Apparatus for treating a sample by a pulsed electron beam

Claim 1

An apparatus for the treatment of a sample by a pulsed electron comprising, in a vacuum enclosure, a cathode and an anode constituted by the actual anode and a grid, means for supplying the sample to be treated to the said vacuum enclosure, a high d.c. voltage generator, and (A) a first circuit for producing a plasma in pulsed manner from the cathode, said first circuit comprising (a) a capacitor of capacitance C 1 charged by means of the high d.c. voltage generator, said capacitor being provided with first and second coatings, (b) a spark gap switch enabling the initiation of the discharge of the capacitor of capacitance C 1 so as to produce a high voltage pulse between the cathode and the grid, said spark gap switch being arranged in series with the said capacitor, (c) means for producing pulses controlling the spark gap switch, (d) two resistors R 1 and R 2 connected in series with the capacitor of capacitance C 1 in such a way that one of the terminals of resistor R 1 is connected to the first coating of the said capacitor and wherein one of the terminals of resistor R 2 is connected to the second coating of said capacitor, the spark gap switch then being connected on the one hand to the first coating of the capacitor of capacitance C 1 and on the other hand to the other terminal of resistor R 1 , and wherein it also comprises the capacitor or capacitance C 2 connected in parallel with the circuit R 1 C 1 R 2 ; and (B) a second circuit separate from said first circuit for producing an electric field between the actual anode and the cathode enabling the acceleration and extraction of the electrons produced in such a way that they bombard the sample, said second circuit comprising a capacitor of capacitance C 2 , which is much higher than capacitance C 1 , capacitor C 2 being charged by a d.c. voltage generator and which can be discharged by the vacuum enclosure, so as to produce the electric field between the anode and the cathode.

Claim 2

An apparatus for the treatment of a sample by a pulsed electron comprising, in a vacuum enclosure, a cathode and an anode constituted by the actual anode and a grid, means for supplying the sample to be treated to the said vacuum enclosure, a high d.c. voltage generator, and (A) a first circuit for producing a plasma in pulsed manner from the cathode, said first circuit comprising (a) a capacitor of capacitance C 1 charged by means of the high d.c. voltage generator, said capacitor being provided with first and second coatings, (b) a spark gap switch enabling the initiation of the discharge of the capacitor of capacitance C 1 so as to produce a high voltage pulse between the cathode and the grid, said spark gap switch being arranged in series with the said capacitor, (c) means for producing pulses controlling the spark gap switch, (d) two resistors R 1 and R 2 connected in series with the capacitor of capacitance C 1 in such a way that one of the terminals of resistor R 1 is connected to the first coating of the said capacitor and wherein one of the terminals of resistor R 2 is connected to the second coating of said capacitor, the spark gap switch then being connected on the one hand to the first coating of the capacitor of capacitance C 1 and on the other hand to the other terminal of resistor R 1 , and wherein it also comprises the capacitor or capacitance C 2 connected in parallel with the circuit R 1 C 1 R 2 ; and (B) a second circuit separate from said first circuit for producing an electric field between the actual anode and the cathode enabling the acceleration and extraction of the electrons produced in such a way that they bombard the sample, said second circuit comprising a capacitor of capacitance C 2 , which is much higher than capacitance C 1 , capacitor C 2 being charged by a d.c. voltage generator and which can be discharged by the vacuum enclosure, so as to produce the electric field between the anode and the cathode.