US4551412A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Silver halide photographic light-sensitive material for photomechanical process and method of reduction treatment therefore
Assignee: Fujifilm Holdings Corp
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Filing: 1983-08-17
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Granted: 1985-11-05
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Expires: 2003-08-17
Abstract
Abstract A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex. The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material. A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing the silver halide photographic light-sensitive material as described above, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image is also disclosed.
Inventors
- 👤 Masashi Ogawa
- 👤 Taku Nakamura
- 👤 Yukihide Urata
- 👤 Shingo Yamauchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 12:00
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/76; G03C1/7614; Y; Y10; Y10S; Y10S430/00; Y10S430/15
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
99 words
A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and at least one of the light-insensitive upper layers contains a polymer latex, wherein the polymer latex is a polymer latex having a glass transition temperature higher than room temperature, whereby antiadhesive property is improved.
Claim 2
Dependent Claim
99 words
A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and at least one of the light-insensitive upper layers contains a polymer latex, wherein the polymer latex is a polymer latex having a glass transition temperature higher than room temperature, whereby antiadhesive property is improved.
Claim 3
Dependent Claim
50 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the melting time of the light-insensitive upper layer measured in a 0.2N NaOH solution kept at 75° C. is at least 50 seconds longer than the melting time of the light-sensitive silver halide emulsion layer.
Claim 4
Dependent Claim
49 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the melting time of the light-insensitive upper layer measured in 0.2N NaOH solution kept at 75° C. is at least 100 seconds longer than the melting time of the light-sensitive silver halide emulsion layer.
Claim 5
Dependent Claim
41 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the polymer latex is a hydrate of a vinyl polymer containing a monomer unit selected from an acrylic acid ester, a methacrylic acid ester and styrene.
Claim 6
Dependent Claim
40 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 4, wherein the vinyl polymer is a homopolymer of alkyl acrylate or alkyl methacrylate or a copolymer of alkyl acrylate or alkyl methacrylate and other vinyl monomer.
Claim 7
Dependent Claim
28 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein an average particle size of the polymer latex is from 0.005μ to 1μ.
Claim 8
Dependent Claim
45 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the polymer latex is a hydrate of a homopolymer of methyl methacrylate, ethyl methacrylate or styrene or a copolymer of methyl methacrylate, ethyl methacrylate or styrene and another vinyl monomer.
Claim 9
Dependent Claim
40 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein an amount of the polymer latex is from 5% to 200% based on the weight of hydrophilic colloid contained in the layer to be added.
Claim 10
Dependent Claim
41 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the polymer latex is present in the light-insensitive upper layer having a melting time longer than the melting time of the light-sensitive silver halide emulsion layer.
Claim 11
Dependent Claim
47 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the polymer latex is present in a light-insensitive upper layer other than the light-insensitive upper layer having a melting time longer than the melting time of the light-sensitive silver halide emulsion layer.
Claim 12
Dependent Claim
25 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the light-insensitive upper layer is hardened with a diffusion-resistant hardener.
Claim 13
Dependent Claim
25 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the light-insensitive upper layer is hardened with a polymeric hardener.
Claim 14
Dependent Claim
222 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 12, wherein the polymeric hardener has a repeating unit represented by the following general formula (I): ##STR18## wherein A represents an ethylenically unsaturated monomer unit copolymerizable with a monomer unit set forth on the right side; R 1 represents a hydrogen atom or a lower alkyl group having from 1 to 6 carbon atoms; Q represents ##STR19## (wherein R 1 has the same meaning as defined above) or an arylene group having from 6 to 10 carbon atoms; L represents a divalent group having from 3 to 15 carbon atoms and containing at least one linking group selected from the members consisting of ##STR20## (wherein R 1 has the same meaning as defined above) or a divalent group having from 1 to 12 carbon atoms and containing at least one linking group selected from the members consisting of ##STR21## (wherein R 1 has the same meaning as defined above); R 2 represents --CH═CH 2 or --CH 2 CH 2 X (wherein X represents a group capable of being substituted with a nucleophilic group or a group capable of being released in the form of HX upon a base); and x and y each represents molar percent, x being from 0 to 99 and y being from 1 to 100.
