Method for the manufacture of semiconductor device using refractory metal in a lift-off step

Claim 1

A method for the manufacture of a semiconductor device, comprising the steps of: (a) forming on a semiconductor substrate a first insulating material layer, a polysilicon film, and a refractory metal layer in that order; (b) selectively removing at least a portion of the refractory metal layer to form a predetermined pattern having a side wall and selectively removing at least a portion of the polysilicon film by using the pattern as a mask to expose an area of the first insulating material layer; (c) forming a second insulating material layer by an ECR plasma deposition method, which is slightly thicker than the polysilicon film, on the refractory metal pattern and the exposed area of the first insulating material layer which is not covered with the refractory metal pattern; (d) heat treating the semiconductor substrate including the second insulating material layer and etching away the second insulating material layer to a thickness substantially equal to that of the polysilicon film to thereby expose the side wall of the refractory metal pattern; and (e) dissolving the refractory metal pattern to lift it off along with the second insulating material layer overlying the refractory material pattern, thereby to obtain a structure in which the polysilicon is embedded substantially level with the second insulating material layer formed on the area of the first insulating material layer which is not covered with the refractory metal pattern.

Claim 2

A method for the manufacture of a semiconductor device, comprising the steps of: (a) forming on a semiconductor substrate a first insulating material layer, a polysilicon film, and a refractory metal layer in that order; (b) selectively removing at least a portion of the refractory metal layer to form a predetermined pattern having a side wall and selectively removing at least a portion of the polysilicon film by using the pattern as a mask to expose an area of the first insulating material layer; (c) forming a second insulating material layer by an ECR plasma deposition method, which is slightly thicker than the polysilicon film, on the refractory metal pattern and the exposed area of the first insulating material layer which is not covered with the refractory metal pattern; (d) heat treating the semiconductor substrate including the second insulating material layer and etching away the second insulating material layer to a thickness substantially equal to that of the polysilicon film to thereby expose the side wall of the refractory metal pattern; and (e) dissolving the refractory metal pattern to lift it off along with the second insulating material layer overlying the refractory material pattern, thereby to obtain a structure in which the polysilicon is embedded substantially level with the second insulating material layer formed on the area of the first insulating material layer which is not covered with the refractory metal pattern.

Claim 6

A method for the manufacture of a semiconductor or device, comprising the steps of: (a) forming on a semiconductor substrate an SiO 2 layer, an Si 3 N 4 layer and a refractory metal layer in that order; (b) selectively removing at least a portion of the refractory metal layer to form a predetermined pattern having a side wall and selectively removing the Si 3 N 4 layer and the SiO 2 layer in succession by using the pattern of the refractory metal layer as a mask and, further, digging a predetermined groove in the substrate; (c) forming an insulating material layer by an ECR plasma deposition method on the refractory metal layer and in the groove to a thickness slightly larger than the depth of the groove; (d) heat-treating the substrate including the insulating material layer and etching away the insulating material layer to a height equal to that of the SiO 2 layer to thereby expose the side wall of the refractory metal layer; (e) dissolving the refractory metal layer to lift it off along with the insulating material layer overlying on the refractory metal pattern; and (f) subjecting the substrate including the insulating material layer to one of the heat treatment and thermal oxidation, and removing the remaining Si 3 N 4 and SiO 2 patterns, thereby to obtain a structure in which the groove is filled with the insulating material to make the surface of the filled insulating material layer and the substrate substantially flat.

Claim 7

A method for the manufacture of a semiconductor or device, comprising the steps of: (a) forming on a semiconductor substrate an SiO 2 layer, an Si 3 N 4 layer and a refractory metal layer in that order; (b) selectively removing at least a portion of the refractory metal layer to form a predetermined pattern having a side wall and selectively removing the Si 3 N 4 layer and the SiO 2 layer in succession by using the pattern of the refractory metal layer as a mask and, further, digging a predetermined groove in the substrate; (c) forming an insulating material layer by an ECR plasma deposition method on the refractory metal layer and in the groove to a thickness slightly larger than the depth of the groove; (d) heat-treating the substrate including the insulating material layer and etching away the insulating material layer to a height equal to that of the SiO 2 layer to thereby expose the side wall of the refractory metal layer; (e) dissolving the refractory metal layer to lift it off along with the insulating material layer overlying on the refractory metal pattern; and (f) subjecting the substrate including the insulating material layer to one of the heat treatment and thermal oxidation, and removing the remaining Si 3 N 4 and SiO 2 patterns, thereby to obtain a structure in which the groove is filled with the insulating material to make the surface of the filled insulating material layer and the substrate substantially flat.