Method and apparatus for producing an electron beam from a thermionic cathode

Claim 2

Electron beam apparatus comprising: frustum shaped cathode means composed of a thermoelectron emissive material having a low work function and a high operating temperature to provide a high emission current density, said temperature also causing such material to be highly reactive, said cathode means being a single crystal, having a flat single crystal plane top surface and a conical side surface, said flat single crystal plane top surface providing a high saturation emission current density having a uniform angular emission pattern which is essentially normal to said crystal plane and having a uniform intensity distribution at said operating temperature; a thin coated layer which covers the side surface of said shaped thermoelectron emissive material and whose material has a high work function so as to provide a low saturation emission current density from said side surface relative to said top surface so that side lobes in said beam are prevented even under full exposure to a positive accelerating field, hardly reacts chemically with said thermoelectron emissive material at said operating temperature, has a high melting point, and has a low vapor pressure at said operating temperature; and electrode means for producing an electric field at said top surface for providing an emission region of the Schottky or thermal field type where said top surface is exposed fully to positive accelerating potentials of said electrode means.

Claim 3

Electron beam apparatus comprising: frustum shaped cathode means composed of a thermoelectron emissive material having a low work function and a high operating temperature to provide a high emission current density, said temperature also causing such material to be highly reactive, said cathode means being a single crystal, having a flat single crystal plane top surface and a conical side surface, said flat single crystal plane top surface providing a high saturation emission current density having a uniform angular emission pattern which is essentially normal to said crystal plane and having a uniform intensity distribution at said operating temperature; a first thin coated layer, which covers the side surface of said shaped thermoelectron emissive material and whose material hardly reacts with said thermoelectron emissive material, has a high melting point and has a low vapor pressure at said operating temperatures; a second thin coated layer which covers said first thin layer, and whose material has a high work function so as to provide a low saturation emission current density from said side surface relative to said top surface so that side lobes in said beam are prevented even under full exposure to a positive accelerating field, has a high melting point, and has a low vapor pressure at said operating temperature; and electrode means for producing an electric field at said top surface for providing an emission region of the Schottky or thermal field type where said top surface is exposed fully to positive accelerating potentials of said electrode means.

Claim 4

Electron beam apparatus comprising: frustum shaped cathode means composed of a thermoelectron emissive material having a low work function and a high operating temperature to provide a high emission current density, said temperature also causing such material to be highly reactive, said cathode means being a single crystal, having a flat single crystal plane top surface and a conical side surface, said flat single crystal plane top surface providing a high saturation emission current density having a uniform angular emission pattern which is essentially normal to said crystal plane and having a uniform intensity distribution at said operating temperature; a first thin coated layer, which covers the side surface of said shaped thermoelectron emissive material and whose material hardly reacts with said thermoelectron emissive material, has a high melting point and has a low vapor pressure at said operating temperatures; a second thin coated layer which covers said first thin layer, and whose material has a high work function so as to provide a low saturation emission current density from said side surface relative to said top surface so that side lobes in said beam are prevented even under full exposure to a positive accelerating field, has a high melting point, and has a low vapor pressure at said operating temperature; and electrode means for producing an electric field at said top surface for providing an emission region of the Schottky or thermal field type where said top surface is exposed fully to positive accelerating potentials of said electrode means.

Claim 5

An electron beam apparatus as in claim 1 or claim 2, comprising: triode electrode means having first and second grid electrodes for providing means for extracting an electron beam mostly from used emission current of said top surface having a low energy spread and means for controlling the emission current density from said top surface in the range of one to several hundred times of the saturation emission current density from said top surface at an operating temperature with little variation of electron source size and position; anode electrode means for providing a ground potential with respect to a high voltage applied at said cathode means which determines the energy of the beam; means for heating said cathode means to adjust operating temperature at said top surface; means for adjusting the height of said top surface from the front surface of said first grid electrode and means for locating said cathode means along the axis of said electron beam apparatus; means for adjusting the spacing between said first grid electrode and said second grid electrode and means for locating said second grid electrode along said axis; means for adjusting the spacing between said triode means and said anode electrode means and means for locating said triode means along said axis; spot shaping aperture means positioned along said axis beneath said anode electrode means for shaping electron beam whose cross-section corresponding to said aperture; beam blanking means located beneath said aperture to deflect said shaped electron beam away from said axis; deflection means located beneath said anode electrode to direct said shaped beam into another electron beam apparatus which uses the apparatus of the invention; vacuum isolation valve means for isolating the apparatus of the invention from another electron beam apparatus using the apparatus of the invention, when said another electron beam apparatus is opened to the atmospheric pressure.

