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US4483107A Expired / Lapsed US ⏱️ 0.0 years remaining

Polishing method for electrophotographic photoconductive member

Assignee: Konica Minolta Inc
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Filing: 1982-12-07
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Granted: 1984-11-20
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Expires: 2002-12-07
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Abstract

Abstract A method of polishing an electrophotographic photoconductive member, which comprises polishing said surface with polishing particles selected from the group consisting of solid organic polishing particles composed of a polysilsesquioxane having, on its silicon atoms, substituents selected from a lower alkyl group having 2 to 5 carbon atoms, an alkoxy group, an aryl group and an aralkyl group; a combination of said solid organic polishing particles and solid inorganic polishing particles; and a combination of solid organic polishing particles composed of polymethylsilsesquioxane and solid inorganic polishing particles.

Inventors

  • 👤 Kageyuki Tomoyori
  • 👤 Tatsuo Uchida
  • 👤 Tadashi Noda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 19:19
CPC Classifications
B; B24; B24B; B24B1/00; C; C09; C09K; C09K3/00; C09K3/14

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 110 words
A method of polishing an electrophotographic conductive member, which comprises polishing said member with polishing particles selected from the group consisting of (1) solid organic polishing particles composed of a polysilsesquioxane having, on its silicon atoms, substituents selected from the group consisting of a lower alkyl group having 2 to 5 carbon atoms, an alkoxy group, an aryl group and an aralkyl group; (2) a combination of said solid organic polishing particles and solid inorganic polishing particles in a weight ratio of 9:1 to 1:9; and (3) a combination of solid organic polishing particles composed of polymethylsilsesquioxane and solid inorganic polishing particles in a weight ratio of 9:1 to 1:9.
Claim 2
Independent Claim 110 words
A method of polishing an electrophotographic conductive member, which comprises polishing said member with polishing particles selected from the group consisting of (1) solid organic polishing particles composed of a polysilsesquioxane having, on its silicon atoms, substituents selected from the group consisting of a lower alkyl group having 2 to 5 carbon atoms, an alkoxy group, an aryl group and an aralkyl group; (2) a combination of said solid organic polishing particles and solid inorganic polishing particles in a weight ratio of 9:1 to 1:9; and (3) a combination of solid organic polishing particles composed of polymethylsilsesquioxane and solid inorganic polishing particles in a weight ratio of 9:1 to 1:9.
Claim 3
Dependent Claim 52 words
The method as claimed in claim 1, wherein said polishing particles are solid organic polishing particles composed of a polysilsesquioxane having, on its silicon atoms, substituents selected from the group consisting of a lower alkyl group having 2 to 5 carbon atoms, an alkoxy group, an aryl group and an aralkyl group.
Claim 4
Dependent Claim 62 words
The method as claimed in claim 1, wherein said polishing particles are a combination of solid organic polishing particles composed of (i) a polysilsesquioxane having, on its silicon atoms, substituents selected from the group consisting of a lower alkyl group having 1 to 5 carbon atoms, an alkoxy group, an aryl group and an aralkyl group, and (ii) solid inorganic polishing particles.
Claim 5
Dependent Claim 34 words
The method as claimed in claim 1, 2 or 3, wherein said substituents are the lower alkyl group and said lower alkyl group is selected from the group consisting of ethyl, propyl and butyl.
Claim 6
Dependent Claim 33 words
The method as claimed in claim 1, 2 or 3, wherein said substituents are the alkoxy group and said alkoxy group is selected from the group consisting of methoxy, ethoxy, propoxy and butoxy.
Claim 7
Dependent Claim 23 words
The method as claimed in claim 1, 2 or 3, wherein said substituents are the aryl group and said aryl group is phenyl.
Claim 8
Dependent Claim 23 words
The method as claimed in claim 1, 2 or 3, wherein said substituents are the aralkyl group and said aralkyl group is benzyl.
Claim 9
Dependent Claim 26 words
The method as claimed in claim 2 or 3, wherein the solid organic polishing particles have an average particle size of from 1 to 50 microns.
Claim 10
Dependent Claim 24 words
The method as claimed in claim 8, wherein the solid organic polishing particles have an average particle size of from 2 to 20 microns.
Claim 11
Dependent Claim 39 words
The method as claimed in claim 3, wherein the solid organic polishing particles have an average particle size of at least 7 microns and the solid inorganic polishing particles have an average particle size of at most 5 microns.
Claim 12
Dependent Claim 40 words
The method as claimed in claim 1, 2 or 3, wherein said electrophotographic photoconductive member comprises a photoconductive layer composed of selenium or a selenium-alloy containing one or more elements selected from the group consisting of tellurium, arsenic and antimony.

References Cited (Backward Citations)

US3017386A Cited
US3208972A Cited
US3318844A Cited
US3372133A Cited
JPS5479037A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-11-20 1988-05-21 1988-11-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-11-20 1992-05-21 1992-11-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-11-20 1996-05-21 1996-11-20 $7700.00 Window Closed / Lapsed

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