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US4447290A Expired / Lapsed US ⏱️ 0.0 years remaining

CMOS Process with unique plasma etching step

Assignee: Intel Corp
•
Filing: 1983-07-25
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Granted: 1984-05-08
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Expires: 2003-07-25
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Abstract

Abstract A CMOS process which provides a self-aligned guardband in a high density circuit is disclosed. A polysilicon masking member is used to define a well and also to provide alignment for the guardband. A single plasma etching step etches silicon nitride in one area and both silicon nitride and polysilicon in another area prior to growth of field oxides.

Inventors

  • 👤 James A. Matthews

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 15:31
CPC Classifications
H; H10; H10D; H10D84/00; H10D84/01; H10D62/00; H10D62/10; H10D62/102; H10D62/112; H10D84/0123; H10D84/0126; H10D84/0165; H10D84/0193; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/012; H10W10/0125; H10W10/0126; H10W10/0127; H10W10/10; H10W10/13

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 51 words
In the plasma etching of a polysilicon layer during the fabrication of an integrated circuit where SF 6 and O 2 are used for said etching, an improvement comprising: adding C n F m to said SF 6 and O 2 during said plasma etching to provide better end point detection.
Claim 2
Dependent Claim 51 words
In the plasma etching of a polysilicon layer during the fabrication of an integrated circuit where SF 6 and O 2 are used for said etching, an improvement comprising: adding C n F m to said SF 6 and O 2 during said plasma etching to provide better end point detection.

References Cited (Backward Citations)

US4330384A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-05-08 1987-11-07 1988-05-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-05-08 1991-11-07 1992-05-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-05-08 1995-11-07 1996-05-08 $7700.00 Window Closed / Lapsed

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