US4434025A
Expired / Lapsed
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Controlling crystallinity and thickness of monocrystalline layer by use of an elliptically polarized beam of light
Assignee: OSSERMAN GEORGE
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Filing: 1981-06-04
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Granted: 1984-02-28
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Expires: 2001-06-04
Abstract
Abstract Monocrystalline layers of semiconductor materials are formed by epitaxial growth from thermal vapor deposition. Crystallinity and thickness of the monocrystalline layers are monitored and controlled during growth by ellipsometry. Low defect density thin film monocrystalline semiconductor devices with appropriate doping levels are formed. These are useful in photovoltaic solar cells of high efficiencies which can approach the theoretical limits.
Inventors
- 👤 Jean J. Robillard
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 00:24
CPC Classifications
C; C30; C30B; C30B23/00; C30B23/002; G; G01; G01N; G01N21/00; G01N21/17; G01N21/21; G01N21/211; Y; Y10; Y10S; Y10S117/00; Y10S117/903; Y10S117/904
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
133 words
In a process for preparing a thin film semiconductor of one or more monocrystalline layers of a semiconductor material in an evacuated chamber by epitaxial growth by vapor deposition of at least one monocrystalline layer on an epitaxial substrate,the improvement comprising continuously simultaneously controlling the crystallinity and measuring the thickness of each epitaxial monocrystalline layer during the growth thereof by directing an elliptically polarized beam of light at a low angle of incidence over the surface of the epitaxial substrate where the monocrystalline layer is growing, feeding the reflected beam of light to an analyzer to detect any variation in ellipticity of the reflected beam as a function of the crystallinity and film thickness and controlling the vapor deposition in response to any detected variation until the desired crystallinity and thickness is obtained.
Claim 2
Dependent Claim
133 words
In a process for preparing a thin film semiconductor of one or more monocrystalline layers of a semiconductor material in an evacuated chamber by epitaxial growth by vapor deposition of at least one monocrystalline layer on an epitaxial substrate,the improvement comprising continuously simultaneously controlling the crystallinity and measuring the thickness of each epitaxial monocrystalline layer during the growth thereof by directing an elliptically polarized beam of light at a low angle of incidence over the surface of the epitaxial substrate where the monocrystalline layer is growing, feeding the reflected beam of light to an analyzer to detect any variation in ellipticity of the reflected beam as a function of the crystallinity and film thickness and controlling the vapor deposition in response to any detected variation until the desired crystallinity and thickness is obtained.
Claim 3
Dependent Claim
21 words
The process of claim 1 wherein a laser beam is used as the source of the elliptically polarized beam of light.
Claim 4
Dependent Claim
56 words
The process of claims 1 or 2 which further comprises the steps of cooling the epitaxial film and substrate to room temperature, depositing an amorphous layer of a dopant on a monocrystalline layer, and raising the temperature of the epitaxial film and substrate to a temperature which allows the dopant to diffuse into said monocrystalline layer.
Claim 5
Dependent Claim
38 words
The process of claim 3 wherein the amorphous layer comprises the dopant, in that amount which will provide a predetermined density of active defects, as a mixture or as an alloy with the material of the monocrystalline layer.
Claim 6
Dependent Claim
20 words
The process of claim 1 which further comprises the step of separating the thin film semiconductor from the epitaxial substrate.
Claim 7
Dependent Claim
83 words
The process of claim 1 which comprises forming a plurality of monocrystalline layers of binary or ternary semiconductor materials on the epitaxial substrate wherein the stoichiometry of the layers is gradually varied by controlling the evaporation rate and order of vaporization of the constituent elements of the semiconductor materials wherein each resulting layer has a band gap responding to a different wavelength of the electromagnetic spectrum varying from the longest wavelength at the bottom layer to the shortest wavelength at the top layer.
Claim 8
Dependent Claim
15 words
The process of claim 1 or 6 wherein the semiconductor material comprises a binary semiconductor.
Claim 9
Dependent Claim
18 words
The process of claim 7 wherein said binary semiconductor comprises gallium arsenide or gallium phosphide or mixtures thereof.
Claim 10
Dependent Claim
15 words
The process of claim 1 or 6 wherein the semiconductor material comprises a ternary semiconductor.
Claim 11
Dependent Claim
20 words
The process of claim 9 wherein the ternary semiconductor comprises gallium aluminum phosphide or gallium aluminum arsenide or mixtures thereof.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-27 | 1987-08-29 | 1988-02-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-27 | 1991-08-29 | 1992-02-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-27 | 1995-08-29 | 1996-02-28 | $7700.00 | Window Closed / Lapsed |