US4494004A
Expired / Lapsed
US
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Electron beam system
Assignee: International Business Machines Corp
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Filing: 1983-07-01
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Granted: 1985-01-15
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Expires: 2003-07-01
Abstract
Abstract An electron beam method and apparatus, for writing patterns, such as on semiconductor wafers, in which the writing field is divided into a large number of overlapping subfields with a predetermined periodicity. Subfield to subfield moves are made in a stepped sequential scan, such as raster, while patterns, within a subfield, are addressed using vector scan and written using a sequential scan. Significant improvement in throughput results by the use of this electron beam method and apparatus which preferably employs magnetic deflection for the sequential scanning the subfields and electric deflection for vector scanning within the subfield.
Inventors
- 👤 John L. Mauer, IV
- 👤 Michel S. Michail
- 👤 Ollie C. Woodard
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 20:11
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; B; B82; B82Y; B82Y10/00; B82Y40/00; H01J37/02; H01J37/04; H01J37/147; H01J37/1472; H01J37/1474; H01J2237/00; H01J2237/30; H01J2237/304; H01J2237/30472; H01J2237/30483; H01J2237/30488; H01J2237/30494; H01J2237/317; H01J2237/3175; H01J2237/31761; H01J2237/31764
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
114 words
In an electron beam system adapted for writing patterns within a writing field comprising: means for defining an electron beam of predetermined cross section and density; means for focusing said beam on a target area within the writing field; means for successively directing the beam, while blanked, along a path of a plurality of subfields of the writing field by a first deflection means until it reaches a preselected subfield; and means for vectoring the beam, while blanked, to a preselected area within said subfield with a second deflection means, whereat the beam is unblanked and a predetermined pattern is written in the preselected area by the beam while the target area is stationary.
Claim 2
Dependent Claim
114 words
In an electron beam system adapted for writing patterns within a writing field comprising: means for defining an electron beam of predetermined cross section and density; means for focusing said beam on a target area within the writing field; means for successively directing the beam, while blanked, along a path of a plurality of subfields of the writing field by a first deflection means until it reaches a preselected subfield; and means for vectoring the beam, while blanked, to a preselected area within said subfield with a second deflection means, whereat the beam is unblanked and a predetermined pattern is written in the preselected area by the beam while the target area is stationary.
Claim 3
Dependent Claim
28 words
The electron beam system of claim 1 wherein the first deflection means comprises magnetic means for scanning the beam to and positioning the beam in said preselected subfield.
Claim 4
Dependent Claim
28 words
The electron beam system of claim 1 wherein the second deflection means comprises electric means for vectoring the beam within the subfield to a pattern for writing thereof.
Claim 5
Dependent Claim
56 words
The electron beam system of claim 3 wherein each predetermined pattern within said preselected subfield is composed of one or more pattern elements connected to each other to form the pattern, and wherein the electric deflection means vectors the beam to a pattern followed by successively scanning each of the pattern elements to write the pattern.
Claim 6
Dependent Claim
40 words
The electron beam system of claim 4 wherein the periphery of the pattern is formed of small pattern elements while the interior of the pattern is formed of larger pattern elements so as to maximize throughput without degrading edge sharpness.
Claim 7
Dependent Claim
59 words
The electron beam system of claim 1 wherein said means for defining the electron beam comprises a spot shaping deflector and first and second spot shaping apertures so that, when shaping voltage signals are applied to the deflector, the first aperture beam image is caused to move laterally across the second aperture to permit varying the spot cross section.
Claim 8
Dependent Claim
27 words
The electron beam system of claim 1 wherein the system includes means for calibrating common points within overlapping adjacent subfields so as to assure subfield boundary matching.
Claim 9
Dependent Claim
67 words
The electron beam system of claim 7 wherein a predetermined pattern crosses over the boundary of two subfields and wherein said system includes means for controlling the exposure time of the beam so that a pattern element of the pattern in subfield overlap is during each subfield writing exposed at about one half the normal time used in the exposure of a pattern element in each subfield.
Claim 10
Independent Claim
98 words
A method of writing patterns with an electron beam comprising the steps of: defining a predetermined cross section and density of the electron beam; focusing the beam on a target area with a writing field; successively directing the beam, while blanked, along a path of a plurality of subfields of the writing field until it reaches a preselected subfield; and vectoring the beam, while blanked, to a preselected area within one of said subfields, whereat the beam is unblanked and a predetermined pattern is written in the preselected area by the beam while the target area is stationary.
Claim 11
Independent Claim
98 words
A method of writing patterns with an electron beam comprising the steps of: defining a predetermined cross section and density of the electron beam; focusing the beam on a target area with a writing field; successively directing the beam, while blanked, along a path of a plurality of subfields of the writing field until it reaches a preselected subfield; and vectoring the beam, while blanked, to a preselected area within one of said subfields, whereat the beam is unblanked and a predetermined pattern is written in the preselected area by the beam while the target area is stationary.
Claim 12
Dependent Claim
23 words
The electron beam writing method of claim 9 wherein the beam is magnetically deflected across the subfields and positioned in said one subfield.
Claim 13
Dependent Claim
24 words
The electron beam writing method of claim 9 wherein the beam is electrically vectored within said one subfield to a pattern for writing thereof.
Claim 14
Dependent Claim
57 words
The electron beam writing method of claim 11 wherein each of the predetermined patterns within said one subfield is composed of one or more pattern elements connected to each other to form the pattern, and wherein the beam is electrically vectored to a pattern followed by successively scanning each of the pattern elements to write the pattern.
Claim 15
Dependent Claim
49 words
The electron beam writing method of claim 12 wherein the pattern is written by scanning the periphery of the pattern which is formed of small pattern elements and the interior of the pattern which is formed of larger pattern elements so as to maximize throughput without degrading edge sharpness.
Claim 16
Dependent Claim
58 words
The electron beam writing method of claim 9 wherein the electron beam's cross section and density are defined by passing the beam through first and second apertures and deflecting the beam after it passes through the first aperture to cause the beam to move laterally across the second aperture so as to permit varying the beam cross section.
Claim 17
Dependent Claim
24 words
The electron beam writing method of claim 9 wherein common points within overlapping adjacent subfields are calibrated so as to assure subfield boundary matching.
Claim 18
Dependent Claim
60 words
The electron beam method of claim 15 wherein a predetermined pattern crosses over the boundary of two subfields, and wherein the beam's time of exposure is controlled so that a pattern element in the subfield overlap is during each subfield writing, exposed at about one half the normal time used in the exposure of a pattern element in each subfield.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-01-15 | 1988-07-16 | 1989-01-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-01-15 | 1992-07-16 | 1993-01-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-01-15 | 1996-07-16 | 1997-01-15 | $7700.00 | Window Closed / Lapsed |