US4564758A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process and device for the ionic analysis of an insulating sample
Assignee: Cameca SAS
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Filing: 1984-02-01
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Granted: 1986-01-14
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Expires: 2004-02-01
Abstract
Abstract The invention provides a process and device for the ionic analysis of an insulating sample brought to a given negative potential, of the type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary electron beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample. An electron beam whose normal speed component cancels out just at level of the surface of the target is directed perpendicularly to the target. The device comprises for this purpose a filament, brought substantially to the same negative potential as the sample, which emits the electron beam. The electron beam, after emission, is deflected by a magnetic prism so as to be brought into coincidence with the optical axis of the negative ion beam emitted by the target.
Inventors
- 👤 Georges Slodzian
- 👤 Marcel Chaintreau
- 👤 Roger Dennebouy
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 07:55
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/252; H01J37/02; H01J37/026
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
114 words
A process for ionic analysis of an insulating sample brought to a given negative potential, of a type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary ion beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample, wherein an electron beam, whose normal speed component cancels out just at the level of the surface of the target, is directed perpendicularly to the target, said electron beam being, after emission, deflected by a magnetic prism so as to brought into coincidence with the optical axis of the negative ion beam emitted by the target.
Claim 2
Dependent Claim
114 words
A process for ionic analysis of an insulating sample brought to a given negative potential, of a type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary ion beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample, wherein an electron beam, whose normal speed component cancels out just at the level of the surface of the target, is directed perpendicularly to the target, said electron beam being, after emission, deflected by a magnetic prism so as to brought into coincidence with the optical axis of the negative ion beam emitted by the target.
Claim 3
Dependent Claim
27 words
The process as claimed in claim 1, wherein the electrons leaving the target along the optical axis are used for obtaining an electron image of the sample.
Claim 4
Dependent Claim
21 words
The process as claimed in claim 2, wherein a filament brought substantially to said given negative potential emits said electron beam.
Claim 5
Independent Claim
132 words
A device for the ionic analysis of an insulating sample brought to a given negative potential, of the type which comprises a source of primary bombardment ions directed on a target at the surface of the sample to be analyzed and, along the optical axis of the device, a mass spectrograph using negative ions emitted by the bombardment target for producing an ion image of the sample, further comprising a source brought substantially to the potential of the sample emitting an electron beam, and deflecting means for directing this electron beam onto the target, perpendicularly to the bombarded surface and wherein said deflecting means comprise a magnetic prism and a system is provided for magnetically compensating the deflection by said prism of the path of the negative ions emitted by the target.
Claim 6
Independent Claim
132 words
A device for the ionic analysis of an insulating sample brought to a given negative potential, of the type which comprises a source of primary bombardment ions directed on a target at the surface of the sample to be analyzed and, along the optical axis of the device, a mass spectrograph using negative ions emitted by the bombardment target for producing an ion image of the sample, further comprising a source brought substantially to the potential of the sample emitting an electron beam, and deflecting means for directing this electron beam onto the target, perpendicularly to the bombarded surface and wherein said deflecting means comprise a magnetic prism and a system is provided for magnetically compensating the deflection by said prism of the path of the negative ions emitted by the target.
Claim 7
Dependent Claim
39 words
The device as claimed in claim 4, wherein the prism is a double magnetic prism, deflecting the electrons which leave the target along the optical axis and an associated analyzer is provided delivering an electron image of the sample.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-01-13 | 1989-07-15 | 1990-01-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-01-13 | 1993-07-15 | 1994-01-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-01-13 | 1997-07-15 | 1998-01-14 | $7700.00 | Window Closed / Lapsed |