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US4526856A Expired / Lapsed US ⏱️ 0.0 years remaining

Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents

Assignee: Honeywell International Inc
•
Filing: 1983-05-23
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Granted: 1985-07-02
•
Expires: 2003-05-23
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Abstract

Abstract A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

Inventors

  • 👤 James M. Lewis
  • 👤 Robert A. Owens
  • 👤 Richard F. Sweeney
  • 👤 Ronald W. Wake
  • 👤 Robert E. Rinehart

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 19:31
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/022; G03F7/0226; G03F7/0048; G03F7/016

Claims Analysis

Total Claims: 19
Claim 1
Independent Claim 117 words
A positive photoresist formulation capable of providing no observable striation and excellent wetting properties comprising an admixture in solution of: (a) a diazo ketone photosensitive compound (b) an alkali soluble resin (c) a cyclic ketone solvent selected from the group consisting of cyclopentanone and blends of cyclopentanone and cyclohexanone (d) an aliphatic alcohol solvent having from 6 to 12 carbon atoms and wherein the cyclic ketone comprises at least 20 percent of the total solvent and the alcohol comprises at least 10 percent of the total solvent and wherein (c) and (d) are present in an amount sufficient to provide at least low striation and good wetting properties to said formulation when used as a positive photoresist.
Claim 2
Dependent Claim 117 words
A positive photoresist formulation capable of providing no observable striation and excellent wetting properties comprising an admixture in solution of: (a) a diazo ketone photosensitive compound (b) an alkali soluble resin (c) a cyclic ketone solvent selected from the group consisting of cyclopentanone and blends of cyclopentanone and cyclohexanone (d) an aliphatic alcohol solvent having from 6 to 12 carbon atoms and wherein the cyclic ketone comprises at least 20 percent of the total solvent and the alcohol comprises at least 10 percent of the total solvent and wherein (c) and (d) are present in an amount sufficient to provide at least low striation and good wetting properties to said formulation when used as a positive photoresist.
Claim 3
Dependent Claim 11 words
The formulation of claim 1 wherein the cyclic ketone is cyclopentanone.
Claim 4
Dependent Claim 21 words
The formulation of claim 2 wherein the aliphatic alcohol solvent is selected from n-hexanol, n-octanol, 2-octanol, 1-heptanol, 2-methyl-1-pentanol and mixtures thereof.
Claim 5
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2,3,4-tris(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone
Claim 6
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2-hydroxy-3,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 7
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 8
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2,3-dihydroxy-4-(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 9
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2-hydroxy-4-(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 10
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2,3-dibromo-1-(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)propane.
Claim 11
Dependent Claim 11 words
The formulation of claim 1 wherein the photosensitive compound is 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 12
Dependent Claim 16 words
The formulation of claim 1 wherein the photosensitive compound is a mixture of 2-hydroxy-4-(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone and 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 13
Dependent Claim 17 words
The formulation of claim 1 wherein the photosensitive compound is a mixture of 2,3,4-tris(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone; 2-hydroxy-3,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone and 2,3-dihydroxy-4-(6-diazo-5-6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone.
Claim 14
Dependent Claim 11 words
The formulation of claim 1 wherein the aliphatic alcohol is 2-octanol.
Claim 15
Dependent Claim 11 words
The formulation of claim 1 wherein the aliphatic alcohol is 1-heptanol.
Claim 16
Dependent Claim 11 words
The formulation of claim 1 wherein the aliphatic alcohol is 2-methyl-1-pentanol.
Claim 17
Dependent Claim 11 words
The formulation of claim 1 wherein the aliphatic alcohol is n-hexanol.
Claim 18
Dependent Claim 11 words
The formulation of claim 1 wherein the aliphatic alcohol is n-octanol.
Claim 19
Dependent Claim 11 words
The formulation of claim 2 wherein the aliphatic alcohol is n-hexanol.

References Cited (Backward Citations)

US3471289A Cited
GB1073098A Cited
US3634086A Cited
US4123279A Cited
GB2023858A Cited
US4266001A Cited
US4377631A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-07-01 1988-12-31 1989-07-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-07-01 1992-12-31 1993-07-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-07-01 1996-12-31 1997-07-02 $7700.00 Window Closed / Lapsed

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