim 1, wherein said sputtering target has a tray-like shape and is secured to said backing plate so that said peripheral edge of said sputtering target covers at least a part of said peripheral portion of the backing plate adjacent to said sputtering target.
Claim 4
Dependent Claim
28 words
A sputtering apparatus as set forth in claim 1, wherein the entire peripheral portion of the backing plate is covered with a heat resistant and electrically insulating material.
Claim 5
Dependent Claim
38 words
A sputtering apparatus as set forth in claim 1, wherein the material having a high heat resistance temperature and an excellent electrically insulating material is selected from the group consisting essentially of ceramic, porcelain, alumina and quartz glass.
Claim 6
Dependent Claim
51 words
A sputtering apparatus as set forth in claim 1, wherein said sputtering target has a first face and a second face, said sputtering target is secured to said first face of said backing plate, and a pipe for circulating cooling water is arranged on said second face of said backing plate.
Claim 7
Dependent Claim
23 words
A sputtering apparatus as set forth in claim 1, wherein a conduit for circulation of cooling water is formed within the backing plate.
Claim 8
Dependent Claim
93 words
A sputtering apparatus, comprising: a vacuum chamber; means, operatively connected to said vacuum chamber, for evacuating said vacuum chamber; a backing plate arranged within said vacuum chamber, said backing plate having a peripheral portion; a sputtering target having a securing face and a target face, said securing face being secured to said backing plate, said securing face having a lip formed at the edge thereof, said lip covering and being in contact with a part of said peripheral portion of said backing plate; and means for applying a voltage to said sputtering target.
Claim 9
Dependent Claim
93 words
A sputtering apparatus, comprising: a vacuum chamber; means, operatively connected to said vacuum chamber, for evacuating said vacuum chamber; a backing plate arranged within said vacuum chamber, said backing plate having a peripheral portion; a sputtering target having a securing face and a target face, said securing face being secured to said backing plate, said securing face having a lip formed at the edge thereof, said lip covering and being in contact with a part of said peripheral portion of said backing plate; and means for applying a voltage to said sputtering target.
Claim 10
Dependent Claim
112 words
A sputtering apparatus, comprising: a vacuum chamber; means, operatively connected to said vacuum chamber, for evacuating said vacuum chamber; a backing plate arranged within said vacuum chamber, said backing plate having a peripheral portion and an outer diameter; a sleeve having an annular shape and an inner diameter substantially equal to said outer diameter of said backing plate, said sleeve being formed of a material which is an electrical insulator and which has a high heat resistance temperature, said sleeve being fitted over and in contact with said peripheral portion of said backing plate; a sputtering target secured to said backing plate; and means for applying a voltage to said sputtering target.
Claim 11
Dependent Claim
112 words
A sputtering apparatus, comprising: a vacuum chamber; means, operatively connected to said vacuum chamber, for evacuating said vacuum chamber; a backing plate arranged within said vacuum chamber, said backing plate having a peripheral portion and an outer diameter; a sleeve having an annular shape and an inner diameter substantially equal to said outer diameter of said backing plate, said sleeve being formed of a material which is an electrical insulator and which has a high heat resistance temperature, said sleeve being fitted over and in contact with said peripheral portion of said backing plate; a sputtering target secured to said backing plate; and means for applying a voltage to said sputtering target.
Claim 12
Dependent Claim
26 words
A sputtering apparatus according to claim 8, wherein said sleeve is formed of a material selected from a group consisting of ceramic, porcelain, alumina and quartz.
Claim 13
Dependent Claim
26 words
A sputtering apparatus according to claim 8, wherein said sleeve is formed of a material which is the same as the material forming said sputtering target.
Claim 14
Dependent Claim
49 words
A sputtering apparatus according to claim 8, wherein said sputtering target has a first face and a second face, said sputtering target is secured to said first face of said backing plate, and a pipe for circulating cooling water is arranged on said second face of said backing plate.
References Cited (Backward Citations)
DE2115590A1
Cited
US4419201A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-02-10 | 1989-08-12 | 1990-02-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-02-10 | 1993-08-12 | 1994-02-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-02-10 | 1997-08-12 | 1998-02-11 | $7700.00 | Window Closed / Lapsed |