US4461237A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma reactor for etching and coating substrates
Assignee: International Business Machines Corp
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Filing: 1983-03-17
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Granted: 1984-07-24
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Expires: 2003-03-17
Abstract
Abstract A plasma reactor comprises a reaction chamber having two plate-shaped electrodes arranged parallel to and above each other, whereby the substrates are supported on the lower electrode and this electrode is additionally provided with a center opening (5) through which gas is fed into the electrode space or which is evacuated from it, and where (a) the upper electrode is connected to a high frequency AC or RF voltage and (b) which has no electrode material in the regions opposite the substrates and (c) where their position and shape are determined by the substrates on the lower electrode, causing the electric field in the electrode space to be selectively weakened at at least above the substrates.
Inventors
- 👤 Holger Hinkel
- 👤 Gerhard Kaus
- 👤 Georg Kraus
- 👤 Ulrich Kunzel
- 👤 Reinhold Muehl
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 21:46
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5096; C23F; C23F4/00; H01J37/32532; H01J37/32541
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
78 words
A plasma reactor for reactively etching and coating substrates in an excited reactive gas ambient, comprising; A. a pair of planar opposed and spaced electrodes, with one of said electrodes adapted to support said substrates and the second of said electrodes having apertures containing a dielectric medium for and opposite each of said substrates, B. means for generating a plasma between said electrodes, and C. means for flowing a reactive ambient radially across said substrates between said electrodes.
Claim 2
Dependent Claim
78 words
A plasma reactor for reactively etching and coating substrates in an excited reactive gas ambient, comprising; A. a pair of planar opposed and spaced electrodes, with one of said electrodes adapted to support said substrates and the second of said electrodes having apertures containing a dielectric medium for and opposite each of said substrates, B. means for generating a plasma between said electrodes, and C. means for flowing a reactive ambient radially across said substrates between said electrodes.
Claim 3
Dependent Claim
11 words
The reactor of claim 1 wherein said dielectric medium is quartz.
Claim 4
Dependent Claim
14 words
The reactor of claim 1 wherein said apertures are concentric with their affiliated substrates.
Claim 5
Dependent Claim
14 words
The reactor of claim 3 wherein said dielectric medium comprises an inset of quartz.
Claim 6
Dependent Claim
26 words
The reactor of claim 3 wherein said aperture and said substrate are circular, and wherein the diameter of said apertures are half that of said substrates.
Claim 7
Dependent Claim
14 words
The reactor of claim 5 wherein said dielectric medium comprises an inset of quartz.
Claim 8
Dependent Claim
19 words
The reactor of claim 1 wherein said aperture has a geometric configuration of an affiliated one of said substrates.
Claim 9
Dependent Claim
11 words
The reactor of claim 7 wherein said dielectric medium is quartz.
Claim 10
Dependent Claim
14 words
The reactor of claim 7 wherein said apertures are concentric with their affiliated substrates.
Claim 11
Dependent Claim
14 words
The reactor of claim 9 wherein said dielectric medium comprises an inset of quartz.
Claim 12
Dependent Claim
26 words
The reactor of claim 1 wherein said aperture and said substrate are circular, and wherein the diameter of said apertures are half that of said substrates.
Claim 13
Dependent Claim
14 words
The reactor of claim 11 wherein said dielectric medium comprises an inset of quartz.
Claim 14
Dependent Claim
85 words
A plasma reactor for reactively etching and coating substrates in an excited reactive gas ambient, comprising; A. a pair of planar opposed and spaced electrodes with one of said electrodes adapted to support said substrates, and the second of electrodes having a annular dielectric medium inset therein to overlap the major portion of said substrate on the said one electrode, B. means for generating a plasma between said electrodes, and C. means for flowing a reactive gas ambient radially across said substrates between said electrodes.
Claim 15
Dependent Claim
85 words
A plasma reactor for reactively etching and coating substrates in an excited reactive gas ambient, comprising; A. a pair of planar opposed and spaced electrodes with one of said electrodes adapted to support said substrates, and the second of electrodes having a annular dielectric medium inset therein to overlap the major portion of said substrate on the said one electrode, B. means for generating a plasma between said electrodes, and C. means for flowing a reactive gas ambient radially across said substrates between said electrodes.
Claim 16
Dependent Claim
14 words
The reactor of claim 13 wherein said dielectric medium comprises an inset of quartz.
Claim 17
Dependent Claim
26 words
The reactor of claim 13 wherein said inset comprises a circular dielectric medium concentrically inset therein in spaced relationship to the periphery of said one electrode.
Claim 18
Dependent Claim
14 words
The reactor of claim 15 wherein said dielectric medium comprises an inset of quartz.
Claim 19
Dependent Claim
22 words
The reactor of claim 13 wherein said inset comprises an annular dielectric ring defining the outer peripheral portions of said one electrode.
Claim 20
Dependent Claim
14 words
The reactor of claim 17 wherein said dielectric medium comprises an inset of quartz.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-24 | 1988-01-23 | 1988-07-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-24 | 1992-01-23 | 1992-07-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-24 | 1996-01-23 | 1996-07-24 | $7700.00 | Window Closed / Lapsed |