US4453262A
Expired / Lapsed
US
⏱️ 0.0 years remaining
X-Ray lithography apparatus and method of use
Assignee: Applied Biosystems Inc
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Filing: 1982-05-24
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Granted: 1984-06-05
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Expires: 2002-05-24
Abstract
Abstract In order to obtain shorter exposure time and to obtain a longer life in x-ray lithography apparatus, an x-ray target made of tungsten is utilized and the apparatus operated to generate the tungsten M-line, this line being at a wavelength which will be absorbed by the resist normally used in lithography. To develop the resist, which was initially designed for use in an electron beam lithography, a developing method is used in which an initial short development with a high concentration is first carried out followed by a longer, full development with a concentration which is approximately the lowest at which complete development will take place.
Inventors
- 👤 William D. Buckley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 21:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/70033; G03F7/20; G03F7/2037; G03F7/2039; G03F7/708; G03F7/70858; G03F7/70866; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
108 words
Apparatus for performing X-Ray lithography by exposing a coated substrate to X-Ray radiation comprising: (a) means for disposing an X-Ray apparatus having a target means capable of generating M-line X-Ray radiation having a wavelength in the range of between about 4 and about 14 angstroms so as to generate radiation which will impinge on and expose said coated substrate; (b) means for operating said X-Ray source so as to generate the M-line radiation; (c) means for disposing a mask between said source and said substrate; and (d) means for exposing to said radiation a resist on said coated substrate on which the lithography is to be carried out.
Claim 2
Dependent Claim
108 words
Apparatus for performing X-Ray lithography by exposing a coated substrate to X-Ray radiation comprising: (a) means for disposing an X-Ray apparatus having a target means capable of generating M-line X-Ray radiation having a wavelength in the range of between about 4 and about 14 angstroms so as to generate radiation which will impinge on and expose said coated substrate; (b) means for operating said X-Ray source so as to generate the M-line radiation; (c) means for disposing a mask between said source and said substrate; and (d) means for exposing to said radiation a resist on said coated substrate on which the lithography is to be carried out.
Claim 3
Dependent Claim
29 words
The apparatus of claim 1 wherein said target is selected from the group consisting of tungsten, alloys of tungsten, and tungsten compounds, so as to generate a tungsten M-line.
Claim 4
Dependent Claim
24 words
The apparatus according to claim 2 wherein said means for operating comprises means for operating said x-ray source at a voltage above 5 kv.
Claim 5
Dependent Claim
24 words
The apparatus according to claim 3 wherein said means for operating comprises means for operating at a voltage in the vicinity of 20 kv.
Claim 6
Dependent Claim
30 words
The apparatus according to claim 4 wherein means for operating includes a window in said x-ray apparatus made of beryllium and having a thickness of not more than 100 μm.
Claim 7
Dependent Claim
23 words
The apparatus according to claim 5 wherein said means for disposing comprises a window which has a thickness no greater than 25 μm.
References Cited (Backward Citations)
US4342917A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-06-05 | 1987-12-05 | 1988-06-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-06-05 | 1991-12-05 | 1992-06-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-06-05 | 1995-12-05 | 1996-06-05 | $7700.00 | Window Closed / Lapsed |