US4468447A
Expired / Lapsed
US
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Photosensitive bisazide composition for dry development
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1983-03-04
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Granted: 1984-08-28
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Expires: 2003-03-04
Abstract
Abstract A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming bisazide compound as a photocuring agent, is disclosed. The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.
Inventors
- 👤 Wataru Kanai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 11:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/108; Y10S430/109; Y10S430/111; Y10S430/128
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
95 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting as the polymer, a copolymer of glycidyl methacrylate having a molecular weight from tens of thousands to two million; and (b) selecting as the subliming bisazide compound, a photocuring-effective amount of subliming bisazide compounds represented by the general formula: ##STR2## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 2
Dependent Claim
95 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting as the polymer, a copolymer of glycidyl methacrylate having a molecular weight from tens of thousands to two million; and (b) selecting as the subliming bisazide compound, a photocuring-effective amount of subliming bisazide compounds represented by the general formula: ##STR2## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 3
Dependent Claim
48 words
A composition as claimed in claim 1 wherein said polymer is a homopolymer selected from the group consisting of polymethyl isopropenyl ketone, polyisopropyl vinyl ketone, and polyphenyl vinyl ketone and a copolymer selected from the group consisting of a copolymer of isopropyl vinyl ketone and methyl vinyl ketone
Claim 4
Dependent Claim
13 words
The composition of claim 2 in which the polymer is polymethyl isopropenyl ketone.
Claim 5
Dependent Claim
16 words
The composition of claim 1 in which R is hydrogen and X is a carbonyl group.
Claim 6
Dependent Claim
19 words
The composition of claim 4 in which the N 3 groups respectively are in the 4- and 4'- positions.
Claim 7
Dependent Claim
114 words
In a photosensitive composition for dry development comprising a polymer and subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting the polymer from at least one member selected from the group consisting of a polyphenyl vinyl ketone homopolymer and a copolymer of a vinyl ketone, the polymer having a molecular weight of from tens of thousands to two million; and (b) selecting a photocuring-effective amount of the subliming bisazide compound from subliming bisazide compounds represented by the general formula: ##STR3## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 8
Dependent Claim
114 words
In a photosensitive composition for dry development comprising a polymer and subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting the polymer from at least one member selected from the group consisting of a polyphenyl vinyl ketone homopolymer and a copolymer of a vinyl ketone, the polymer having a molecular weight of from tens of thousands to two million; and (b) selecting a photocuring-effective amount of the subliming bisazide compound from subliming bisazide compounds represented by the general formula: ##STR3## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 9
Dependent Claim
24 words
A composition as claimed in claim 6, wherein said copolymer is a copolymer is a copolymer of isopropyl vinyl ketone and methyl vinyl ketone.
Claim 10
Dependent Claim
96 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting the polymer from at least one member selected from the group consisting of a vinyl ketone homopolymer and a copolymer of vinyl ketone, the polymer having a molecular weight of from tens of thousands to two million; and (b) selecting a photocuring-effective amount of the subliming bisazide compound from subliming compounds represented by the general formula: ##STR4## where R is a hydrogen or a halogen atom and X is a disulfide group.
Claim 11
Dependent Claim
96 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting the polymer from at least one member selected from the group consisting of a vinyl ketone homopolymer and a copolymer of vinyl ketone, the polymer having a molecular weight of from tens of thousands to two million; and (b) selecting a photocuring-effective amount of the subliming bisazide compound from subliming compounds represented by the general formula: ##STR4## where R is a hydrogen or a halogen atom and X is a disulfide group.
Claim 12
Dependent Claim
40 words
A composition as claimed in any one of claims 1 or 6 wherein said bisazide copound is a member selected from the group consisting of 4,4'-diazidodiphenyl ether, 4,4'-diazidodiphenyl methane, 4,4'-diazidodiphenyl sulfide, 4,4'-diazidodiphenyl disulfide, 4,4'-diazidodiphenyl sulfone, 3,3'-diazidodiphenyl sulfone and 3,3'-dichloro-4,4'-diazidodiphenyl methane.
Claim 13
Dependent Claim
27 words
A composition as claimed in any one of claims 6 or 8 wherein said polymer has a molecular weight of from hundreds of thousands to one million.
Claim 14
Dependent Claim
35 words
A composition as claimed in any one of claims 6 or 8 wherein said bisazide compound is used in an amount of from 5 to 30% by weight based on the amount of the polymer.
Claim 15
Dependent Claim
36 words
A composition as claimed in any one of claims 1, 6 or 8 wherein said bisazide compound is used in an amount of from 15 to 25% by weight based on the amount of the polymer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-08-28 | 1988-02-27 | 1988-08-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-08-28 | 1992-02-27 | 1992-08-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-08-28 | 1996-02-27 | 1996-08-28 | $7700.00 | Window Closed / Lapsed |