Claim 6

The apparatus of claim 3 wherein said means for heating said cathode means are provided by heating conductors which hold said cathode means under pressure by clamping screws.

Claim 7

The apparatus of claim 3 wherein said means for adjusting the height of said top surface are provided by inserting spacers between the cathode base and said first grid electrode, and said means for locating said cathode means along said axis are provided by four screws which are pushed against said cathode base.

Claim 8

The apparatus of claim 3 wherein said means for adjusting said spacing between said first grid electrode and said second grid electrode are provided by spacers inserted between the top surface of the high voltage insulator and said second grid electrode, and said means for locating said second grid electrode along said axis are provided by adjusting a lateral position of said second grid electrode and then screwing it down on the top surface of said high voltage insulator.

Claim 9

The apparatus of claim 3 wherein said means for adjusting the spacing between said triode electrode means and said anode electrode means are provided by inserting spacers between the shoulder of the insulator support tube and the X-Y adjuster, and said means for locating said triode electrode means along said axis are provided by four screws which push said X-Y adjuster.

Claim 10

The apparatus of claim 3 wherein said spot shaping aperture has a rectangular shape.

Claim 11

The apparatus of claim 3 wherein said beam blanking means comprise at least one pair of plates spaced from and facing each other in a lateral direction across said axis, and means for applying a voltage between said plates.

Claim 12

The apparatus of claim 3 wherein said deflection means are electromagnetic deflection means positioned beneath said anode electrode.

Claim 13

The apparatus of claim 10 wherein said electromagnetic deflection means consist of two pairs of deflection yokes, one pair being spaced from the other in a direction along said axis, and means for providing currents in each of four deflection yokes to shift said shaped beam in a lateral direction across said axis.

Claim 14

The apparatus of claim 1, or claim 2 wherein said thermoelectron emissive material has a general formula of MB 6 wherein M represents alkali earth metal or rare earth metal.

Claim 15

Said thermoelectron emissive material claimed in claim 12 wherein the alkali earth metal is selected from group consisting of barium (Ba) and calcium (Ca).

Claim 16

Said alkali earth metal claimed in claim 13, wherein the alkali earth metal is barium.

Claim 17

Said thermoelectron emissive material claimed in claim 12 wherein the rare earth metal is selected from the group consisting of lanthanum (La) neodymium (Nd) praseodymium (Pr) gadolinium (Gd), yttrium (Y) and samarium (Sm).

Claim 18

Said rare earth metal claimed in claim 15 wherein the rare earth metal is lanthanum.

Claim 19

The apparatus of claim 1 or claim 2 wherein said thermoelectron emissive material has a general formula M x N x-1 B 6 wherein both M and N represent rare earth material and X varies from zero to one.

Claim 20

Said thermoelectron emissive material claimed in claim 17 wherein M and N represent lanthanum and neodymium respectively and X=0.3.

Claim 21

Said thermoelectron emissive material claimed in claim 17 wherein M and N represent lanthanum and praseodymium respectively and X=0.3.

Claim 22

The apparatus of claim 1 or claim 2 wherein said thermoelectron emissive material includes combinations of rare earth metal borides.

Claim 23

Said combinations of rare earth metal borides claimed in claim 20 include compounds of praseodymium with 10%-30% additions of lanthanum hexaboride.

Claim 24

Said combinations of rare earth metal borides claimed in claim 20 include compounds of neodymium hexaboride with 10%-30% additions of lanthanum hexaboride.

Claim 25

The apparatus of claim 1 wherein the material of said thin layer is selected from rhenium and tantalum carbide.

Claim 26

The apparatus of claim 2 wherein the material of said first thin layer is selected from one or more of groups consisting of zirconium boride (ZrB 2 ), titanium boride (TiB 2 ), tantalum carbide (TaC) and carbon (C).

Claim 27

The apparatus of claim 2 wherein the material of said second thin layer is selected from the group consisting of tantalum, tungsten, molybedenum, and rhenium.

Claim 28

A method of manufacturing the apparatus of claim 1 which comprises steps of cutting a rod from a thermoelectron emissive material having a low work function, shaping one end of the rod into a cone, spheroid or hyperbola, coating the rod with a material which has a high work function, a high melting point, a low vapor pressure at an operating temperature and hardly reacts chemically with said thermoelectron emissive material at said operating temperature, a heat treatment for speeding up any possible chemical reaction at the interface between said two materials at a temperature higher than normal cathode operating temperature, coating the rod below the cone base of said shaped end of the rod with a thick layer of a material which has a high melting point, a low vapor pressure at said operating temperature and hardly reacts chemically with said thermoelectron emissive material at said operating temperature, in order to provide contact pads for heating conductors, and lapping and polishing top portion of said shaped end of the rod.

