Photopolymerizable mixtures and processes for the photopolymerization of cationically polymerizable compounds

Claim 2

A photopolymerizable mixture consisting essentially of (a) an epoxide compound or a mixture of epoxide compounds, said epoxide compound containing no ethylenically unsaturated group, (b) an aromatic iodonium salt as the polymerization catalyst, and (c) an aromatic carbonyl compound as the cocatalyst which is a ketone of formula I ##STR5## in which n is a 1 or 2 and Ar, if n is 1, is phenyl, diphenyl, tetrahydronaphthyl or phenyl which is substituted by one or more of the radicals F, Cl, Br, C 1 -C 12 -alkyl, --O--phenyl or --OAlk and, if n is 2, is C 6 -C 12 -arylene or a -phenylene-T-phenylene group in which T is --O--, --S-- or --CH 2 --, and Alk is C 1 -C 4 -alkyl, X is OH, R 1 is C 1 -C 8 -alkyl or --CH 2 CH 2 COOAlk and R 2 is C 1 -C 8 -alkyl or allyl, or R 1 and R 2 together are C 4 -C 7 -alkylene.

Claim 3

A photopolymerisable mixture according to claim 1, wherein component (a) is a mixture of a polyglycidylether type epoxide resin with an epoxidised soybean oil.

Claim 4

A photopolymerisable mixture according to claim 1, wherein component (b) is an aromatic iodonium salt of the formula IV [Ar.sup.1 --I--Ar.sup.2 ].sup.+ [MQ.sub.n ].sup.- IV in which Ar 1 and Ar 2 independently of one another are phenyl, naphthyl or phenyl which is substituted by one or more of the radicals C 1 -C 8 -alkyl, phenyl, phenoxy, halogen, nitro or C 1 -C 4 -alkoxy, or Ar 1 and Ar 2 together are a divalent radical of the formula V ##STR6## in which Y is a direct bond, --O--, --CH 2 -- or --CO-- and R is C 1 -C 4 -alkyl, halogen, nitro or C 1 -C 4 -alkoxy, M is a metal atom or metalloid atom from the series comprising B, P, As, Sb, Sn, Bi and Fe, Q is fluorine or chlorine and n is 4, 5 or 6 and 1 larger than the valency of M.

Claim 5

A photopolymerisable mixture according to claim 2, wherein component (b) is a diphenyliodonium salt.

Claim 6

A photopolymerisable mixture according to claim 2, wherein the anion [MQ n ] - of the iodonium salt is one of the anions BF 4 - , PF 6 - , AsF 6 - or SbF 6 - .

Claim 7

A photopolymerisable mixture according to claim 1, wherein component (c) is a compound of the formula I, in which n is 1, Ar is phenyl, chlorophenyl or C 7 -C 10 -alkylphenyl, R 1 and R 2 are either both methyl or together are pentamethylene and X is --OH.

Claim 8

A photopolymerisable mixture according to claim 1, wherein the mixture contains a photosensitiser.

Claim 9

A process for the photochemical polymerization of cationically polymerizable compounds or mixtures of compounds which comprises exposing a mixture of (a) an epoxide compound or a mixture of epoxide compounds, said epoxide compound containing no ethylenically unsaturated group, (b) an aromatic iodonium salt as the polymerization catalyst, and (c) an aromatic carbonyl compound as the cocatalyst which is a ketone of formula I ##STR7## in which n is a 1 or 2 and Ar, if n is 1, is phenyl, diphenyl, tetrahydronaphthyl or phenyl which is substituted by one or more of the radicals F, Cl, Br, C 1 -C 12 -alkyl, --O--phenyl or --OAlk and, if n is 2, is C 6 -C 12 -arylene or a -phenylene-T-phenylene group in which T is --O--, --S-- or --CH 2 --, and Alk is C 1 -C 4 -alkyl, X is OH, R 1 is C 1 -C 8 -alkyl or --CH 2 CH 2 COOAlk and R 2 is C 1 -C 8 -alkyl or allyl, or R 1 and R 2 together are C 4 -C 7 -alkylene, to irradiation by short-wave light.

Claim 10

A process for the photochemical polymerization of cationically polymerizable compounds or mixtures of compounds which comprises exposing a mixture of (a) an epoxide compound or a mixture of epoxide compounds, said epoxide compound containing no ethylenically unsaturated group, (b) an aromatic iodonium salt as the polymerization catalyst, and (c) an aromatic carbonyl compound as the cocatalyst which is a ketone of formula I ##STR7## in which n is a 1 or 2 and Ar, if n is 1, is phenyl, diphenyl, tetrahydronaphthyl or phenyl which is substituted by one or more of the radicals F, Cl, Br, C 1 -C 12 -alkyl, --O--phenyl or --OAlk and, if n is 2, is C 6 -C 12 -arylene or a -phenylene-T-phenylene group in which T is --O--, --S-- or --CH 2 --, and Alk is C 1 -C 4 -alkyl, X is OH, R 1 is C 1 -C 8 -alkyl or --CH 2 CH 2 COOAlk and R 2 is C 1 -C 8 -alkyl or allyl, or R 1 and R 2 together are C 4 -C 7 -alkylene, to irradiation by short-wave light.

Claim 11

A process according to claim 8, wherein an aromatic iodonium salt of the formula IV [Ar.sup.1 --I--Ar.sup.2 ].sup.+ [MQ.sub.n ].sup.- IV in which Ar 1 and Ar 2 independently of one another are phenyl, naphthyl or phenyl which is substituted by one or more of the radicals C 1 -C 8 -alkyl, phenyl, phenoxy, halogen, nitro or C 1 -C 4 -alkoxy, or Ar 1 and Ar 2 together are a divalent radical of the formula V ##STR8## in which Y is a direct bond, --O--, --CH 2 -- or --CO-- and R is C 1 -C 4 -alkyl, halogen, nitro or C 1 -C 4 -alkoxy, M is a metal atom or metalloid atom from the series comprising B, P, As, Sb, Sn, Bi and Fe, Q is fluorine or chlorine and n is 4, 5 or 6 and 1 larger than the valency of M, is used as component (b).