Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
126 words
A step-wise process for the efficient deposition of silicon which comprises the steps of: a. reacting trichlorosilane and hydrogen to deposit silicon on a substrate in a deposition reaction; b. measuring the ratio of silicon to chlorine in the effluent from the said reaction; c. determining from said ratio the amount of silicon deposited; d. collecting a quantity of silicon bearing effluent from said reaction; e. continuing said deposition reaction using said quantity of silicon bearing effluent together with an additional quantity of trichlorosilane as an input to said deposition reaction, said additional quantity determined to make up the amount of silicon deposited in said deposition reaction; f. and repeating steps b through e until a steady-state equilibrium is reached between deposition reactor input and effluent.
Claim 2
Dependent Claim
126 words
A step-wise process for the efficient deposition of silicon which comprises the steps of: a. reacting trichlorosilane and hydrogen to deposit silicon on a substrate in a deposition reaction; b. measuring the ratio of silicon to chlorine in the effluent from the said reaction; c. determining from said ratio the amount of silicon deposited; d. collecting a quantity of silicon bearing effluent from said reaction; e. continuing said deposition reaction using said quantity of silicon bearing effluent together with an additional quantity of trichlorosilane as an input to said deposition reaction, said additional quantity determined to make up the amount of silicon deposited in said deposition reaction; f. and repeating steps b through e until a steady-state equilibrium is reached between deposition reactor input and effluent.
Claim 3
Dependent Claim
20 words
The process of claim 1 further comprising: continuing said deposition in a continuous manner after said steady-state equilibrium is reached.
Claim 4
Dependent Claim
98 words
In a process for depositing silicion wherein a silicon bearing reactant and hydrogen are reacted in a deposition reactor to deposit silicon on a substrate and wherein a silicon-bearing effluent is produced, the improvement which comprises: reacting trichlorosilane and hydrogen to initiate said process and to deposit an amount of silicon; thereafter, in a step-wise manner, collecting a quantity of said effluent, and using said quantity of said effluent together with an amount of trichlorosilane as reactant input to the next step of said process, said amount of trichlorosilane determined to make up said amount of silicon deposited.
Claim 5
Dependent Claim
98 words
In a process for depositing silicion wherein a silicon bearing reactant and hydrogen are reacted in a deposition reactor to deposit silicon on a substrate and wherein a silicon-bearing effluent is produced, the improvement which comprises: reacting trichlorosilane and hydrogen to initiate said process and to deposit an amount of silicon; thereafter, in a step-wise manner, collecting a quantity of said effluent, and using said quantity of said effluent together with an amount of trichlorosilane as reactant input to the next step of said process, said amount of trichlorosilane determined to make up said amount of silicon deposited.
Claim 6
Dependent Claim
37 words
The process of claim 3 wherein the improvement further comprises: after equilibrium is achieved, continuing said process in a continuous manner with said silicon-bearing effluent together with an additional amount of trichlorosilane used directly as an input.
Claim 7
Dependent Claim
31 words
The process of claim 3 wherein the improvement further comprises: adjusting the amount of hydrogen input to each step of said process to maintain a predetermined ratio of chlorine to hydrogen.
Claim 8
Dependent Claim
12 words
The process of claim 5 wherein said predetermined ratio is about 0.1.
Claim 9
Dependent Claim
21 words
The process of claim 3 wherein the improvement further comprises adding an amount of dopant to each step of said process.
Claim 10
Dependent Claim
24 words
The process of claim 7 wherein said amount of dopant is adjusted with each step of said process to maintain a predetermined doping level.
Claim 11
Dependent Claim
28 words
The process of claim 3 wherein said silicon-bearing reactant and said hydrogen are reacted in a box system and wherein said substrate comprises interior walls of said box.
Claim 12
Dependent Claim
11 words
The process of claim 9 wherein said box comprises demountable sides.
Claim 13
Dependent Claim
25 words
The process of claim 3 wherein said amount of silicon deposited is determined by measuring the silicon to chlorine ratio of said deposition reactor effluent.