Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
233 words
A semiconductor device having a Zener diode comprising a semiconductor body having a highly doped substrate layer of a first conductivity type, a first semiconductor region of an epitaxial layer extending from said substrate layer to a surface of said body and also being of said first conductivity type, said epitaxial layer having a thickness of at least 10 μm and at most 35 μm, and a resistivity of at least 0.5 Ohm cm and at most 2 Ohm cm to provide a positive differential resistance upon breakdown, and said substrate layer having a higher doping concentration than said epitaxial layer, a second semiconductor region of a second conductivity type situated within said first semiconductor region, said second semiconductor region also adjoining said surface, a third semiconductor region of said first conductivity type disposed at a distance from said surface in said first semiconductor region and bounded by said second semiconductor region, said third semiconductor region having a higher doping concentration than said first semiconductor region, said third semiconductor region in projection being entirely situated within said second semiconductor region, said third semiconductor region containing the depletion zone at breakdown, and said second semiconductor region having a higher doping concentration than said third semiconductor region, and a p-n junction between said second semiconductor region and said first and third semiconductor regions and extending substantially parallel to said surface but terminating at said surface.
Claim 2
Dependent Claim
233 words
A semiconductor device having a Zener diode comprising a semiconductor body having a highly doped substrate layer of a first conductivity type, a first semiconductor region of an epitaxial layer extending from said substrate layer to a surface of said body and also being of said first conductivity type, said epitaxial layer having a thickness of at least 10 μm and at most 35 μm, and a resistivity of at least 0.5 Ohm cm and at most 2 Ohm cm to provide a positive differential resistance upon breakdown, and said substrate layer having a higher doping concentration than said epitaxial layer, a second semiconductor region of a second conductivity type situated within said first semiconductor region, said second semiconductor region also adjoining said surface, a third semiconductor region of said first conductivity type disposed at a distance from said surface in said first semiconductor region and bounded by said second semiconductor region, said third semiconductor region having a higher doping concentration than said first semiconductor region, said third semiconductor region in projection being entirely situated within said second semiconductor region, said third semiconductor region containing the depletion zone at breakdown, and said second semiconductor region having a higher doping concentration than said third semiconductor region, and a p-n junction between said second semiconductor region and said first and third semiconductor regions and extending substantially parallel to said surface but terminating at said surface.
Claim 3
Dependent Claim
27 words
A semiconductor device according to claim 1, wherein said third semiconductor region is surrounded by said first semiconductor region and is covered by said second semiconductor region.
Claim 4
Dependent Claim
27 words
A semiconductor device according to claim 2, wherein said third semiconductor region extends through said first semiconductor region from said second semiconductor region to said substrate layer.
Claim 5
Dependent Claim
20 words
A semiconductor device according to claim 3, wherein said substrate layer has a resistivity of at most 0.012 Ohm cm.
Claim 6
Dependent Claim
24 words
A semiconductor device according to claim 2, wherein said third semiconductor region is bounded entirely by sid epitaxial layer and said second semiconductor region.
Claim 7
Dependent Claim
20 words
A semiconductor device according to claim 2, wherein said substrate layer has a resistivity of at most 0.012 Ohm cm.
Claim 8
Dependent Claim
27 words
A semiconductor device according to claim 1, wherein said third semiconductor region extends through said first semiconductor region from said second semiconductor region to said substrate layer.
Claim 9
Dependent Claim
20 words
A semiconductor device according to claim 7, wherein said substrate layer has a resistivity of at most 0.012 Ohm cm.
Claim 10
Dependent Claim
24 words
A semiconductor device according to claim 1, wherein said third semiconductor region is bounded entirely by said epitaxial layer and said second semiconductor region.
Claim 11
Dependent Claim
20 words
A semiconductor device according to claim 1, wherein said substrate layer has a resistivity of at most 0.012 Ohm cm.