US4489171A
Expired / Lapsed
US
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Tantalum (V) halide/oxide-metal oxide compositions and a process for their preparation
Assignee: Shell USA Inc
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Filing: 1983-08-29
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Granted: 1984-12-18
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Expires: 2003-08-29
Abstract
Abstract Compositions are disclosed which comprise metal oxide substrates having tantalum (V) halide(s)/oxide(s) bound to the surface thereof.
Inventors
- 👤 Thomas H. Johnson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 06:46
CPC Classifications
B; B01; B01J; B01J23/00; B01J23/16; B01J23/20; B01J27/00; B01J27/06; B01J27/08
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
50 words
A process for preparing a metal oxide substrate having a tantalum (V) halide(s)/oxide(s) bound to the surface thereof which process comprises subliming a tantalum pentahalide and reacting in a substantially anhydrous and oxygen-free atmosphere the vapor therefrom with a substantially anhydrous metal oxide substrate having surface hydroxyl groups attached thereto.
Claim 2
Dependent Claim
50 words
A process for preparing a metal oxide substrate having a tantalum (V) halide(s)/oxide(s) bound to the surface thereof which process comprises subliming a tantalum pentahalide and reacting in a substantially anhydrous and oxygen-free atmosphere the vapor therefrom with a substantially anhydrous metal oxide substrate having surface hydroxyl groups attached thereto.
Claim 3
Dependent Claim
22 words
The process of claim 1 wherein said metal oxide substrate contains a major portion of silica or alumina or a mixture thereof.
Claim 4
Dependent Claim
15 words
The process claims 1 or 2 wherein said halide is chloride, or a mixture thereof.
Claim 5
Dependent Claim
81 words
A process for preparing a metal oxide substrate having a mixture of tantalum (V) chloride/oxide and tantalum (V) fluoride/oxide bound to the surface thereof which process comprises: a. subliming tantalum pentachloride and reacting in a substantially anhydrous and oxygen-free atmosphere the vapor therefrom with a substantially anhydrous metal oxide substrate having surface hydroxyl groups attached thereto, b. contacting the product of step (a) with an oxygen-containing gas and c. the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 6
Dependent Claim
81 words
A process for preparing a metal oxide substrate having a mixture of tantalum (V) chloride/oxide and tantalum (V) fluoride/oxide bound to the surface thereof which process comprises: a. subliming tantalum pentachloride and reacting in a substantially anhydrous and oxygen-free atmosphere the vapor therefrom with a substantially anhydrous metal oxide substrate having surface hydroxyl groups attached thereto, b. contacting the product of step (a) with an oxygen-containing gas and c. the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 7
Dependent Claim
22 words
The process of claim 4 wherein said metal oxide substrate has a major component of silica or alumina or a mixture thereof.
Claim 8
Dependent Claim
121 words
A composition comprising pentavalent tantalum, halogen, oxygen and a metal oxide substrate wherein at least one valence of tantalum is bound to oxygen which is bound to the substrate, at least one valence at the tantalum is bound to halogen and the remaining tantalum valences are bound to halogen and/or oxygen which may or may not be bound to the substrate wherein said halogen is a mixture of chloride and fluoride and is prepared by a process which comprises: a. reacting a substantially anhydrous, hydroxyl-containing metal oxide substrate with tantalum pentachloride in the vapor state, b. contacting the product of step (a) with an oxygen-containing atmosphere and c. contacting the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 9
Dependent Claim
121 words
A composition comprising pentavalent tantalum, halogen, oxygen and a metal oxide substrate wherein at least one valence of tantalum is bound to oxygen which is bound to the substrate, at least one valence at the tantalum is bound to halogen and the remaining tantalum valences are bound to halogen and/or oxygen which may or may not be bound to the substrate wherein said halogen is a mixture of chloride and fluoride and is prepared by a process which comprises: a. reacting a substantially anhydrous, hydroxyl-containing metal oxide substrate with tantalum pentachloride in the vapor state, b. contacting the product of step (a) with an oxygen-containing atmosphere and c. contacting the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 10
Dependent Claim
128 words
A composition comprising pentavalent tantalum, halogen, oxygen and a metal oxide substrate wherein at least one valence of tantalum is bound to oxygen which is bound to the substrate, at least one valence at the tantalum is bound to halogen and the remaining tantalum valences are bound to halogen and/or oxygen which may or may not be bound to the substrate wherein said halogen is a mixture of chloride and fluoride and is prepared by a process which comprises: a. subliming tantalum pentachloride and reacting in a substantially anhydrous and oxygen-free atmosphere vapor therefrom with a substantially anhydrous, hydroxyl-containing metal oxide substrate, b. contacting the product of step (a) with an oxygen-containing atmosphere and c. contacting the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 11
Dependent Claim
128 words
A composition comprising pentavalent tantalum, halogen, oxygen and a metal oxide substrate wherein at least one valence of tantalum is bound to oxygen which is bound to the substrate, at least one valence at the tantalum is bound to halogen and the remaining tantalum valences are bound to halogen and/or oxygen which may or may not be bound to the substrate wherein said halogen is a mixture of chloride and fluoride and is prepared by a process which comprises: a. subliming tantalum pentachloride and reacting in a substantially anhydrous and oxygen-free atmosphere vapor therefrom with a substantially anhydrous, hydroxyl-containing metal oxide substrate, b. contacting the product of step (a) with an oxygen-containing atmosphere and c. contacting the product of step (b) with a liquid or gaseous fluorinated hydrocarbon.
Claim 12
Dependent Claim
22 words
The compositions of claims 6 or 7 wherein said metal oxide has a major component of silica, or alumina or mixtures thereof.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-12-18 | 1988-06-18 | 1988-12-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-12-18 | 1992-06-18 | 1992-12-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-12-18 | 1996-06-18 | 1996-12-18 | $7700.00 | Window Closed / Lapsed |