Claim 15
Dependent Claim
193 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 12, wherein the polymeric hardener has a repeating unit represented by the following general formula (II): ##STR22## wherein A represents an ethylenically unsaturated monomer unit copolymerizable with a monomer unit set forth on the right side; x and y each represents molar percent, x being from 10 to 95 and y being from 5 to 90; R represents a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms; R' represents --CH═CH 2 or --CH 2 CH 2 X (wherein X represents a group capable of being substituted with a nucleophilic group or a group capable of being released in the form of HX upon a base); and L' represents a linking group selected from the members consisting of an alkylene group having from 1 to 6 carbon atoms, an arylene group having from 6 to 12 carbon atoms, --COZ-- or --COZR 3 -- (wherein R 3 represents an alkylene group having from 1 to 6 carbon atoms or an arylene group having from 6 to 12 carbon atoms and Z represents an oxygen atom or NH).
Claim 16
Dependent Claim
126 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 12, wherein the polymeric hardener has a repeating unit represented by the following general formula (III): ##STR23## wherein A represents an ethylenically unsaturated monomer unit copolymerizable with a monomer unit set forth on the right side; R represents a hydrogen atom or an alkyl group having from 1 to 6 carbon atoms; L represents a divalent linking group having from 1 to 20 carbon atoms and containing at least one linking group selected from the members consisting of --CONH-- and --CO--; X represents an active ester group; x and y each represents molar percent, x being from 0 to 95 and y being from 5 to 100; and m represents 0 or 1.
Claim 17
Dependent Claim
34 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the light-insensitive upper layer and the light-sensitive silver halide emulsion layer are hardened with a diffusible low molecular hardener.
Claim 18
Dependent Claim
45 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the light-insensitive upper layer is hardened with a polymeric hardener and the light-sensitive silver halide emulsion layer and the light-insensitive upper layer is hardened with a diffusible low molecular hardener.
Claim 19
Dependent Claim
42 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein a coating amount of a hydrophilic colloid binder in the light-insensitive upper layer is equal to or more than that in the light-sensitive silver halide emulsion layer.
Claim 20
Dependent Claim
27 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein a thickness of the light-insensitive upper layer is from 0.3μ to 5μ.
Claim 21
Dependent Claim
38 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein a ratio by weight of a hydrophilic colloid binder to silver halide in the light-sensitive silver halide emulsion layer is 1/2 or less.
Claim 22
Dependent Claim
37 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein silver halide is present in an amount of from 1.0 to 6.0 g silver/m 2 in the light-sensitive silver halide emulsion layer.
Claim 23
Dependent Claim
37 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein silver halide is present in an amount of from 1.3 to 4.0 g silver/m 2 in the light-sensitive silver halide emulsion layer.
Claim 24
Independent Claim
146 words
A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing a silver halide photographic light-sensitive material, wherein the silver halide photographic light-sensitive material comprises a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and at least one of the light-insensitive upper layers contains a polymer latex, wherein the polymer latex is a polymer latex having a glass transition temperature higher than room temperature, whereby antiadhesive property is improved, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image.
Claim 25
Independent Claim
146 words
A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing a silver halide photographic light-sensitive material, wherein the silver halide photographic light-sensitive material comprises a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and at least one of the light-insensitive upper layers contains a polymer latex, wherein the polymer latex is a polymer latex having a glass transition temperature higher than room temperature, whereby antiadhesive property is improved, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image.
Claim 26
Dependent Claim
23 words
A method of reduction treatment as claimed in claim 23, wherein the developing step is carried out using a lith type developing solution.
Claim 27
Dependent Claim
40 words
A method of reduction treatment as claimed in claim 23, wherein the reduction treatment step is carried out using a reducer containing a permanganate, a persulfate, a ferric salt, a cupric salt, a ceric salt, a ferricyanide or a dichromate.
Claim 28
Dependent Claim
28 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the average particle size of the polymer latex is from 0.02μ to 0.1μ.
Claim 29
Dependent Claim
43 words
A silver halide photographic light-sensitive material for photo-mechanical process as claimed in claim 1, wherein the amount of the polymer latex is from 10 to 100 percent based on the weight of hydrophilic colloid contained in the layer to which it is added.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-11-04 | 1989-05-06 | 1989-11-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-11-04 | 1993-05-06 | 1993-11-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-11-04 | 1997-05-06 | 1997-11-05 | $7700.00 | Window Closed / Lapsed |