Alignment marks for electron beam lithography

Claim 3

A method as in claim 1 wherein said alignment marks are formed on the surface of said wafer in said regions by co-sputter-depositing tantalum and silicon thereon, followed by a dry etching step.

Claim 4

A method as in claim 2 wherein said etching step comprises plasma etching in a mixture of carbon tetrafluoride and oxygen.

Claim 5

A method as in claim 2 wherein said etching step comprises reactive ion etching in a plasma that comprises fluorine and chlorine as the predominant etching species for tantalum and silicon, respectively.

Claim 7

A method as in claim 5 wherein said protective layer is made of silicon nitride.

Claim 8

A method as in claim 6 wherein said regions constitute openings in a silicon dioxide layer formed on the surface of a silicon wafer.

Claim 9

A method as in claim 7 further comprising the step of developing said irradiated resist layer to remove portions thereof and removing any corresponding portions of said resist structure thereby to uncover corresponding portions of said silicon dioxide layer, removing the corresponding portions of the silicon dioxide layer thereby to uncover corresponding portions of the surface of said silicon wafer, and processing the corresponding uncovered portions of said wafer in accordance with a prescribed fabrication sequence to define features of said integrated circuits.

Claim 10

In a direct-writing electron beam exposure fabrication sequence for making VLSI MOS devices in a semiconductor wafer, a method for aligning the beam with respect to the wafer, said method comprising the steps of depositing a layer of tantalum disilicide on said wafer, patterning said layer to form tantalum disilicide alignment marks in spaced-apart regions on said wafer, depositing a resist structure including at least a layer of electron-sensitive resist on said wafer overlying said marks, scanning a portion of each of said regions with said beam to cause electrons to be backscattered from the marks and from adjacent areas of the wafer surface, detecting said backscattered electrons and, in response thereto, generating electrical control signals, and, utilizing said signals, aligning said beam with respect to said marks prior to selectively irradiating the resist layer with said electron beam to define features of said VLSI MOS devices.

Claim 11

In a direct-writing electron beam exposure fabrication sequence for making VLSI MOS devices in a semiconductor wafer, a method for aligning the beam with respect to the wafer, said method comprising the steps of depositing a layer of tantalum disilicide on said wafer, patterning said layer to form tantalum disilicide alignment marks in spaced-apart regions on said wafer, depositing a resist structure including at least a layer of electron-sensitive resist on said wafer overlying said marks, scanning a portion of each of said regions with said beam to cause electrons to be backscattered from the marks and from adjacent areas of the wafer surface, detecting said backscattered electrons and, in response thereto, generating electrical control signals, and, utilizing said signals, aligning said beam with respect to said marks prior to selectively irradiating the resist layer with said electron beam to define features of said VLSI MOS devices.

Claim 12

A method as in claim 9 wherein said tantalum disilicide layer is formed in a co-sputter-deposition step.

Claim 13

A method as in claim 10 wherein said tantalum disilicide layer is sintered prior to being patterned in a plasma etching step.

Claim 14

A method as in claim 10 wherein said tantalum disilicide layer is patterned in a reactive ion etching step and then sintered.