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US4464734A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor dynamic memory cell array with word lines extending into windows of capacitor plate

Assignee: Texas Instruments Inc
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Filing: 1982-07-16
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Granted: 1984-08-07
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Expires: 2002-07-16
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Abstract

Abstract A dynamic read/write memory cell of the one transistor type is made by a single-level polysilicon process in which the word lines and the gates of the access transistors are formed by the metal strips. No metal-to-silicon or metal-to-polysilicon contacts are needed. The access transistors are made by etching through polysilicon strips which are the capacitor bias plates. The size of the transistor is not determined by alignment accuracy.

Inventors

  • 👤 David J. McElroy

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 05:21
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10B; H10B12/00; H10B12/30; H10W10/00; H10W10/01; H10W10/011; H10W10/012; H10W10/0125; H10W10/0126; H10W10/10; H10W10/13

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 138 words
A semiconductor memory device of the type including an array of one-transistor dynamic memory cells in a face of a semiconductor body, comprising: a plurality of semiconductor regions in said face of the semiconductor body, said regions being laterally spaced from one another along said face, each region providing one end of a source-to-drain path of an access transistor in each cell, conductive means extending laterally along said face insulated therefrom by an insulating layer and providing a plurality of capacitor areas in said face, one capacitor area for each of said cells, and a plurality of elongated conductive strips at said face overlying said regions providing gates of access transistors for each of said cells and extending into windows in said conductive means, the strips providing the gate of an access transistor for each of said cells.
Claim 2
Dependent Claim 138 words
A semiconductor memory device of the type including an array of one-transistor dynamic memory cells in a face of a semiconductor body, comprising: a plurality of semiconductor regions in said face of the semiconductor body, said regions being laterally spaced from one another along said face, each region providing one end of a source-to-drain path of an access transistor in each cell, conductive means extending laterally along said face insulated therefrom by an insulating layer and providing a plurality of capacitor areas in said face, one capacitor area for each of said cells, and a plurality of elongated conductive strips at said face overlying said regions providing gates of access transistors for each of said cells and extending into windows in said conductive means, the strips providing the gate of an access transistor for each of said cells.
Claim 3
Dependent Claim 40 words
A device according to claim 1 wherein each of said semiconductor regions is elongated and provides one end of a source-to-drain path of a large number of insulated gate field effect transistors in a column which are said access transistors.
Claim 4
Dependent Claim 29 words
A device according to claim 2 wherein each of the gates is laterally spaced along the face from said one end by an inverted region beneath said conductive means.
Claim 5
Dependent Claim 21 words
A device according to claim 2 wherein said conductive means include a plurality of elongated conductive layers forming capacitor bias lines.
Claim 6
Dependent Claim 17 words
A device according to claim 4 wherein said conductive strips are metal and form row address lines.
Claim 7
Dependent Claim 29 words
A device according to claim 5 wherein each of said elongated conducted layers overlies a plurality of separate capacitor areas, one for each cell laterally spaced along said face.
Claim 8
Dependent Claim 35 words
A device according to claim 6 wherein said conductive means is connected to a bias voltage source to create an inverted region at each of said capacitor areas and adjacent each of said semiconductor regions.
Claim 9
Dependent Claim 31 words
A device according to claim 6 wherein the body is predominately P-type silicon, said semiconductor regions are N+ type, said condutive means is polycrystalline silicon, and said conductive strips are metal.
Claim 10
Dependent Claim 47 words
A device according to claim 6 wherein said cells are in an array of rows and columns, and there are a plurality of said conductive strips, one extending along each row and each conductive strip overlies a plurality of said separate capacitor areas, one for each cell.

References Cited (Backward Citations)

US4193125A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-08-07 1988-02-06 1988-08-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-08-07 1992-02-06 1992-08-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-08-07 1996-02-06 1996-08-07 $7700.00 Window Closed / Lapsed

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