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US4544941A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device having multiple conductive layers and the method of manufacturing the semiconductor device

Assignee: Toshiba Corp
•
Filing: 1981-06-16
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Granted: 1985-10-01
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Expires: 2001-06-16
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Abstract

Abstract A semiconductor device having multiple conductive layers which are satisfactorily connected to one another is disclosed. The multiple conductive layers are respectively insulated by insulation layers and are formed on the semiconductor substrate where circuit elements are formed. Each multiple conductive layer is connected through contact holes having the same depth and at least one conductive layer is connected to the first conductive layer thereunder through an additional conductive layer formed at the same time that the second conductive layer is formed.

Inventors

  • 👤 Shoji Ariizumi
  • 👤 Makoto Segawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 12:33
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/427; H10D; H10D88/00; H10W20/01; H10W20/031; H10W20/063; H10W20/0698; H10W20/42

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 213 words
A semiconductor device comprising: a plurality of semiconductor elements having at least one PN junction, said elements being formed on a substrate; an insulating separating layer imbedded in a portion of said substrate and raised above the surface thereof for separating, below the surface of the substrate, at least two of said semiconductor elements; a first insulation layer formed on said substrate; a first conductive layer comprising, a first electrode formed on said first insulation layer, an additional conductive layer formed on said insulating separating layer, and another conductive layer formed on said insulating separating layer; a second insulation layer formed on said first conductive layer; a second conductive layer formed on said second insulation layer; a third insulation layer formed above said second insulation layer; a third conductive layer formed on said third insulation layer, said third conductive layer being connected by a plurality of separate conductive paths to said semiconductor elements in said semiconductor device through contact holes, every such contact hole passing through the same number of said layers of insulation, said separate conductive paths including said additional conductive layer, said third conductive layer connected to said another conductive layer and said additional conductive layer through said contact holes and to said second conductive layer through said additional conductive layer.
Claim 2
Dependent Claim 213 words
A semiconductor device comprising: a plurality of semiconductor elements having at least one PN junction, said elements being formed on a substrate; an insulating separating layer imbedded in a portion of said substrate and raised above the surface thereof for separating, below the surface of the substrate, at least two of said semiconductor elements; a first insulation layer formed on said substrate; a first conductive layer comprising, a first electrode formed on said first insulation layer, an additional conductive layer formed on said insulating separating layer, and another conductive layer formed on said insulating separating layer; a second insulation layer formed on said first conductive layer; a second conductive layer formed on said second insulation layer; a third insulation layer formed above said second insulation layer; a third conductive layer formed on said third insulation layer, said third conductive layer being connected by a plurality of separate conductive paths to said semiconductor elements in said semiconductor device through contact holes, every such contact hole passing through the same number of said layers of insulation, said separate conductive paths including said additional conductive layer, said third conductive layer connected to said another conductive layer and said additional conductive layer through said contact holes and to said second conductive layer through said additional conductive layer.
Claim 3
Dependent Claim 46 words
A semiconductor device as recited in claim 1, wherein: said third conductive layer is connected to a semiconductor region of one of said semiconductor elements through one of said contact holes and is further connected to said additional conductive layer through another of said contact holes.
Claim 4
Dependent Claim 36 words
A semiconductor device as recited in one of claims 2 or 1, wherein: said first conductive layer and said second conductive layer are made of polycrystalline silicon and said third conductive layer is made of aluminum.

References Cited (Backward Citations)

US3510728A Cited
US3801880A Cited
US4270262A Cited
US4278989A Cited
EP0016577A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-09-30 1989-04-01 1989-10-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-09-30 1993-04-01 1993-10-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-09-30 1997-04-01 1997-10-01 $7700.00 Window Closed / Lapsed

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