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US4496216A Expired / Lapsed US ⏱️ 0.0 years remaining

Method and apparatus for exposing photosensitive material

Assignee: Polaroid Corp
•
Filing: 1982-12-30
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Granted: 1985-01-29
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Expires: 2002-12-30
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Abstract

Abstract Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed.

Inventors

  • 👤 James J. Cowan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 15:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70408; G02; G02B; G02B5/00; G02B5/32; G03F7/20; G03F7/2002; G03F7/2004; G03F7/2006

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 79 words
An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises a laser; means for dividing the wavefront of said beam emanating from said laser into equal parts; at least three mirrors reflecting said divided beams, the number of said mirrors corresponding to the number of parts of said beam, and wherein said mirrors are located symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.
Claim 2
Independent Claim 79 words
An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises a laser; means for dividing the wavefront of said beam emanating from said laser into equal parts; at least three mirrors reflecting said divided beams, the number of said mirrors corresponding to the number of parts of said beam, and wherein said mirrors are located symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.
Claim 3
Dependent Claim 17 words
The apparatus of claim 1 where each of said sources are substantially equidistant from said photosensitive material.
Claim 4
Dependent Claim 17 words
The apparatus of claim 1 wherein the intensity of each of said sources is substantially the same.
Claim 5
Dependent Claim 10 words
The apparatus of claim 1 which includes three coherent beams.
Claim 6
Dependent Claim 10 words
The apparatus of claim 1 which includes four coherent beams.
Claim 7
Dependent Claim 13 words
The apparatus of claim 1 wherein said photosensitive material is a positive photoresist.
Claim 8
Dependent Claim 13 words
The apparatus of claim 1 wherein said photosensitive material is a negative photoresist.
Claim 9
Dependent Claim 24 words
The apparatus of claim 1 wherein said photosensitive material is carried on a light transmitting base and said exposure is made through said base.
Claim 10
Independent Claim 76 words
An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises a laser; means for dividing the amplitude of the beam emanating from said laser into at least three equal parts; separately expanding each of said divided beams by expansion lenses to impinge upon said photosensitive material; whereby said expansion lenses are arranged symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.
Claim 11
Independent Claim 76 words
An apparatus for simultaneously exposing a photosensitive material to at least three coherent beams of exposing radiation which comprises a laser; means for dividing the amplitude of the beam emanating from said laser into at least three equal parts; separately expanding each of said divided beams by expansion lenses to impinge upon said photosensitive material; whereby said expansion lenses are arranged symmetrically around an axis perpendicular to the plane of the surface of said photosensitive material.
Claim 12
Dependent Claim 17 words
The apparatus of claim 9 where each of said sources are substantially equidistant from said photosensitive material.
Claim 13
Dependent Claim 17 words
The apparatus of claim 9 wherein the intensity of each of said sources is substantially the same.
Claim 14
Dependent Claim 10 words
The apparatus of claim 9 which includes three coherent beams.
Claim 15
Dependent Claim 10 words
The apparatus of claim 9 which includes four coherent beams.
Claim 16
Dependent Claim 13 words
The apparatus of claim 9 wherein said photosensitive material is a positive photoresist.
Claim 17
Dependent Claim 13 words
The apparatus of claim 9 wherein said photosensitive material is a negative photoresist.
Claim 18
Dependent Claim 24 words
The apparatus of claim 9 wherein said photosensitive material is carried on a light transmitting base and said exposure is made through said base.

References Cited (Backward Citations)

US4421398A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-01-29 1988-07-30 1989-01-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-01-29 1992-07-30 1993-01-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-01-29 1996-07-30 1997-01-29 $7700.00 Window Closed / Lapsed

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