Spin drier for semiconductor material
Abstract
Abstract A spin drier including a casing and a rotor equipped with at least one holder for a carrier, which is adapted to enclose a semiconductor material such as a silicon wafer therein, and embraced in the casing so that the semiconductor material placed on the rotor is dried by a gas stream which has been introduced through an intake port provided above the rotor, passes through the rotor and is to be exhausted through an exhaust port formed through a circumferential wall of the casing. The rotor is provided with at least three guide members on the outer section thereof, and each guide member includes a substantially vertically disposed curved surface with its convex side faced inwardly. The described holder is positioned between two guide members, to thereby guide the above described gas flow and thus prevent water, dusts and/or stains located on the bottom wall and circumferential wall of the casing from flowing back onto the semiconductor materials.
Inventors
- 👤 Seiichiro Aigo
Bibliographic Details
Claims Analysis
Total Claims: 10References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-07-01 | 1988-12-31 | 1989-07-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-01 | 1992-12-31 | 1993-07-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-07-01 | 1996-12-31 | 1997-07-02 | $7700.00 | Window Closed / Lapsed |