Motion measurement and alignment method and apparatus

Claim 1

A method of making wafer-tools for use with a master mask for testing wafer coarse stage motion measurement and wafer fine stage motion measurement in an optical lithographic system comprising the steps of: inserting said master masks, having an alignment pattern, a wafer coarse stage motion measurement pattern and a wafer fine stage motion measurement pattern thereon, into a projection mask aligner, aligning said master mask to a specific location in said aligner, inserting a first photoresist-coated semiconductor wafer into said projection mask aligner, aligning said master mask and said first wafer with respect to each other using said alignment pattern, exposing the photoresist on said first wafer, removing said first wafer from said projection mask aligner, chemically etching said first wafer to perfect the coarse stage motion measurement pattern thereon, thereby forming a first wafer-tool having an image of the coarse stage motion measurement pattern, again aligning said master mask to a specific location in the aligner, inserting the first wafer-tool in the aligner, aligning the first wafer-tool to said master mask, rotating said master mask through a preselected portion of a revolution, aligning said master mask to the first wafer-tool using the coarse stage motion measurement pattern, removing said first wafer-tool from said projection mask aligner, inserting a second photoresist-coated semiconductor wafer into said projection mask aligner, exposing the photoresist on said second wafer, removing said second wafer from said projection mask aligner, and chemically etching said second wafer to perfect the fine stage motion measurement pattern thereon, thereby forming a second wafer-tool having an image of the fine stage motion measurement pattern.

Claim 2

A method of making wafer-tools for use with a master mask for testing wafer coarse stage motion measurement and wafer fine stage motion measurement in an optical lithographic system comprising the steps of: inserting said master masks, having an alignment pattern, a wafer coarse stage motion measurement pattern and a wafer fine stage motion measurement pattern thereon, into a projection mask aligner, aligning said master mask to a specific location in said aligner, inserting a first photoresist-coated semiconductor wafer into said projection mask aligner, aligning said master mask and said first wafer with respect to each other using said alignment pattern, exposing the photoresist on said first wafer, removing said first wafer from said projection mask aligner, chemically etching said first wafer to perfect the coarse stage motion measurement pattern thereon, thereby forming a first wafer-tool having an image of the coarse stage motion measurement pattern, again aligning said master mask to a specific location in the aligner, inserting the first wafer-tool in the aligner, aligning the first wafer-tool to said master mask, rotating said master mask through a preselected portion of a revolution, aligning said master mask to the first wafer-tool using the coarse stage motion measurement pattern, removing said first wafer-tool from said projection mask aligner, inserting a second photoresist-coated semiconductor wafer into said projection mask aligner, exposing the photoresist on said second wafer, removing said second wafer from said projection mask aligner, and chemically etching said second wafer to perfect the fine stage motion measurement pattern thereon, thereby forming a second wafer-tool having an image of the fine stage motion measurement pattern.

Claim 4

A method of making a wafer-tool for use with a master mask for the fine stage measurement comprising the steps of: aligning said master mask to a specific location in a projection mask aligner, said mask having an alignment pattern, a wafer coarse stage motion measurement pattern and a wafer fine stage motion measurement pattern thereon; inserting a first wafer-tool into said aligner, said first wafer-tool having a coarse stage motion measurement pattern thereon; aligning said first wafer-tool to said master mask; rotating said master mask through a preselected portion of a revolution; aligning said master mask to the first wafer-tool using the coarse stage motion measurement pattern; removing said first wafer-tool from said projection mask aligner; inserting a photoresist coated semiconductor wafer into said projection mask aligner; exposing the photoresist on said wafer; removing said wafer from said projecting mask aligner; and chemically etching said wafer to perfect the fine stage motion measurement pattern thereon, thereby forming a second wafer-tool having an image of the fine stage motion measurement pattern.

Claim 5

A method of making a wafer-tool for use with a master mask for the fine stage measurement comprising the steps of: aligning said master mask to a specific location in a projection mask aligner, said mask having an alignment pattern, a wafer coarse stage motion measurement pattern and a wafer fine stage motion measurement pattern thereon; inserting a first wafer-tool into said aligner, said first wafer-tool having a coarse stage motion measurement pattern thereon; aligning said first wafer-tool to said master mask; rotating said master mask through a preselected portion of a revolution; aligning said master mask to the first wafer-tool using the coarse stage motion measurement pattern; removing said first wafer-tool from said projection mask aligner; inserting a photoresist coated semiconductor wafer into said projection mask aligner; exposing the photoresist on said wafer; removing said wafer from said projecting mask aligner; and chemically etching said wafer to perfect the fine stage motion measurement pattern thereon, thereby forming a second wafer-tool having an image of the fine stage motion measurement pattern.