Claim 29

A method of manufacturing the apparatus of claim 2 which comprises steps of cutting a rod from a thermoelectron emissive material having a low work function, shaping one end of the rod into a cone, spheroid or hyperbola, coating the rod, for a first layer, with a material which has a high melting point, a low vapor pressure and hardly reacts chemically with said thermoelectron emissive material as well as a second layer at said operating temperature, coating the rod, for a second layer, with a material which has a high work function, a high melting point and a low vapor pressure at said operating temperature, and lapping and polishing top portion of said shaped end of the rod.

Claim 30

The methods as claimed in claim 26 or claim 27 wherein the rod is cut out by means of ultrasonic cutting, electron discharging cutting or diamond cutting.

Claim 31

The method as claimed in claim 26 wherein the heat treatment is to speed up any possible chemical reaction at the interface between said two materials and possible diffusion of the coating material into the thermoelectron emissive material at a temperature about from 100° C. to 700° C. higher than a cathode operating temperature by intense electron beam bombardment for approximately a half hour to an hour in an electron beam evaporator.

Claim 32

The apparatus of claim 3 further including said triode electrode means for providing a very large differential ratio of emission current from the top surface of the cathode means to that from the rest of the surface of said cathode means at an operating temperature, means for producing the used emission current having a uniform intensity distribution, means for providing a low energy spread in said used emission current and minimizing space-charge effect, and means for controlling an emission current density from said top surface in the range of one to several hundred times of the saturation emission current density at said operating temperature with little variation of electron source size and position, comprising: said cathode means comprising a shaped thermoelectron emissive material having a flat top surface and a thin layer which covers the side surface of said shaped thermoelectron emissive material and whose material has a high work function; the first grid electrode means on which a voltage applied restricts an electron emission area on said side surface of said cathode means at said operating temperatures; the second grid electrode means on which an adjustable voltage applied varies a strength of accelerating electric field at said top surface.

Claim 33

The apparatus of claim 30 wherein said means for providing said very large differential ratio of emission current from said top surface to that from said side surface of said cathode means are provided both by using said cathode means which provide a very large differential ratio of the saturation emission current density from said top surface to that from said side surface at an operating temperature and by restricting an electron emission area on said side surface by a voltage applied on said first electrode means.

Claim 34

The apparatus of claim 30 wherein said means for producing the used emission current having a uniform intensity distribution are provided by using said cathode whose top surface is a single crystal thermoelectron emissive material which has a uniform angular emission pattern and a uniform intensity distribution.

Claim 35

The apparatus of claim 30 wherein said means for providing a low energy spread in said used emission current and minimizing the space charge effect are provided by using said cathode means whose top surface is immersed in an accelerating field provided by a voltage applied on said second electrode means.

Claim 36

The apparatus of claim 30 wherein said means for controlling emission current density in the range of one to several hundred times of the saturation emission current density are provided by adjusting the strength of electric field from 10 3 V/cm to 10 7 V/cm at said top surface by varying a voltage applied on said second electrode means.

Claim 37

The apparatus of claim 30 wherein said means for providing said very large differential ratio of emission current from said top surface to that from said side surface are provided both by placing said top surface as close as possible to the same height as the front surface of said first grid electrode and by restricting an electron emission area on said side surface by a voltage applied on said first electrode means.

Claim 38

The apparatus of claim 1 wherein the the material of said thin layer is chemically non-reactive with said thermoelectron emissive material, which is selected from one or more of groups consisting of borides, such as tantalum boride (TaB 6 ), titanium boride (TiB 2 ), zirconium boride (ZrB 2 ) or niobium boride (NbB 2 ), carbides such as tantalum carbide (TaC) or zirconium carbide (ZrC), and nitrides such as tantalum nitride (TaN) or zirconium nitride.

Claim 39

The apparatus of claim 2 wherein the material of said first thin layer is chemically non-reactive with said thermoelectron emissive material, which is selected from one or more of groups consisting of borides, such as tantalum boride (TaB 6 ), titanium boride (TiB 2 ), zirconium boride (ZrB 2 ) or niobium boride (NbB 2 ), carbides such as tantalum carbide (TaC) or zirconium carbide (ZrC), and nitrides such as tantalum nitride (TaN) or zirconium nitride.

Claim 40

The apparatus of claim 1 wherein the material of said thin layer is carbon.

Claim 41

The apparatus of claim 2 wherein the material of said second thin layer is carbon.