Patent US2057175A successfully refreshed from Google Patents.
US4467210A
Expired / Lapsed
US
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Electron-beam image transfer device
Assignee: Toshiba Corp
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Filing: 1982-05-18
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Granted: 1984-08-21
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Expires: 2002-05-18
Abstract
Abstract An electron-beam image transfer device includes an evacuated vessel having a main chamber and spare chamber extended therefrom and a specimen holder and mask holder disposed in the main chamber. A subchamber is formed near the spare chamber to house a specimen. The specimen in the subchamber is transferred to the spare chamber by a movable support through an opening which is always kept in an airtight state, and then brought to the specimen holder by a transferring mechanism.
Inventors
- 👤 Kazuyoshi Sugihara
- 👤 Toru Tojo
- 👤 Ichiro Mori
- 👤 Toshiaki Shinozaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 10:08
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; B; B82; B82Y; B82Y10/00; B82Y40/00; G; G03; G03F; G03F7/00; G03F7/20; G03F7/2037; H01J37/02; H01J37/18; H10; H10P; H10P72/00; H10P72/30; H10P72/34; H10P72/3402; H10P72/38; H10P72/50; H10P72/57; H10P95/00
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
247 words
An electron-beam image transfer device for transferring a pattern on a photoelectric mask onto a specimen comprising: an evacuated vessel having a main chamber; U.V. source means placed outside of said main chamber for providing U.V. rays; guiding means coupled to said evacuated vessel for guiding said U.V. rays from said U.V. source means into said main chamber; a specimen holder disposed in said main chamber to hold said specimen detachably in fixed position; a mask holder disposed in said main chamber to hold said photoelectric mask detachably in fixed position in facing relation to said specimen; means to impress a magnetic field and an electric field to said specimen and photoelectric mask in the direction in which they face each other; first and second subchambers disposed in the proximity of said evacuated vessel to house the specimen and photoelectric mask, respectively; first and second gates disposed between the main chamber and the first and second subchambers to enable selective connection and an airtight seal between them; a first auxiliary transferring mechanism to transfer the specimen from said first subchamber into the main chamber through said first gate; a second auxiliary transferring mechanism to transfer the photoelectric mask from said second subchamber into the main chamber through the second gate; a main transferring mechanism to transfer the specimen and photoelectric mask, which have been brought into the main chamber, onto said specimen holder and mask holder; and an evacuating means to evacuate said main chamber and subchambers.
Claim 2
Dependent Claim
247 words
An electron-beam image transfer device for transferring a pattern on a photoelectric mask onto a specimen comprising: an evacuated vessel having a main chamber; U.V. source means placed outside of said main chamber for providing U.V. rays; guiding means coupled to said evacuated vessel for guiding said U.V. rays from said U.V. source means into said main chamber; a specimen holder disposed in said main chamber to hold said specimen detachably in fixed position; a mask holder disposed in said main chamber to hold said photoelectric mask detachably in fixed position in facing relation to said specimen; means to impress a magnetic field and an electric field to said specimen and photoelectric mask in the direction in which they face each other; first and second subchambers disposed in the proximity of said evacuated vessel to house the specimen and photoelectric mask, respectively; first and second gates disposed between the main chamber and the first and second subchambers to enable selective connection and an airtight seal between them; a first auxiliary transferring mechanism to transfer the specimen from said first subchamber into the main chamber through said first gate; a second auxiliary transferring mechanism to transfer the photoelectric mask from said second subchamber into the main chamber through the second gate; a main transferring mechanism to transfer the specimen and photoelectric mask, which have been brought into the main chamber, onto said specimen holder and mask holder; and an evacuating means to evacuate said main chamber and subchambers.
Claim 3
Dependent Claim
118 words
The electron-beam image transfer device of claim 1, said main chamber has an image transferring chamber in which said specimen holder and mask holder are disposed, the first and second spare chambers connecting to the image transferring chamber, the first subchamber being connected to the first spare chamber through said first gate; another first subchamber, another first spare chamber, and another first gate capable of selective connection and an airtight seal between another first spare chamber and another first subchamber; said main transferring mechanism has a feeding arm to transfer the specimen from the first spare chamber to the specimen holder and a removing arm to the transfer specimen from the specimen holder to another first spare chamber.
Claim 4
Dependent Claim
39 words
The electron-beam image transfer device of claim 2, said first subchamber and another first subchamber extend horizontally in opposite directions and said feeding arm and removing arm can be moved in the direction in which the subchamber is extending.
Claim 5
Dependent Claim
181 words
The electron-beam image transfer device of claim 3, said first auxiliary transferring mechanism has a specimen supporting stand which is vertically movable between the lower position located in said first spare chamber and the upper position located outside the first spare chamber with a state of vacuum maintained therein; a moving member which is vertically movable between the lower position where it contacts the outside surface of the evacuated vessel to define said first subchamber between the evacuated vessel and the moving member and the upper position where the moving member separates from the outside surface of the evacuated vessel to expose the first subchamber to the atmosphere; means to move the specimen supporting stand upward when the moving member is in its lower position and then move it downward after the moving member has been moved upward to enable the feeding of specimen, evacuate the first subchamber by the evacuating means and then move said specimen supporting stand into its lower position so that the specimen placed on the moving stand can be transferred by means of the feeding arm.
Claim 6
Dependent Claim
26 words
The electron-beam image transfer device of claim 4, said first spare chamber has a mechanism disposed therein to position the specimen placed on the supporting stand.
Claim 7
Dependent Claim
81 words
The electron-beam image transfer device of claim 1, said main chamber has an image transferring chamber and a spare chamber extending downward therefrom, said first and second subchambers are connected to the spare chamber through said first and second gates, and said main transferring mechanism has an arm which selectively support the specimen and photoelectric mask and can be moved vertically between the lower position in the proximity of the gates and the upper position near the specimen and mask holders.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-08-21 | 1988-02-20 | 1988-08-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-08-21 | 1992-02-20 | 1992-08-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-08-21 | 1996-02-20 | 1996-08-21 | $7700.00 | Window Closed / Lapsed |