US4409686A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of serialization of dice
Assignee: Intersil Corp
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Filing: 1980-06-16
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Granted: 1983-10-11
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Expires: 2000-06-16
Abstract
Abstract The dice of a wafer are serialized using a wafer mask formed by stepping and repeating a chip pattern with a blank area in rows and columns on the wafer and forming distinctive location identifying indicia in the blank area on each chip using a pattern generator and stepping to each blank area on each chip.
Inventors
- 👤 Kenneth A. Ports
- 👤 Justin E. Harlow
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 12:04
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70491; G03F7/70541; H; H10; H10W; H10W46/00; H10W46/601; H10W46/603
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
82 words
A method of preparing a mask for serialization of chips on a wafer comprising: initially forming a plurality of identical chip patterns on a mask by stepping and repeating a single chip pattern onto said mask in rows and columns, said single chip pattern having a blank area in said pattern; and secondly forming location identifying indicia in the resulting blank areas of each chip pattern on the mask by stepping to each blank area after the formation of said chip patterns.
Claim 2
Independent Claim
82 words
A method of preparing a mask for serialization of chips on a wafer comprising: initially forming a plurality of identical chip patterns on a mask by stepping and repeating a single chip pattern onto said mask in rows and columns, said single chip pattern having a blank area in said pattern; and secondly forming location identifying indicia in the resulting blank areas of each chip pattern on the mask by stepping to each blank area after the formation of said chip patterns.
Claim 3
Dependent Claim
39 words
The method according to claim 1 including the step of forming a reticle of the chip pattern and using said reticle in a mask making machine in a step and repeat mode to form said plurality of chip patterns.
Claim 4
Dependent Claim
42 words
The method according to claim 2 wherein said location identifying indicia is formed by controlling said mask making machine in a pattern generation mode to produce a plurality of distinctive indicia as the machine steps to each blank area at each location.
Claim 5
Dependent Claim
18 words
The method according to claim 3 including forming a pattern generation control tape for the plurality of indicia.
Claim 6
Dependent Claim
24 words
The method according to claim 1 wherein said location identifying indicia is identical for all the chips in a given quadrant of the wafer.
Claim 7
Dependent Claim
20 words
The method according to claim 1 wherein said location identifying indicia is distinctive for each chip indicating row and column.
Claim 8
Dependent Claim
43 words
The method according to claim 1 wherein said location identifying indicia is formed by controlling a mask making machine in a pattern generation mode to produce a plurality of distinctive indicia as the machine steps to each blank area of each chip location.
Claim 9
Independent Claim
108 words
A method of preparing a mask for serialization of chips on a wafer comprising: inserting a mask master into a mask making machine capable of both step and repeat and pattern generation modes of operation sequentially; initially controlling said machine in a step and repeat mode to form a plurality of identical chip patterns on said mask by stepping and repeating a chip reticle, having a blank area, in rows and columns; and secondly controlling said machine in a pattern generation mode to form location identifying indicia in the blank area of the mask for each chip formed from said chip reticle by stepping to each blank area.
Claim 10
Independent Claim
108 words
A method of preparing a mask for serialization of chips on a wafer comprising: inserting a mask master into a mask making machine capable of both step and repeat and pattern generation modes of operation sequentially; initially controlling said machine in a step and repeat mode to form a plurality of identical chip patterns on said mask by stepping and repeating a chip reticle, having a blank area, in rows and columns; and secondly controlling said machine in a pattern generation mode to form location identifying indicia in the blank area of the mask for each chip formed from said chip reticle by stepping to each blank area.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-10-10 | 1987-04-11 | 1987-10-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-10-10 | 1991-04-11 | 1991-10-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-10-10 | 1995-04-11 | 1995-10-11 | $7700.00 | Window Closed / Lapsed |