US4459349A
Expired / Lapsed
US
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Photosensitive resin composition
Assignee: Toyobo Co Ltd
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Filing: 1982-03-23
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Granted: 1984-07-10
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Expires: 2002-03-23
Abstract
Abstract A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerizaton being initiated by a free radical and of chain-propagation, (2) a 2-polycyclic aryl-4,5-diphenylimidazolyl dimer wherein the polycyclic aryl group comprises at least two benzene rings condensed each other and (3) at least one compound selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet, indoxylic acid, rhodanine, 7-di(lower)alkylaminocumarine and diarylthiourea and their derivatives, the molar ratio of the component (2) and the component (3) being from 2:1 to 1:5.
Inventors
- 👤 Toshikiyo Tanaka
- 👤 Yoshio Katoh
- 👤 Satoshi Imahashi
- 👤 Toshihiko Kajima
- 👤 Hisashi Uhara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/031; C; C08; C08F; C08F2/00; C08F2/46; C08F2/48; C08F2/50; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/117; Y10S430/12; Y10S430/121
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
83 words
A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerization being initiated by a free radical and of chain-propagation, (2) a 2-naphthyl-4,5-diphenylimidazolyl dimer and (3) at least one compound selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet, indoxylic acid, rhodanine, 7-di(lower)alkylaminocumarine and diarylthiourea, the molar ratio of the component (2) and the component (3) being from 2:1 to 1:5.
Claim 2
Dependent Claim
83 words
A photosensitive resin composition which comprises (1) an ethylenically unsaturated compound which can be addition polymerized to form a high molecular compound, said addition polymerization being initiated by a free radical and of chain-propagation, (2) a 2-naphthyl-4,5-diphenylimidazolyl dimer and (3) at least one compound selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet, indoxylic acid, rhodanine, 7-di(lower)alkylaminocumarine and diarylthiourea, the molar ratio of the component (2) and the component (3) being from 2:1 to 1:5.
Claim 3
Dependent Claim
27 words
The composition according to claim 1, wherein the 2-naphthyl-4,5-diphenylimidazolyl dimer is the one substituted with a halogen atom at least at the orthoposition of the naphthyl group.
Claim 4
Dependent Claim
12 words
The composition according to claim 1, which further comprises a binding agent.
Claim 5
Dependent Claim
12 words
The composition according to claim 2 wherein the halogen atom is chlorine.
Claim 6
Dependent Claim
34 words
A composition according to claim 4, wherein the at least one compound (3) is selected from the group consisting of dimedone, indolacetic acid, N-naphthylglycine, S-lower alkylthioglycollic acid, 4,4'-bis-[di(lower)alkylamino]benzyl, p-di(lower)alkylaminobenzoic ester, leucocrystalviolet and indoxylic acid.
Claim 7
Dependent Claim
12 words
A composition according to claim 5, wherein the dimer is 2-(2-chloro-1-naphthyl)-4,5-diphenylimidazolyl dimer.
Claim 8
Dependent Claim
12 words
A composition according to claim 5, wherein the compound (3) comprises dimedone.
Claim 9
Dependent Claim
12 words
A composition according to claim 7, wherein the dimer is 2-(2-chloro-1-naphthyl-4,5-diphenylimidazolyl dimer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-10 | 1988-01-09 | 1988-07-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-10 | 1992-01-09 | 1992-07-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-10 | 1996-01-09 | 1996-07-10 | $7700.00 | Window Closed / Lapsed |