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US4462861A Expired / Lapsed US ⏱️ 0.0 years remaining

Etchant with increased etch rate

Assignee: SHIPELY Co Inc NEWTON MA A CORP OF
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Filing: 1983-11-14
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Granted: 1984-07-31
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Expires: 2003-11-14
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Abstract

Abstract A process for etching copper comprising contact of the copper with an etchant that is an aqueous solution of sulfuric acid, a peroxide and a low molecular weight carboxylic acid. The low molecular weight carboxylic acid in the etchant exalts etch rate.

Inventors

  • 👤 June L. McClean

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 17:44
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/18; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/067

Claims Analysis

Total Claims: 31
Claim 1
Independent Claim 98 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and propionic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 2
Dependent Claim 98 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and propionic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 3
Dependent Claim 29 words
The process of claim 1 where the propionic acid is present in an amount sufficient to double the etch rate relative to said etchant free of the carboxylic acid.
Claim 4
Dependent Claim 18 words
The process of claim 1 where the peroxide content varies between about 0.5 and 2.5 moles per liter.
Claim 5
Dependent Claim 23 words
The process of claim 1 where the concentration of the propionic acid ranges from about 0.1 to 2.5 moles per liter of solution.
Claim 6
Dependent Claim 72 words
A process for dissolving a copper containing metal comprising contact of the copper metal with an etchant that is an aqueous solution of a peroxide and sulfuric acid, each in amounts sufficient to provide a sustained rate of etching of the copper metal, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate at least double that achievable with the peroxide-sulfuric mixture alone.
Claim 7
Dependent Claim 72 words
A process for dissolving a copper containing metal comprising contact of the copper metal with an etchant that is an aqueous solution of a peroxide and sulfuric acid, each in amounts sufficient to provide a sustained rate of etching of the copper metal, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate at least double that achievable with the peroxide-sulfuric mixture alone.
Claim 8
Dependent Claim 31 words
The process of claim 5 where the copper metal is contacted with the etchant for a time sufficient to dissolve a copper layer having a thickness of at least 0.1 mils.
Claim 9
Dependent Claim 17 words
The process of claim 5 where the peroxide content varies between 0.5 and 2.5 moles per liter.
Claim 10
Dependent Claim 28 words
The process of claim 6 where the carboxylic acid conforms to the general formula: ##STR2## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 11
Dependent Claim 12 words
The process of claim 8 where the carboxylic acid is propionic acid.
Claim 12
Dependent Claim 24 words
The process of claim 5 where the carboxylic acid is present in an amount of from 0.1 to 2.5 moles per liter of solution.
Claim 13
Dependent Claim 25 words
The process of claim 6 where the contact of the copper metal is by immersion of the copper metal in a solution of the etchant.
Claim 14
Dependent Claim 24 words
The process of claim 6 where the contact of the copper metal is by spraying the etchant onto the surface of the copper metal.
Claim 15
Dependent Claim 102 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 16
Dependent Claim 102 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 17
Dependent Claim 29 words
The process of claim 13 where the carboxylic acid is present in an amount sufficient to double the etch rate relative to said etchant free of the carboxylic acid.
Claim 18
Dependent Claim 18 words
The process of claim 13 where the peroxide content varies between about 0.5 and 2.5 moles per liter.
Claim 19
Dependent Claim 28 words
The process of claim 15 where the carboxylic acid conforms to the general formula: ##STR3## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 20
Dependent Claim 12 words
The process of claim 16 where the carboxylic acid is propionic acid.
Claim 21
Dependent Claim 23 words
The process of claim 13 where the concentration of the carboxylic acid ranges from about 0.1 to 2.5 moles per liter of solution.
Claim 22
Dependent Claim 14 words
The process of claim 13 where the etch resist is solder or immersion tin.
Claim 23
Dependent Claim 13 words
The process of claim 19 where the etchant contains a solution soluble phosphate.
Claim 24
Dependent Claim 24 words
The process of claim 13 where the contact of the printed circuit board base material is by immersion in a solution of the etchant.
Claim 25
Dependent Claim 29 words
The process of claim 13 where the contact of the circuit board base material is by spraying the etchant onto the surface of the printed circuit board base material.
Claim 26
Dependent Claim 44 words
A process for exalting the etch rate of a hydrogen peroxide-sulfuric acid etchant, said process comprising adding a low molecular weight carboxylic acid to the etchant in a concentration sufficient to double the etch rate compared to an etchant free of the carboxylic acid.
Claim 27
Dependent Claim 44 words
A process for exalting the etch rate of a hydrogen peroxide-sulfuric acid etchant, said process comprising adding a low molecular weight carboxylic acid to the etchant in a concentration sufficient to double the etch rate compared to an etchant free of the carboxylic acid.
Claim 28
Dependent Claim 17 words
The process of claim 23 where the peroxide content varies between 0.5 and 2.5 moles per liter.
Claim 29
Dependent Claim 28 words
The process of claim 23 where the carboxylic acid conforms to the general formula ##STR4## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 30
Dependent Claim 12 words
The process of claim 25 where the carboxylic acid is propionic acid.
Claim 31
Dependent Claim 24 words
The process of claim 26 where the carboxylic acid is present in an amount of from 0.1 to 2.5 moles per liter of solution.

References Cited (Backward Citations)

US3537895A Cited
US4040863A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-07-31 1988-01-30 1988-07-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-07-31 1992-01-30 1992-07-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-07-31 1996-01-30 1996-07-31 $7700.00 Window Closed / Lapsed

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