Method of manufacturing a solar cell

Claim 1

A method of manufacturing a solar cell comprising the steps of: providing a silicon substrate of a first conductivity type; forming a first amorphous silicon layer including a dopant on said silicon substrate; forming a second amorphous silicon layer without dopant on said first amorphous silicon layer; and laser beam irradiating said second layer to cause the formation of a junction with said silicon substrate.

Claim 2

A method of manufacturing a solar cell comprising the steps of: providing a silicon substrate of a first conductivity type; forming a first amorphous silicon layer including a dopant on said silicon substrate; forming a second amorphous silicon layer without dopant on said first amorphous silicon layer; and laser beam irradiating said second layer to cause the formation of a junction with said silicon substrate.

Claim 3

A method of manufacturing a solar cell comprising the steps of: providing a silicon substrate of a first conductivity type; forming an undoped amorphous silicon layer on said silicon substrate; forming a layer including a dopant on said first amorphous silicon layer, said layer being of a lower laser absorption index than that of said first amorphous layer; and laser beam irradiating the dopant containing layer to cause the formation of a junction with said silicon substrate.

Claim 4

A method of manufacturing a solar cell comprising the steps of: providing a silicon substrate of a first conductivity type; forming an undoped amorphous silicon layer on said silicon substrate; forming a layer including a dopant on said first amorphous silicon layer, said layer being of a lower laser absorption index than that of said first amorphous layer; and laser beam irradiating the dopant containing layer to cause the formation of a junction with said silicon substrate.

Claim 5

A method of manufacturing a solar cell comprising the steps of: providing a boron-doped p-type substrate having first and second major surfaces; providing a first front side n-doped amorphous silicon layer on the first surface of the substrate; providing a second front side non-doped amorphous silicon layer over the first doped amorphous silicon layer to increase laser absorption and to protect the first doped amorphous silicon layer from contamination; first laser beam irradiating the first and second amorphous layers to form an n + layer and create a semiconductor junction with said substrate; forming a first backside boron doped layer on said second surface of the substrate; forming a second backside non-doped layer over said first backside boron-doped layer; second laser beam irradiating the backside boron-doped and non-doped layers to form a p + layer; providing a front electrode on the n + layer; providing a back electrode on the p + layer.

Claim 6

A method of manufacturing a solar cell comprising the steps of: providing a boron-doped p-type substrate having first and second major surfaces; providing a first front side n-doped amorphous silicon layer on the first surface of the substrate; providing a second front side non-doped amorphous silicon layer over the first doped amorphous silicon layer to increase laser absorption and to protect the first doped amorphous silicon layer from contamination; first laser beam irradiating the first and second amorphous layers to form an n + layer and create a semiconductor junction with said substrate; forming a first backside boron doped layer on said second surface of the substrate; forming a second backside non-doped layer over said first backside boron-doped layer; second laser beam irradiating the backside boron-doped and non-doped layers to form a p + layer; providing a front electrode on the n + layer; providing a back electrode on the p + layer.

Claim 11

A method of manufacturing a solar cell comprising the steps of: providing a p-type boron doped silicon substrate having first and second major surfaces; etching the first surface of the substrate to reduce light reflection on the first surface by forming a plurality of pyramid-like projections; forming a first amorphous silicon layer on the etched surface of the silicon substrate; forming a phosphorus glass layer on the amorphous silicon layer; forming a second amorphous silicon layer on the phosphorus glass layer so that the glass layer is sandwiched between said amorphous silicon layers; laser beam irradiating the first and second amorphous silicon layers and the phosphorus glass layer to diffuse phosphorus into the first amorphous silicon layer thereby forming an n + layer and a semiconductor junction with the substrate; removing the second amorphous silicon layer and the phosphorus glass layer; depositing a boron doped layer onto the second surface of the substrate; second laser beam irradiating the boron doped layer to form a p + layer; providing a front electrode on the n + layer; and providing a back electrode on the p + layer.

Claim 12

A method of manufacturing a solar cell comprising the steps of: providing a p-type boron doped silicon substrate having first and second major surfaces; etching the first surface of the substrate to reduce light reflection on the first surface by forming a plurality of pyramid-like projections; forming a first amorphous silicon layer on the etched surface of the silicon substrate; forming a phosphorus glass layer on the amorphous silicon layer; forming a second amorphous silicon layer on the phosphorus glass layer so that the glass layer is sandwiched between said amorphous silicon layers; laser beam irradiating the first and second amorphous silicon layers and the phosphorus glass layer to diffuse phosphorus into the first amorphous silicon layer thereby forming an n + layer and a semiconductor junction with the substrate; removing the second amorphous silicon layer and the phosphorus glass layer; depositing a boron doped layer onto the second surface of the substrate; second laser beam irradiating the boron doped layer to form a p + layer; providing a front electrode on the n + layer; and providing a back electrode on the p + layer.

Claim 14

A method of manufacturing a solar cell comprising the steps of: providing a p-type substrate having first and second major surfaces; forming a layer of amorphous silicon on the first surface; coating the amorphous silicon layer with an alcohol solution of ester silicate; drying the alcohol ester solution; first laser beam irradiating the coated amorphous silicon layer to at least partially melt the amorphous silicon layer causing phosphorus to be absorbed and diffused into the amorphous silicon layer thereby forming an n + layer; simultaneous with said laser beam irradiating, indirectly heating the coated amorphous layer to at least partially transform it into a stable antireflection layer; applying an aluminum paste on the second surface of the substrate; drying the aluminum paste; second laser beam irradiating the dried aluminum paste layer to form a p + layer; removing any excess aluminum paste; photoresist etching the antireflection layer to form openings exposing portions of the n + layer; plating metal into the openings in contact with the exposed portions of the n + layer to form a front electrode; and plating metal onto the p + layer to form a back electrode.

Claim 15

A method of manufacturing a solar cell comprising the steps of: providing a p-type substrate having first and second major surfaces; forming a layer of amorphous silicon on the first surface; coating the amorphous silicon layer with an alcohol solution of ester silicate; drying the alcohol ester solution; first laser beam irradiating the coated amorphous silicon layer to at least partially melt the amorphous silicon layer causing phosphorus to be absorbed and diffused into the amorphous silicon layer thereby forming an n + layer; simultaneous with said laser beam irradiating, indirectly heating the coated amorphous layer to at least partially transform it into a stable antireflection layer; applying an aluminum paste on the second surface of the substrate; drying the aluminum paste; second laser beam irradiating the dried aluminum paste layer to form a p + layer; removing any excess aluminum paste; photoresist etching the antireflection layer to form openings exposing portions of the n + layer; plating metal into the openings in contact with the exposed portions of the n + layer to form a front electrode; and plating metal onto the p + layer to form a back electrode.