US4513057A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming sulfide layers
Assignee: Raytheon Co
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Filing: 1984-01-23
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Granted: 1985-04-23
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Expires: 2004-01-23
Abstract
Abstract The specification discloses a low-temperature process for depositing a layer of a sulfide of a chosen element, such as zinc sulfide, on the surface of a substrate while simultaneously avoiding damage to the substrate. The process comprises exposing the substrate to a selected vapor phase reactant containing the chosen metal, such as dimethyl zinc, in the presence of neutral, charge-free sulfur atoms formed in a manner which avoids the generation of charged particles and high energy radiation that would damage the substrate. The sulfur atoms react with the vapor phase reactant to form the sulfide thereof, such as zinc sulfide, which deposits as a layer on the surface of the substrate. In a preferred process embodiment, the neutral sulfur atoms are generated by photochemical dissociation. In addition, there is disclosed a process for forming a native sulfide layer on the surface of a chosen substrate by exposing the substrate to neutral, charge-free sulfur atoms.
Inventors
- 👤 John W. Peters
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 14:05
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/482; C23C16/22; C23C16/30; C23C16/305; C23C16/306; H; H10; H10F; H10F71/00; H10F71/129; H10F77/00; H10F77/30; H10F77/306; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6338; H10P14/692; H10P14/6938; H10P14/6939; Y; Y10; Y10T; Y10T428/00; Y10T428/26; Y10T428/263; Y10T428/264; Y10T428/265
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
159 words
A semiconductor device having optimized electrical interface properties, formed by a process comprising the steps of: (a) providing a substrate of a chosen semiconductor material; (b) generating neutral sulfur atoms; (c) exposing said substrate to said neutral sulfur atoms to cause a chemical reaction between said neutral sulfur atoms and the surface of said substrate to form a first layer of a native sulfide of said chosen semiconductor material, said native sulfide being formed in a manner which eliminates damage to said substrate due to exposure to charged species, high energy radiation, or elevated temperatures to thereby enhance the electrical properties in said native sulfide layer and at said surface of said substrate; and (d) forming a second layer of a chosen dielectric passivation material on the surface of said first layer of said native sulfide, to form a native sulfide/insulator composite, whereby the interface of said substrate with said native sulfide/insulator composite has said optimized electrical interface properties.
Claim 2
Dependent Claim
159 words
A semiconductor device having optimized electrical interface properties, formed by a process comprising the steps of: (a) providing a substrate of a chosen semiconductor material; (b) generating neutral sulfur atoms; (c) exposing said substrate to said neutral sulfur atoms to cause a chemical reaction between said neutral sulfur atoms and the surface of said substrate to form a first layer of a native sulfide of said chosen semiconductor material, said native sulfide being formed in a manner which eliminates damage to said substrate due to exposure to charged species, high energy radiation, or elevated temperatures to thereby enhance the electrical properties in said native sulfide layer and at said surface of said substrate; and (d) forming a second layer of a chosen dielectric passivation material on the surface of said first layer of said native sulfide, to form a native sulfide/insulator composite, whereby the interface of said substrate with said native sulfide/insulator composite has said optimized electrical interface properties.
Claim 3
Dependent Claim
19 words
The semiconductor device set forth in claim 1 wherein said neutral sulfur atoms are generated by a photochemical reaction.
Claim 4
Dependent Claim
38 words
The semiconductor device set forth in claim 2 wherein said second layer of said chosen dielectric passivation material is a sulfide material and is formed by exposing a selected vapor phase reactant to photochemically generated neutral sulfur atoms.
Claim 5
Dependent Claim
17 words
The device set forth in claim 1 wherein said substrate has regions of predetermined conductivity defined therein.
Claim 6
Dependent Claim
58 words
The semiconductor device set forth in claim 3 wherein: (a) said chosen semiconductor material is mercury cadmium telluride; (b) said first layer of said native sulfide has a thickness of 20 to 50 angstroms; and (c) said dielectric passivation material is zinc sulfide and the thickness of said second layer of said passivation material is approximately 1000 angstroms.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1988-04-22 | 1988-10-22 | 1989-04-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-04-22 | 1992-10-22 | 1993-04-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-04-22 | 1996-10-22 | 1997-04-23 | $7700.00 | Window Closed / Lapsed |