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US4440107A Expired / Lapsed US ⏱️ 0.0 years remaining

Magnetic apparatus for reducing substrate warpage

Assignee: United Solar Systems Corp
•
Filing: 1982-07-12
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Granted: 1984-04-03
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Expires: 2002-07-12
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Abstract

Abstract An apparatus for producing improved large area photovoltaic devices by substantially reducing the warpage of relatively large area, relatively thin webs of magnetic substrate material which travel through a plurality of high temperature, low pressure glow discharge deposition chambers. As the web of the substrate material moves through the deposition chambers, it assumes a normal, elongated path of travel. Due to the elevated deposition temperature, the elongated path of travel, the force of gravity, etc., the web has a tendency to warp. Warpage of the web is undesirable as it promotes the deposition of non-uniform semiconductor alloy layers. The improvement of the present invention contemplates the establishment of at least one magnetic field within each deposition chamber which is adapted to urge the web of substrate material out of its normal path of travel into a flat, substantially planar path of travel. The new flat path of travel serves to substantially reduce warpage of the web which permits uniform amorphous semiconductor alloy layers to be deposited. In alternate embodiments, the web of substrate material may be urged into sliding contact with a plurality of stationary ceramic magnets or the web may be urged into rolling contact with a plurality of rotatable magnetic elements which may either be hollow, ceramic magnets or electromagnets.

Inventors

  • 👤 Joachim Doehler
  • 👤 Vincent Cannella
  • 👤 Richard O. Gray, Jr.

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 14:23
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/32; H10P72/3204; C; C23; C23C; C23C16/00; C23C16/44; C23C16/54; C23C16/545; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32733; H01J37/32752; H01J37/32761; H01J37/3277; H01J37/34; H10P72/33; H10P72/3314

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 155 words
Apparatus for producing improved semiconductor devices by substantially reducing warpage of a relatively wide, elongated, relatively thin web of electrically conductive, magnetically attractable substrate material adapted to follow a normal elongaed path of travel through at least one isolated deposition chamber wherein a semiconductor alloy layer is deposited onto one surface of the substrate; the apparatus including, in combination: a plurality of spaced magnets operatively disposed within the at least one deposition chamber for flattening the magnetically attractable web of substrate material, the magnets extending transversely across substantially the entire unlayered surface of the web to thereby create an attractive force which urges the web out of its normal path of travel and into a substantially planar path of travel through said at least one deposition chamber, whereby warpage of the web of substrate material is substantially reduced so that a uniform semiconductor alloy layer may be deposited onto the one surface of the web.
Claim 2
Dependent Claim 155 words
Apparatus for producing improved semiconductor devices by substantially reducing warpage of a relatively wide, elongated, relatively thin web of electrically conductive, magnetically attractable substrate material adapted to follow a normal elongaed path of travel through at least one isolated deposition chamber wherein a semiconductor alloy layer is deposited onto one surface of the substrate; the apparatus including, in combination: a plurality of spaced magnets operatively disposed within the at least one deposition chamber for flattening the magnetically attractable web of substrate material, the magnets extending transversely across substantially the entire unlayered surface of the web to thereby create an attractive force which urges the web out of its normal path of travel and into a substantially planar path of travel through said at least one deposition chamber, whereby warpage of the web of substrate material is substantially reduced so that a uniform semiconductor alloy layer may be deposited onto the one surface of the web.
Claim 3
Dependent Claim 43 words
Apparatus as in claim 1, wherein the magnets are arranged to form a plurality of spaced rows of ceramic magents, each row extending substantially across the transverse width of the web of substrate material in each of said at least one deposition chamber.
Claim 4
Dependent Claim 21 words
Apparatus as in claim 2, further including means adapted to encapsulate the ceramic magnets of each of the equally spaced rows.
Claim 5
Dependent Claim 20 words
Apparatus as in claim 2, wherein the encapsulating means comprise a plurality of elongated tubes for receiving the ceramic magnets.
Claim 6
Dependent Claim 33 words
Apparatus as in claim 4, wherein each of the encapsulated rows of ceramic magnets are equally spaced at approximately eight to ten inch intervals in each of the at least one deposition chamber.
Claim 7
Dependent Claim 34 words
Apparatus as in claim 2, wherein the magnets are rotatably supported for urging the unlayered surface of the magnetic web of substrate material into rolling contact therewith so as to reduce frictional forces therebetween.
Claim 8
Dependent Claim 27 words
Apparatus as in claim 6, wherein each row of ceramic magnets is mounted on an axle rotatably affixed within each of the at least one deposition chamber.
Claim 9
Dependent Claim 29 words
Apparatus as in claim 7, further including at least one hollow tube adapted to encapsulate one of the at least one ceramic magnets mounted on each of the axles.
Claim 10
Dependent Claim 29 words
Apparatus as in claim 1, wherein the web of substrate material is formed of stainless steel, said stainless steel web of substrate material being greater than six inches wide.

References Cited (Backward Citations)

US2731212A Cited
US2925062A Cited
GB1157120A Cited
US3661116A Cited
US3924563A Cited
US3898952A Cited
GB2083840A Cited
US4369730A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-04-03 1987-10-03 1988-04-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-04-03 1991-10-03 1992-04-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-04-03 1995-10-03 1996-04-03 $7700.00 Window Closed / Lapsed

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