Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards

Claim 2

A process of applying to a substrate and exposing a photohardenable material to obtain discrete areas of photohardened material on the substrate comprising the steps of: (a) applying to a flexible photomask a photohardenable material which is deformable and which is not present as a solid with said material applied in excess compared to the amount necessary to form a layer in step (c); (b) exposing a portion of the photohardenable material to actinic radiation through the photomask whereby the surface of the photohardenable material which faces away from the photomask remains deformable; (c) applying exposed and unexposed material with the photomask to a substrate to form a layer whereby the surface of photohardenable material which remains deformable faces the substrate by applying pressure to the flexible photomask and advancing the pressure to remove excess photohardenable material between the photomask and substrate to form a registered preimaged laminate; and (d) reexposing the layer containing photohardenable material to actinic radiation through the photomask whereby bonded discrete areas of photohardened material are obtained on the substrate.

Claim 3

The process of claim 1 wherein the photohardenable material is a photosensitive liquid.

Claim 4

The process of claim 1 wherein the substrate surface is substantially smooth.

Claim 5

The process of claim 1 wherein the substrate surface contains raised portions.

Claim 6

The process of claim 4 wherein the raised portions are electrically conducting.

Claim 7

The process of claim 4 wherein the raised portions are electrically insulating.

Claim 8

The process of claim 1 wherein the photohardenable material is negative working.

Claim 9

The process of claim 1 wherein a low viscosity liquid is applied to the substrate before step (c).

Claim 10

The process of claim 1 wherein the photohardenable material contains an addition photopolymerizable component.

Claim 11

The process of claim 1 wherein after step (d), the photomask is removed from the surface of the exposed photohardenable material and developer is applied to the surface of the photohardened material whereby unexposed unhardened discrete areas are removed.

Claim 12

The process of claim 1 wherein in step c the exposed layer is applied in precise register with the substrate.

Claim 13

The process of claim 1 wherein the application of photohardenable material is applied to a substrate surface held in a substantially vertical plane.

Claim 14

The process of claim 1 wherein excess photohardenable material is drained.

Claim 15

The process of claim 1 wherein the pressure is applied by use of pressure rollers.

Claim 16

The process of claim 1 wherein in addition to a first set of steps (a), (b), (c) and (d) a second set of steps (a), (b), (c) and (d) is performed in conjunction with a second photomask whereby discrete areas of photohardenable material are obtain on opposite surfaces of the substrate with said opposite substrate surfaces maintained without change of orientation throughout the combination of the first and second sets of steps.

Claim 17

The process of claim 15 wherein the sets of steps are performed concurrently.

Claim 18

A process of applying to a substrate and exposing a photohardenable material to obtain discrete areas of photohardenable material on the sheet substrate comprising the steps of: (a) applying to a flexible photomask a photohardenable material which is deformable and which is not present as a solid with said material applied in excess compared to the amount necessary to form a layer in step (c); (b) exposing the layer of photohardenable material to actinic radiation through the photomask whereby the surface of the photohardenable material which faces away from the photomask remain deformable and whereby photohardened material and photohardenable material are present in contact with the photomask; (c) contacting exposed and unexposed material on the photomask to the substrate to form a layer whereby during said contacting substantially no movement of the photomask occurs relative to the substrate other than a more intimate contact due to displacement of the photohardenable material and whereby at least one of interfacial or viscous force aids in holding the substrate and photomask in a fixed position relative to one another by applying pressure to the flexible photomask and during the contacting excess photohardenable material is removed between the photomask and substrate to form a registered preimaged laminate; and (d) reexposing the layer containing photohardenable material to actinic radiation through the photomask whereby bonded discrete areas of photohardened material are obtained on the substrate.

Claim 19

A process of applying to a substrate and exposing a photohardenable material to obtain discrete areas of photohardenable material on the sheet substrate comprising the steps of: (a) applying to a flexible photomask a photohardenable material which is deformable and which is not present as a solid with said material applied in excess compared to the amount necessary to form a layer in step (c); (b) exposing the layer of photohardenable material to actinic radiation through the photomask whereby the surface of the photohardenable material which faces away from the photomask remain deformable and whereby photohardened material and photohardenable material are present in contact with the photomask; (c) contacting exposed and unexposed material on the photomask to the substrate to form a layer whereby during said contacting substantially no movement of the photomask occurs relative to the substrate other than a more intimate contact due to displacement of the photohardenable material and whereby at least one of interfacial or viscous force aids in holding the substrate and photomask in a fixed position relative to one another by applying pressure to the flexible photomask and during the contacting excess photohardenable material is removed between the photomask and substrate to form a registered preimaged laminate; and (d) reexposing the layer containing photohardenable material to actinic radiation through the photomask whereby bonded discrete areas of photohardened material are obtained on the substrate.

Claim 20

The process of claim 17 wherein the photohardenable material is a photosensitive liquid.

Claim 21

The process of claim 17 wherein the substrate surface is substantially smooth.

Claim 22

The process of claim 17 wherein the substrate surface contains raised portions.

Claim 23

The process of claim 20 wherein the raised portions are electrically conducting.

Claim 24

The process of claim 20 wherein the raised portions are electrically insulating.

Claim 25

The process of claim 17 wherein the photohardenable material is negative working.

Claim 26

The process of claim 20 wherein a low viscosity liquid is applied to the substrate before step (c).

Claim 27

The process of claim 17 wherein the photohardenable material contains an addition photopolymerizable component.

Claim 28

The process of claim 17 wherein after step (d), the photomask is removed from the surface of the exposed photohardenable material and developer is applied to the surface of the photohardened material whereby unexposed unhardened discrete areas are removed.

Claim 29

The process of claim 17 whereby photo hardenable material between the substrate and the photomask is displaced and the substrate and photomask are brought into more intimate contact by an advancing nip.

Claim 30

The process of claim 17 wherein the application of photohardenable material is to a substrate surface held in a substantially vertical plane.

Claim 31

The process of claim 17 wherein the application of photohardenable material is to a substrate surface held in a substantially horizontal plane.

Claim 32

The process of claim 17 wherein the photohardenable material between the substrate and photomask is displaced when the substrate and photomask are brought into more intimate contact by an advancing line pressure.

Claim 33

The process of claim 30 wherein said advance line pressure employs a nip.

Claim 34

The process of claim 17 wherein in step c the exposed layer is applied in precise register with the substrate.

Claim 35

The process of claim 17 wherein excess photohardenable material is drained.

Claim 36

The process of claim 17 wherein the pressure is applied by use of pressure rollers.

Claim 37

The process of claim 17 wherein in addition to a first set of steps (a), (b), (c) and (d) a second set of steps (a), (b), (c) and (d) is performed in conjunction with a second photomask whereby discrete areas of photohardenable material are obtained on opposite surfaces of the substrate with said opposite substrate surfaces maintained without change of orientation throughout the combination of the first and second sets of steps.

Claim 38

The process of claim 35 wherein the sets of steps are performed concurrently.