US4484538A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for providing depletion-free uniform thickness CVD thin-film on semiconductor wafers
Assignee: BTU Engineering Corp
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Filing: 1983-11-16
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Granted: 1984-11-27
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Expires: 2003-11-16
Abstract
Abstract A novel apparatus for forming depletion-free uniform thickness CVD thin-film on semiconductor wafers includes a diffusion furnace, a boat loader coupled to the furnace for loading and removing a batch of semiconductor wafers into and out of the furnace, and a semiconductor wafer support boat for removably retaining a plurality of vertically oriented semiconductor wafers on the boat. The boat includes supporting surfaces so arranged that depletion-free uniform thickness thin-film is provided on both sides of each of the vertically oriented wafers. The semiconductor wafer support boat preferably includes two laterally spaced elongated rails each having an undulatory longitudinal section defining plural ridge portions spaced apart by plural valley portions. The ridges on one of the rails are provided with transverse slots that cooperate with confronting transverse slots provided on the confronting ridge portions on the other one of the rails to define a plurality of wafer edge receiving channels. The valley portions of the walls of the rails effectively shift the depletion zone away from each wafer edge receiving channel, thereby providing depletion-free uniform thickness CVD thin-film. The system may advantageously be employed for low temperature photochemical and photosensitized vacuum chemical vapor deposition processes.
Inventors
- 👤 Robert F. Sarkozy
- 👤 Morris Simson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:34
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587; C30; C30B; C30B25/00; C30B25/02; C30B25/12; C30B31/00; C30B31/06; C30B31/14
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
190 words
A chemical vapor deposition apparatus for providing depletion-free uniform thickness thin-film on semiconductor wafers, comprising: a cylindrical diffusion tube defining a reaction chamber; means coupled to said diffusion tube for controllably providing a selected temperature in said reaction chamber; means coupled to said tube for providing an intended pressure in said reaction chamber; means coupled to said tube for uniformly injecting reactant in gas phase into said reaction chamber; means including a longitudinally extending arm for loading said substrates into said reaction chamber and for removing the wafers from said chambers; and a boat supported on said arm for removably retaining said plurality of wafers in said reaction chamber with the plane of each of said wafers generally coincident with the vertical plane and spaced apart longitudinally in parallel relation along said reaction chamber, said boat including means defining a plurality of ridges that are selectively spaced apart longitudinally by respective intermediate structural portions, each of the intermediate structural portions sloping laterally and downwardly away from a corresponding one of adjacent ridges defining a valley between adjacent ridges; each of said ridges having a transversely extending wafer edge receiving slot.
Claim 2
Dependent Claim
190 words
A chemical vapor deposition apparatus for providing depletion-free uniform thickness thin-film on semiconductor wafers, comprising: a cylindrical diffusion tube defining a reaction chamber; means coupled to said diffusion tube for controllably providing a selected temperature in said reaction chamber; means coupled to said tube for providing an intended pressure in said reaction chamber; means coupled to said tube for uniformly injecting reactant in gas phase into said reaction chamber; means including a longitudinally extending arm for loading said substrates into said reaction chamber and for removing the wafers from said chambers; and a boat supported on said arm for removably retaining said plurality of wafers in said reaction chamber with the plane of each of said wafers generally coincident with the vertical plane and spaced apart longitudinally in parallel relation along said reaction chamber, said boat including means defining a plurality of ridges that are selectively spaced apart longitudinally by respective intermediate structural portions, each of the intermediate structural portions sloping laterally and downwardly away from a corresponding one of adjacent ridges defining a valley between adjacent ridges; each of said ridges having a transversely extending wafer edge receiving slot.
Claim 3
Dependent Claim
42 words
The apparatus of claim 1, wherein said means includes first and second rails in laterally spaced relation, where each rail has a plurality of spaced ridges, adjacent ones of which are separated by a valley, and means for fastening said rails together.
Claim 4
Dependent Claim
23 words
The apparatus of claim 2, wherein said fastening means includes a plurality of transversely extending rods fastened between confronting apexes of said valleys.
Claim 5
Dependent Claim
22 words
The apparatus of claim 3, wherein said transversely extending rods are tack-welded at their ends to respective ones of said confronting apexes.
Claim 6
Dependent Claim
30 words
The apparatus of claim 2, further including means connected to said diffusion tube for energizing said reactant in gas phase in said reaction chamber with light at a selected wavelength.
Claim 7
Dependent Claim
16 words
The apparatus of claim 2, wherein said rails have a longitudinal section defining an undulatory shape.
Claim 8
Dependent Claim
16 words
The apparatus of claim 6, wherein said rails define a longitudinal section having a sawtooth shape.
Claim 9
Dependent Claim
89 words
Apparatus for use with a CVD diffusion furnace for providing depletion-free uniform thickness thin-film on semiconductor wafers, comprising: a boat for removably retaining a plurality of semiconductor wafers, with the plane of each of the wafers coincident with the vertical plane and longitudinally spaced apart in parallel orientation, said boat including an elongated structural member having a plurality of ridge portions selectively spaced apart longitudinally by respective intermediate portions defining a valley between adjacent ridge portions, each of said ridge portions having a transversely extending wafer edge receiving slot.
Claim 10
Dependent Claim
89 words
Apparatus for use with a CVD diffusion furnace for providing depletion-free uniform thickness thin-film on semiconductor wafers, comprising: a boat for removably retaining a plurality of semiconductor wafers, with the plane of each of the wafers coincident with the vertical plane and longitudinally spaced apart in parallel orientation, said boat including an elongated structural member having a plurality of ridge portions selectively spaced apart longitudinally by respective intermediate portions defining a valley between adjacent ridge portions, each of said ridge portions having a transversely extending wafer edge receiving slot.
Claim 11
Dependent Claim
32 words
The apparatus of claim 8, wherein said elongated structural member includes a first side rail, and further including a second elongated side rail in laterally spaced relation with said first side rail.
Claim 12
Dependent Claim
28 words
The apparatus of claim 9, further including means for fastening said first and second side rails together with confronting slots colinearally aligned defining a wafer edge receiving channel.
Claim 13
Dependent Claim
19 words
The apparatus of claim 10, wherein each of said side rails defines a longitudinal section having an undulatory shape.
Claim 14
Dependent Claim
19 words
The apparatus of claim 11, wherein each of said side rails defines a longitudinal section having a sawtooth shape.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-11-27 | 1988-05-28 | 1988-11-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-11-27 | 1992-05-28 | 1992-11-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-11-27 | 1996-05-28 | 1996-11-27 | $7700.00 | Window Closed / Lapsed |