US4569068A
Expired / Lapsed
US
⏱️ 0.0 years remaining
X-Ray Lithography apparatus
Assignee: Fujifilm Holdings Corp
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Filing: 1984-04-06
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Granted: 1986-02-04
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Expires: 2004-04-06
Abstract
Abstract An X-ray lithography apparatus wherein a linear X-ray source is formed by line scanning a target with electron lines, a band-slit having slits which extend in the direction similar to the longitudinal direction of said linear X-ray source and a solar-slit having plural slits in the direction perpendicular to said band-slit are interposed between the X-ray source and a wafer in order to irradiate only the component which is substantially perpendicular to the surface of the wafer out of the X-ray generated from the linear source, and said wafer is made to move continuously or stepwise in respect of a rectangular region which is highly collimated in order to conduct X-ray transfer against a predetermined region.
Inventors
- 👤 Mitsuru Ikeda
- 👤 Mitsunori Suzuki
- 👤 Teruo Someya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/70033; G21; G21K; G21K1/00; G21K1/02; G21K1/025; H; H01; H01J; H01J35/00; H01J35/24; H01J35/30; H01J35/305
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
141 words
An X-ray lithography apparatus which is characterized by the structure that a same region on a target is linearly scanned with electron lines emitted from plural electron guns to form a linear X-ray source, that a solar-slit is provided between said linear X-ray source and a mask substrate, the solar-slit comprising band-slits having slits which extend in the direction similar to the longitudinal direction of said X-ray source and which restricts the divergent angle of the X-ray in the direction perpendicular to said longitudinal direction and a group of slits which restricts the divergent angle of the X-ray in the longitudinal direction of the slits of said band-slit, and that said mask substrate is moved either continuously or stepwise in respect of an X-ray irradiation region of a rectangular cross section which is highly collimated by a band-slit or a solar-slit.
Claim 2
Dependent Claim
141 words
An X-ray lithography apparatus which is characterized by the structure that a same region on a target is linearly scanned with electron lines emitted from plural electron guns to form a linear X-ray source, that a solar-slit is provided between said linear X-ray source and a mask substrate, the solar-slit comprising band-slits having slits which extend in the direction similar to the longitudinal direction of said X-ray source and which restricts the divergent angle of the X-ray in the direction perpendicular to said longitudinal direction and a group of slits which restricts the divergent angle of the X-ray in the longitudinal direction of the slits of said band-slit, and that said mask substrate is moved either continuously or stepwise in respect of an X-ray irradiation region of a rectangular cross section which is highly collimated by a band-slit or a solar-slit.
Claim 3
Dependent Claim
31 words
The X-ray lithography apparatus as claimed in claim 1 which is characterized in that the target for generating X-ray is a rotary-type target which is water-cooled in the inner circumference thereof.
Claim 4
Dependent Claim
33 words
The X-ray lithography apparatus as claimed in claim 1 which is characterized in that said solar-slit comprises a plural number of planes arranged in the direction perpendicular to the longitudinal direction of band-slits.
Claim 5
Dependent Claim
21 words
The X-ray lithography apparatus as claimed in claim 1 wherein said solar-slit has a section in the form of a grid.
Claim 6
Dependent Claim
16 words
The X-ray lithography apparatus as claimed in claim 1 wherein said solar-slit comprises plural cylindrical members.
Claim 7
Dependent Claim
26 words
The X-ray lithography apparatus as claimed in any one of claims 1 to 5 wherein said solar-slit is minutely vibrated in the longitudinal direction of band-slits.
Claim 8
Dependent Claim
32 words
The X-ray lithography apparatus as claimed in any one of claims 1 to 5 wherein said mask substrate is vibrated in the longitudinal direction of the band-slits integrally with the semiconductor wafer.
References Cited (Backward Citations)
US3947687A
Cited
US4194123A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-02-03 | 1989-08-05 | 1990-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-02-03 | 1993-08-05 | 1994-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-02-03 | 1997-08-05 | 1998-02-04 | $7700.00 | Window Closed / Lapsed |