← Back to Patent Explorer
US4454104A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for working up the residual gases obtained in the deposition of silicon and in the conversion of silicon tetrachloride

Assignee: Siltronic AG
•
Filing: 1982-08-04
•
Granted: 1984-06-12
•
Expires: 2002-08-04
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract The chlorosilanes contained in the residual gases obtained in the deposit of silicon and in the conversion of silicon tetrachloride are first condensed out in liquid form. The hydrogen chloride present in the residual gases is dissolved in the condensed silicon tetrachloride. The remaining, virtually pure hydrogen is passed back into the process. During the distillation of the condensate, the dissolved hydrogen chloride is removed and can be separated off and reused. The trichlorosilane obtained after the distillation and the silicon tetrachloride can also be reused in the deposition process or the conversion process, respectively.

Inventors

  • 👤 Rudolf Griesshammer
  • 👤 Franz Koppl
  • 👤 Helmut Lorenz
  • 👤 Friedrich Steudten

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 23:07
CPC Classifications
B; B01; B01D; B01D53/00; B01D53/34; B01D53/46; B01D53/68; C; C01; C01B; C01B33/00; C01B33/02; C01B33/021; C01B33/027; C01B33/035; C01B33/08; C01B33/107; C01B33/1071

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 74 words
A process for working up residual waste gases containing chlorosilanes, silicon tetrachloride, hydrogen and hydrogen chloride, comprising the steps of: condensing out in liquid form silicon tetrachloride, hydrogen chloride and the chlorosilanes contained in said residual gases so as to produce a condensate containing chlorosilanes, silicon tetrachloride and hydrogen chloride dissolved in said silicon tetrachloride; and collecting said hydrogen chloride dissolved in said silicon tetrachloride and removing said hydrogen choride from said silicon tetrachloride.
Claim 2
Dependent Claim 74 words
A process for working up residual waste gases containing chlorosilanes, silicon tetrachloride, hydrogen and hydrogen chloride, comprising the steps of: condensing out in liquid form silicon tetrachloride, hydrogen chloride and the chlorosilanes contained in said residual gases so as to produce a condensate containing chlorosilanes, silicon tetrachloride and hydrogen chloride dissolved in said silicon tetrachloride; and collecting said hydrogen chloride dissolved in said silicon tetrachloride and removing said hydrogen choride from said silicon tetrachloride.
Claim 3
Dependent Claim 33 words
The process of claim 1, additionally including the step of feeding tetrachlorosilane in liquid form to said condensate formed by said condensing step in order to improve the dissolution of the hydrogen chloride.
Claim 4
Dependent Claim 37 words
The process of claim 1, additionally including the preliminary step of obtaining said residual waste gases from a silicon deposition process involving the thermal decomposition of a mixture of gases comprising chlorosilanes and hydrogen on heated supports.
Claim 5
Dependent Claim 25 words
The process of claim 1, additionally including the preliminary step of obtaining said residual waste gases from a process involving the conversion of silicon tetrachloride.
Claim 6
Dependent Claim 19 words
The process of claim 1, wherein said chlorosilanes are condensed at a temperature above the melting point of tetrachlorosilane.
Claim 7
Dependent Claim 20 words
The process of claim 5, wherein said temperature falls within the range between about -60° C. and about -16° C.
Claim 8
Dependent Claim 30 words
The process of claim 1, additionally including the step of keeping said residual gases under elevated pressure, so as to increase the solubility of the hydrogen chloride in silicon tetrachloride.
Claim 9
Dependent Claim 19 words
The process of claim 7, wherein said residual gases are kept under a pressure of up to 10 bar.
Claim 10
Dependent Claim 21 words
The process of claim 1, wherein said step of removing hydrogen chloride comprises working up said condensate by means of distillation.
Claim 11
Dependent Claim 41 words
The process of claim 1 or 9, additionally including the step of feeding tetrachlorosilane in gas form into said residual gases prior to said condensing step in order to improve the dissolution of the hydrogen chloride in said subsequent condensing step.

References Cited (Backward Citations)

US1520627A Cited
US3091517A Cited
US3286442A Cited
US3500613A Cited
US3490203A Cited
US4213937A Cited
US4340574A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-06-12 1987-12-12 1988-06-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-06-12 1991-12-12 1992-06-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-06-12 1995-12-12 1996-06-12 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag