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US4481340A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive polyamic acid derivative, compound used in manufacture of derivative, method of manufacturing substrate having polyimide layer, and semiconductor device made from said method

Assignee: Zande Johan M V D
•
Filing: 1983-01-24
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Granted: 1984-11-06
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Expires: 2003-01-24
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Abstract

Abstract A photosensitive polyamic acid derivative obtained by treating polyamic acid with a compound of the formula (1), compound of formula (1), method of manufacturing a substrate having a polyimide layer by providing the substrate with a layer of the photosensitive polyamic acid derivative and then exposing, developing and imidizing the layer, as well as a semiconductor device comprising a polyimide layer obtained by using the above-mentioned method.

Inventors

  • 👤 Lourens Minnema
  • 👤 Johan M. van der Zande

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 18:02
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0387

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 57 words
A photosensitive polyamic acid derivative obtained by treating a polyamic acid with a compound of the formula ##STR12## wherein R 2 and R 3 are equal or different and represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R 1 is an alkyl group having 1-4 carbon atoms, and m has the value 0-3.
Claim 2
Dependent Claim 57 words
A photosensitive polyamic acid derivative obtained by treating a polyamic acid with a compound of the formula ##STR12## wherein R 2 and R 3 are equal or different and represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R 1 is an alkyl group having 1-4 carbon atoms, and m has the value 0-3.
Claim 3
Dependent Claim 25 words
A photosensitive polyamic acid derivative obtained by treating polyamic acid with a compound of the formula ##STR13## wherein n has the value 0 or 1.
Claim 4
Dependent Claim 25 words
A photosensitive polyamic acid derivative obtained by treating polyamic acid with a compound of the formula ##STR13## wherein n has the value 0 or 1.

References Cited (Backward Citations)

US4107174A Cited
US4243743A Cited
US4331705A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-11-06 1988-05-07 1988-11-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-11-06 1992-05-07 1992-11-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-11-06 1996-05-07 1996-11-06 $7700.00 Window Closed / Lapsed

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