US4472824A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography
Assignee: SVG Lithography Systems Inc
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Filing: 1982-08-04
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Granted: 1984-09-18
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Expires: 2002-08-04
Abstract
Abstract This invention relates to apparatus for effecting alignment and spacing control of a mask and wafer for use, for example, in x-ray lithography, which includes, in combination, two optical channels for effecting lateral and vertical alignment at two spaced alignment targets respectively on the element, two spaced position sensors located on a line which is oblique with respect to a line joining the two alignment targets, and linkage for maintaining the distances between the position sensors and the element equal one to the other.
Inventors
- 👤 W. Derek Buckley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 14:16
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7003; G03F9/7023
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
78 words
Apparatus for effecting alignment and spacing control of a mask or wafer element for use in x-ray lithography comprising, in combination, two optical channel means for effecting lateral and vertical alignment at two spaced alignment targets respectively on said element, two spaced position sensors located on a line which is oblique with respect to a line joining said two alignment targets, and means for maintaining the distances between the position sensors and the element equal to each other.
Claim 2
Dependent Claim
78 words
Apparatus for effecting alignment and spacing control of a mask or wafer element for use in x-ray lithography comprising, in combination, two optical channel means for effecting lateral and vertical alignment at two spaced alignment targets respectively on said element, two spaced position sensors located on a line which is oblique with respect to a line joining said two alignment targets, and means for maintaining the distances between the position sensors and the element equal to each other.
Claim 3
Dependent Claim
76 words
Apparatus for effecting alignment and spacing control of a mask or wafer element for use in x-ray lithography comprising, in combination, two optical channel means for effecting lateral and vertical alignment at two spaced alignment targets respectively on said element, two spaced position sensors located on a line which is perpendicular to a line joining said two alignment targets, and means for maintaining the distances between the position sensors and the element equal to each other.
Claim 4
Dependent Claim
76 words
Apparatus for effecting alignment and spacing control of a mask or wafer element for use in x-ray lithography comprising, in combination, two optical channel means for effecting lateral and vertical alignment at two spaced alignment targets respectively on said element, two spaced position sensors located on a line which is perpendicular to a line joining said two alignment targets, and means for maintaining the distances between the position sensors and the element equal to each other.
Claim 5
Dependent Claim
22 words
Apparatus according to claim 2 wherein said position sensors are of substantially equal distance from the line joining the two alignment targets.
Claim 6
Dependent Claim
32 words
Apparatus according to any one of claims 1, 2 or 3 wherein said element is substantially circular and said line joining said two alignment targets passes through the center of the element.
References Cited (Backward Citations)
US4335313A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-09-18 | 1988-03-19 | 1988-09-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-09-18 | 1992-03-19 | 1992-09-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-09-18 | 1996-03-19 | 1996-09-18 | $7700.00 | Window Closed / Lapsed |