Abstract A lithographic process utilizing soft x-rays or ions to achieve high resolution is disclosed. The process is particularly useful and semiconductor processing where high resolution is required to achieve a high density. The process utilizes a mask to selectively expose a photoresist to soft x-rays of flood beams of ions. The mask comprises a thin metallic foil supported by a frame such that the foil is in tension. The frame includes optical alignment keys. A second patterned layer of metal is affixed to the foil to form areas which are non-transparent to the soft x-rays or flood ion beams for delineating the elements of a semiconductor circuit, for example. This permits the mask to be optically aligned using conventionally techniques with high resolution being achieved due to the short wavelength of the x-ray radiation or the ion beams.
A mask for use in lithographic processing, comprising in combination: (a) a glass support frame transparent to visible light and non-transparent to short wave-length radiation; (b) a beryllium foil non-transparent to visible light and transparent to said short wave-length radiation, said foil being affixed to said support frame such that said support frame extends beyond the perimeter of said foil with said foil and said portions of said support frame which extend beyond the perimeter of said foil joining to form a substantially flat surface; and (c) a thin patterned layer affixed to said substantially flat surface rendering portions of said beryllium foil and said support frame overlaid by said patterned layer non-transparent to visible light and to radiation within said selected band with portions of said support frame in conjunction with portions of said patterned layer forming a key for aligning said mask permitting said mask to be aligned using visible light.
Claim 2
Dependent Claim
153 words
A mask for use in lithographic processing, comprising in combination: (a) a glass support frame transparent to visible light and non-transparent to short wave-length radiation; (b) a beryllium foil non-transparent to visible light and transparent to said short wave-length radiation, said foil being affixed to said support frame such that said support frame extends beyond the perimeter of said foil with said foil and said portions of said support frame which extend beyond the perimeter of said foil joining to form a substantially flat surface; and (c) a thin patterned layer affixed to said substantially flat surface rendering portions of said beryllium foil and said support frame overlaid by said patterned layer non-transparent to visible light and to radiation within said selected band with portions of said support frame in conjunction with portions of said patterned layer forming a key for aligning said mask permitting said mask to be aligned using visible light.
Claim 3
Dependent Claim
33 words
A mask in accordance with claim 1 wherein said beryllium is always in tension, said tension being established by bonding said beryllium foil to said glass from at a temperature above 200° C.