US4462861A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etchant with increased etch rate
Assignee: SHIPELY Co Inc NEWTON MA A CORP OF
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Filing: 1983-11-14
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Granted: 1984-07-31
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Expires: 2003-11-14
Abstract
Abstract A process for etching copper comprising contact of the copper with an etchant that is an aqueous solution of sulfuric acid, a peroxide and a low molecular weight carboxylic acid. The low molecular weight carboxylic acid in the etchant exalts etch rate.
Inventors
- 👤 June L. McClean
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 17:44
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/18; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/067
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
98 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and propionic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 2
Dependent Claim
98 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and propionic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 3
Dependent Claim
29 words
The process of claim 1 where the propionic acid is present in an amount sufficient to double the etch rate relative to said etchant free of the carboxylic acid.
Claim 4
Dependent Claim
18 words
The process of claim 1 where the peroxide content varies between about 0.5 and 2.5 moles per liter.
Claim 5
Dependent Claim
23 words
The process of claim 1 where the concentration of the propionic acid ranges from about 0.1 to 2.5 moles per liter of solution.
Claim 6
Dependent Claim
72 words
A process for dissolving a copper containing metal comprising contact of the copper metal with an etchant that is an aqueous solution of a peroxide and sulfuric acid, each in amounts sufficient to provide a sustained rate of etching of the copper metal, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate at least double that achievable with the peroxide-sulfuric mixture alone.
Claim 7
Dependent Claim
72 words
A process for dissolving a copper containing metal comprising contact of the copper metal with an etchant that is an aqueous solution of a peroxide and sulfuric acid, each in amounts sufficient to provide a sustained rate of etching of the copper metal, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate at least double that achievable with the peroxide-sulfuric mixture alone.
Claim 8
Dependent Claim
31 words
The process of claim 5 where the copper metal is contacted with the etchant for a time sufficient to dissolve a copper layer having a thickness of at least 0.1 mils.
Claim 9
Dependent Claim
17 words
The process of claim 5 where the peroxide content varies between 0.5 and 2.5 moles per liter.
Claim 10
Dependent Claim
28 words
The process of claim 6 where the carboxylic acid conforms to the general formula: ##STR2## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 11
Dependent Claim
12 words
The process of claim 8 where the carboxylic acid is propionic acid.
Claim 12
Dependent Claim
24 words
The process of claim 5 where the carboxylic acid is present in an amount of from 0.1 to 2.5 moles per liter of solution.
Claim 13
Dependent Claim
25 words
The process of claim 6 where the contact of the copper metal is by immersion of the copper metal in a solution of the etchant.
Claim 14
Dependent Claim
24 words
The process of claim 6 where the contact of the copper metal is by spraying the etchant onto the surface of the copper metal.
Claim 15
Dependent Claim
102 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 16
Dependent Claim
102 words
A process for the manufacture of a printed circuit board comprising the step of contacting a copper clad printed circuit board base material, having an etch resist over the surface of the copper defining a circuit pattern, with an etchant for a time sufficient to remove all exposed copper, said etchant comprising an aqueous solution of a peroxide and sulfuric acid, each in an amount sufficient to provide a sustained rate of etching, and a low molecular weight carboxylic acid in an amount sufficient to exalt the etch rate to a rate in excess of that achievable by the peroxide-sulfuric mixture alone.
Claim 17
Dependent Claim
29 words
The process of claim 13 where the carboxylic acid is present in an amount sufficient to double the etch rate relative to said etchant free of the carboxylic acid.
Claim 18
Dependent Claim
18 words
The process of claim 13 where the peroxide content varies between about 0.5 and 2.5 moles per liter.
Claim 19
Dependent Claim
28 words
The process of claim 15 where the carboxylic acid conforms to the general formula: ##STR3## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 20
Dependent Claim
12 words
The process of claim 16 where the carboxylic acid is propionic acid.
Claim 21
Dependent Claim
23 words
The process of claim 13 where the concentration of the carboxylic acid ranges from about 0.1 to 2.5 moles per liter of solution.
Claim 22
Dependent Claim
14 words
The process of claim 13 where the etch resist is solder or immersion tin.
Claim 23
Dependent Claim
13 words
The process of claim 19 where the etchant contains a solution soluble phosphate.
Claim 24
Dependent Claim
24 words
The process of claim 13 where the contact of the printed circuit board base material is by immersion in a solution of the etchant.
Claim 25
Dependent Claim
29 words
The process of claim 13 where the contact of the circuit board base material is by spraying the etchant onto the surface of the printed circuit board base material.
Claim 26
Dependent Claim
44 words
A process for exalting the etch rate of a hydrogen peroxide-sulfuric acid etchant, said process comprising adding a low molecular weight carboxylic acid to the etchant in a concentration sufficient to double the etch rate compared to an etchant free of the carboxylic acid.
Claim 27
Dependent Claim
44 words
A process for exalting the etch rate of a hydrogen peroxide-sulfuric acid etchant, said process comprising adding a low molecular weight carboxylic acid to the etchant in a concentration sufficient to double the etch rate compared to an etchant free of the carboxylic acid.
Claim 28
Dependent Claim
17 words
The process of claim 23 where the peroxide content varies between 0.5 and 2.5 moles per liter.
Claim 29
Dependent Claim
28 words
The process of claim 23 where the carboxylic acid conforms to the general formula ##STR4## where R is hydrogen or alkyl having from 1 to 6 carbon atoms.
Claim 30
Dependent Claim
12 words
The process of claim 25 where the carboxylic acid is propionic acid.
Claim 31
Dependent Claim
24 words
The process of claim 26 where the carboxylic acid is present in an amount of from 0.1 to 2.5 moles per liter of solution.
References Cited (Backward Citations)
US3537895A
Cited
US4040863A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-31 | 1988-01-30 | 1988-07-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-31 | 1992-01-30 | 1992-07-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-31 | 1996-01-30 | 1996-07-31 | $7700.00 | Window Closed / Lapsed |