Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer

Claim 2

An imageable article comprising a photoresist layer coated on a substantially radiation absorbing layer of metal on a microstructured layer, both the metal layer and microstructured layer having a microstructured surface characterized by a plurality of randomly positioned discrete protuberances of varying heights and shapes, which protuberances have a height of not less than 20 nanometers nor more than 1500 nm, the average spacing between the tips of the protuberances being no more than twice the average height of the protuberances, and the bases of which contact the bases of substantially all adjacent protuberances wherein the metal is selected from chromium, aluminum, copper, gold and nickel.

Claim 3

The article according to claim 1 wherein said protuberances extend from said layer of metal a distance of not more than 800 nm and the average spacing between tips of the protuberances is no more than twice the average height of the protuberances.

Claim 4

The article of claim 1 wherein said substantially radiation absorbing surface comprises a composite surface of: (a) a replicated microstructured layer characterized by a plurality of randomly positioned discrete protuberances of varying heights and shapes, the average spacing between tips of the protuberances being no more than twice the average height of the protuberances, which protuberances have a height of not less than 20 nanometers nor more than 1500 nm, and the bases of which contact the bases of substantially all adjacent protuberances, and (b) an overcoating of a thin film of at least one metal having a thickness in the range of 40 to 200 nanometers conforming to the shape of the surface of the microstructured layer without filling in valleys between the protuberances.

Claim 5

The article of claim 3 wherein said composite surface is a selective absorbing surface.

Claim 6

The article of claim 3 wherein said replicated microstructured layer is an embossable material selected from metal, nonmetal and organic polymeric materials.

Claim 7

The article of claim 1 wherein the average spacing between the tips of the protuberances is no more than one-half the average height of the protuberances.

Claim 8

The article of claim 1 wherein the average spacing between the tips of the protuberances is in the range of from one-tenth to one-fourth the average height of the protuberances.

Claim 9

The article of claim 1 wherein said substantially radiation absorbing surface comprises a substrate having on at least one surface thereof, (a) a layer of an oxide of a metal, selected from the group consisting of aluminum, magnesium and zinc or alloys thereof, which layer is a substantially complete conversion to an oxide or oxide-hydroxide of a thin-film of said metal, the thickness of said thin-film prior to conversion being at least 5 nanometers and exhibiting a surface after said conversion characterized by a plurality of randomly positioned discrete protuberances of varying heights and shapes, which protuberances extend from said substrate surface a distance of not less than 20 nanometers nor more than 1500 nm, and the bases of which contact the bases of substantially all adjacent protuberances, and (b) an overcoating upon said oxide layer, which overcoating is a contiguous connected thin layer of at least one metal having a thickness in the range of 40 to 200 nanometers.

Claim 10

The article according to claim 8 wherein said substrate is selected from aluminum, stainless steel, glass and polyester.

Claim 11

The article according to claim 8 wherein said metal overcoating is selected from chromium, aluminum, copper, gold and nickel.

Claim 12

The article of claims 1, 2, 3 or 8 wherein said photoresist layer is a negative acting photosensitive layer comprising polymerizable materials having ethylenically unsaturated groups.

Claim 13

The article of claims 1, 2, 3 or 8 wherein said photoresist layer is a positive acting photosensitizer layer comprising positive acting diazo oxides in a polymeric binder.

Claim 14

The article of claims 1, 2, 3 or 8 wherein said photoresist layer is a negative acting photosensitive layer comprising materials having (1) polymerizable acryloyl groups, methacryloyl groups, or both acryloyl and methacryloyl groups and (2) free radical photoinitiators.