US4504631A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist material
Assignee: Kureha Corp
•
Filing: 1983-05-31
•
Granted: 1985-03-12
•
Expires: 2003-05-31
Abstract
Abstract The photoresist material comprises a polymer having chloromethyl groups introduced therein and containing 2-isopropenylnaphthalene as one component, an average substitution degree of the chloromethyl groups based on the polymer is within a range of 0.2 to 5. The photoresist material has a high glass transition point, a high sensitivity to radiation and an excellent dry etching resistance, whereby it is suitably used for the manufacture of a semiconductor element using radiation and provides a good resolution on etching.
Inventors
- 👤 Hideaki Doi
- 👤 Kenichi Kokubun
- 👤 Teruo Sakagami
- 👤 Naohiro Murayama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 21:11
CPC Classifications
C; C08; C08F; C08F8/00; C08F8/18; C08F8/24
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
55 words
A photoresist material comprising: a polymer having chloromethyl groups attached thereto and containing 2-isopropenylnaphthalene as at least one polymerized component thereof, the average substitution degree of said chloromethyl groups based on said polymer being within the range of 0.2 to 5, the polymer containing polymerized 2-isopropenylnaphthalene in an amount of at least 10 mole %.
Claim 2
Dependent Claim
55 words
A photoresist material comprising: a polymer having chloromethyl groups attached thereto and containing 2-isopropenylnaphthalene as at least one polymerized component thereof, the average substitution degree of said chloromethyl groups based on said polymer being within the range of 0.2 to 5, the polymer containing polymerized 2-isopropenylnaphthalene in an amount of at least 10 mole %.
Claim 3
Dependent Claim
19 words
The photoresist material claimed in claim 1, wherein said polymer has a polymerization degree of not less than 40.
Claim 4
Dependent Claim
18 words
The photoresist material claimed in claim 1, wherein said polymer has polymerization degree ranging from 40 to 15,000.
Claim 5
Dependent Claim
16 words
The photoresist material claimed in claim 1, wherein said polymer is a chloromethylated homopolymer of 2-isopropenylnaphthalene.
Claim 6
Dependent Claim
22 words
The photoresist material claimed in claim 1, wherein said polymer is a chloromethylated copolymer containing 2-isopropenylnaphthalene as one component of the copolymer.
Claim 7
Dependent Claim
21 words
The photoresist material claimed in claim 1, wherein said copolymer contains 2-isopropenylnaphthalene in a mole ratio of from 10 to 90%.
Claim 8
Dependent Claim
24 words
The photoresist material claimed in claim 1, wherein said polymer is obtained by chloromethylating poly-2-isopropenylnaphtharene or a copolymer containing 2-isopropenylnaphthalene with chloromethyl methyl ether.
Claim 9
Dependent Claim
34 words
The photoresist material claimed in claim 1, wherein said polymer is obtained by copolymerising components consisting of 2-isopropenylnaphthalene and at least one other component, at least part of said other components having chloromethyl groups.
Claim 10
Dependent Claim
31 words
The photoresist material claimed in claim 5 or 8, wherein the other component of said copolymer is styrene, γ-methylstyrene, chloromethylated styrene, methyl methacrylate, glycidyl methacrylate or acrylonitrile, or a mixture thereof.
Claim 11
Dependent Claim
19 words
The photoresist material claimed in claim 5 or 8, wherein the other component of said copolymer is methyl methacrylate.
Claim 12
Dependent Claim
18 words
The photoresist material claimed in claim 5 or 8, wherein the other component of said copolymer is styrene.
Claim 13
Dependent Claim
21 words
The photoresist material claimed in claim 4, wherein said homopolymer has a glass transition point ranging from 230° to 240° C.
Claim 14
Dependent Claim
21 words
The photoresist material claimed in claim 11, wherein said copolymer has a glass transition point ranging from 105° to 230° C.
Claim 15
Dependent Claim
15 words
A radiation sensitive material comprising a polymer defined in anyone of claims 1 to 13.
References Cited (Backward Citations)
DE149671C
Cited
US2694702A
Cited
US3009906A
Cited
GB867769A
Cited
US3164575A
Cited
US3311602A
Cited
US3297648A
Cited
US3607989A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-03-11 | 1988-09-10 | 1989-03-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-03-11 | 1992-09-10 | 1993-03-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-03-11 | 1996-09-10 | 1997-03-12 | $7700.00 | Window Closed / Lapsed |