Negative working diazo light-sensitive composition with oxonol dye and lithographic printing plate using the same

Claim 2

A negative working light-sensitive composition comprising an admixture of (a) a light-sensitive diazo compound which contains at least two diazo groups and produces an acidic compound by photo-decomposition, and present in an amount sufficient to form an image after actinic exposure and development and (b) a compound capable of increasing absorption of at least a part of light ranging in the light-sensitive wavelength region of the composition with increasing exposure time, and present in an amount sufficient for increasing said absorption with increasing exposure time, said compound capable of increasing absorption being presented by the following general formula (I) ##STR12## wherein R represents an alkyl group or an alkoxycarbonyl group and Q represents a hydrogen atom or an aryl group or a substituted aryl group, and wherein the light-sensitive wavelength region of the composition is within the wavelength region 350 to 450 nm and compound (b) is one such that it is capable of increasing absorption for the light of the wavelength range from 350 to 450 nm.

Claim 3

A negative working light-sensitive composition as claimed in claim 1, wherein the composition is further comprised of a polymeric material.

Claim 4

A negative working light-sensitive composition as claimed in claim 1, wherein said compound (b) is one which reacts with a photodecomposition product of the diazo compound.

Claim 5

A negative working light-sensitive composition according to claim 1, wherein compound (b) is one which produces a new absorption peak in the presence of an acid and undergoes a color variation proportional to the change in acidity of the light-sensitive composition upon exposure, with the absorption peak newly produced by the color change and the absorption peak of the light-sensitive diazo compound overlapping, and with the absorption of the light-sensitive composition being more than 0.1 absorbance during exposure.

Claim 6

A negative working light-sensitive composition according to claim 1, wherein the absorbance does not fall to less than 0.2 during exposure so that even at the end point of the exposure 40% of incident light is absorbed in the light-sensitive composition.

Claim 7

A negative working light-sensitive composition as claimed in claim 1, wherein the alkyl group represented by R has 1 to 5 carbon atoms, the alkoxy group represented by R has 2 to 5 carbon atoms, and the aryl group represented by Q is a phenyl group or a phenyl group substituted by an alkyl group having 1 to 3 carbon atoms.

Claim 8

A negative working light-sensitive composition as claimed in claim 1, wherein R is ethoxycarbonyl or methoxycarbonyl and Q is phenyl.

Claim 9

A negative working light-sensitive composition as claimed in claim 1, wherein compound (b) is one such that it is capable of increasing absorption for the light of the wavelength range from 390 to 430.

Claim 10

A negative working light-sensitive lithographic printing plate, comprising: a hydrophilic support having coated thereon: a negative working light-sensitive layer comprising a negative working light-sensitive composition comprising: (a) a light-sensitive diazo compound which contains at least two diazo groups and produces an acidic compound by photodecomposition and present in an amount sufficient to form an image after active exposure and development; and (b) a compound capable of increasing absorption of at least part of a light ranging in the light-sensitive wavelength region of the composition with increasing exposure time, and present in an amount sufficient for increasing said absorption with increasing exposure time, said compound capable of increasing absorption being represented by the following general formula (I) ##STR13## wherein R represents an alkyl group or an alkoxycarbonyl group and Q represents a hydrogen atom or an aryl group or a substituted aryl group, and wherein the light-sensitive wavelength region of the composition is within the wavelength region 350 to 450 nm and compound (b) is one such that it is capable of increasing absorption for the light of the wavelength range from 350 to 450 nm.

Claim 11

A negative working light-sensitive lithographic printing plate, comprising: a hydrophilic support having coated thereon: a negative working light-sensitive layer comprising a negative working light-sensitive composition comprising: (a) a light-sensitive diazo compound which contains at least two diazo groups and produces an acidic compound by photodecomposition and present in an amount sufficient to form an image after active exposure and development; and (b) a compound capable of increasing absorption of at least part of a light ranging in the light-sensitive wavelength region of the composition with increasing exposure time, and present in an amount sufficient for increasing said absorption with increasing exposure time, said compound capable of increasing absorption being represented by the following general formula (I) ##STR13## wherein R represents an alkyl group or an alkoxycarbonyl group and Q represents a hydrogen atom or an aryl group or a substituted aryl group, and wherein the light-sensitive wavelength region of the composition is within the wavelength region 350 to 450 nm and compound (b) is one such that it is capable of increasing absorption for the light of the wavelength range from 350 to 450 nm.

Claim 12

A negative working light-sensitive lithographic printing plate as claimed in claim 9, wherein the negative working light-sensitive composition is further comprised of a polymeric material.

Claim 13

A negative working light-sensitive lithographic printing plate as claimed in claim 9, wherein the light-sensitive composition is present on the support in an amount of 0.1 to 7 g/m 2 .

Claim 14

A negative working light-sensitive lithographic printing plate as claimed in claim 9, wherein the aluminum plate has a surface subjected to treatment by means selected from the group consisting of mechanical treatment, electrochemical treatment and a combination of mechanical and electrochemical treatment and further anodized.

Claim 15

A negative working light-sensitive plate as claimed in claim 9, wherein said compound (b) is one which reacts with a photodecomposition product of the diazo compound.

Claim 16

A negative working light-sensitive plate according to claim 9, wherein compound (b) is one which produces a new absorption peak in the presence of an acid and undergoes a color variation proportional to the change in acidity of the light-sensitive composition upon exposure, with the absorption peak newly produced by the color change and the absorption peak of the light-sensitive diazo compound overlapping, and with the absorption of the light-sensitive composition being more than 0.1 absorbance during exposure.

Claim 17

A negative working light-sensitive plate according to claim 9, wherein the absorbance does not fall to less than 0.2 during exposure so that even at the end point of exposure 40% of incident light is absorbed in the light-sensitive composition.

Claim 18

A negative working light-sensitive plate as claimed in claim 9, wherein the alkyl group represented by R has 1 to 5 carbon atoms, the alkoxy carbonyl group represented by Q is a phenyl group or a phenyl group substituted by an alkyl group having 1 to 3 carbon atoms.

Claim 19

A negative working light-sensitive plate as claimed in claim 9, wherein R is ethoxycarbonyl or methoxycarbonyl and Q is phenyl.

Claim 20

A negative working light-sensitive plate as claimed in claim 9, wherein compound (b) is one such that it is capable of increasing absorption for the light of wavelength range from 390 to 430 nm.