US4402935A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Moisturizing nail polish composition
Assignee: Coty US LLC
•
Filing: 1982-04-19
•
Granted: 1983-09-06
•
Expires: 2002-04-19
Abstract
Abstract An improved nail polish composition for application to human nails which allows a polished nail to retain and absorb moisture thereby preventing brittleness and breakage of polished nails. Water and urea are used in the composition to impart moisture to the polished nail and polyvinyl butyral resin is used to harden the nail polish composition which is softened by the addition of water and to increase the adhesion of the nail polish composition to the nail.
Inventors
- 👤 Harry W. Gordon
- 👤 Herbert R. Farrell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 18:23
CPC Classifications
A; A61; A61K; A61K8/00; A61K8/18; A61K8/72; A61K8/73; A61K8/731; A61K8/81; A61K8/8129; A61K8/84; A61Q; A61Q3/00; A61Q3/02; A61K2800/00; A61K2800/40; A61K2800/59; A61K2800/594
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
83 words
An improved nail polish composition for application to human nails, the composition consisting essentially of a conventional nail polish composition containing: ______________________________________
Quantity by Weight
in %'s of the con-
ventional nail
Ingredient polish composition
______________________________________
Ethyl acetate 36.7%
Isopropyl alcohol 24.2%
Butyl acetate
(solvent system)
9.9%
Butyl alcohol 1.4%
Toluene 7.4%
Toluene sulfonamide/formaldehyde
resin (hardener) 14.4%
Camphor 0.9%
(plasticizers)
Dibutyl phthalate 1.2%
Nitrocellulose (film former)
3.6%
to which is added an improvement containing:
Water 6%
Urea 0.1%
Polyvinyl butyral resin
2.2%
______________________________________
Claim 2
Dependent Claim
83 words
An improved nail polish composition for application to human nails, the composition consisting essentially of a conventional nail polish composition containing: ______________________________________
Quantity by Weight
in %'s of the con-
ventional nail
Ingredient polish composition
______________________________________
Ethyl acetate 36.7%
Isopropyl alcohol 24.2%
Butyl acetate
(solvent system)
9.9%
Butyl alcohol 1.4%
Toluene 7.4%
Toluene sulfonamide/formaldehyde
resin (hardener) 14.4%
Camphor 0.9%
(plasticizers)
Dibutyl phthalate 1.2%
Nitrocellulose (film former)
3.6%
to which is added an improvement containing:
Water 6%
Urea 0.1%
Polyvinyl butyral resin
2.2%
______________________________________
Claim 3
Dependent Claim
138 words
An improved liquid nail polish composition for application to human nails constituting a conventional liquid nail polish of the type essentially including 2-15 percent nitrocellulose, a plasticizer, including 0.5-8 percent camphor and 0.5-8 percent dibutyl phthalate, a hardener constituting 5-20 percent toluene sulfonamide/formaldehyde resin, and a solvent system including 20-40 percent ethyl acetate, 15-30 percent isopropyl alcohol, 3-25 percent butyl acetate, 0.5-10 percent butyl alcohol and 2-30 percent toluene, all the percentages being by weight of the conventional nail polish, said conventional nail polish having admixed therewith a moisturizing composition essentially consisting of: (a) 1-3 percent polyvinyl butyral resin; (b) 3-10 percent water; and (c) 0.02-0.5 percent urea, the percentages of the moisturizing composition being percentages by weight of the improved liquid nail polish composition, whereby the improved liquid nail polish composition supplies moisture to a polished nail.
Claim 4
Dependent Claim
138 words
An improved liquid nail polish composition for application to human nails constituting a conventional liquid nail polish of the type essentially including 2-15 percent nitrocellulose, a plasticizer, including 0.5-8 percent camphor and 0.5-8 percent dibutyl phthalate, a hardener constituting 5-20 percent toluene sulfonamide/formaldehyde resin, and a solvent system including 20-40 percent ethyl acetate, 15-30 percent isopropyl alcohol, 3-25 percent butyl acetate, 0.5-10 percent butyl alcohol and 2-30 percent toluene, all the percentages being by weight of the conventional nail polish, said conventional nail polish having admixed therewith a moisturizing composition essentially consisting of: (a) 1-3 percent polyvinyl butyral resin; (b) 3-10 percent water; and (c) 0.02-0.5 percent urea, the percentages of the moisturizing composition being percentages by weight of the improved liquid nail polish composition, whereby the improved liquid nail polish composition supplies moisture to a polished nail.
Claim 5
Dependent Claim
29 words
The improved nail polish composition of claim 2, wherein the water is present in an amount of about 6 percent by weight of the improved liquid nail polish composition.
Claim 6
Dependent Claim
26 words
The improved nail polish composition of claim 2, wherein urea is present in an amount of about 0.1 percent of the improved liquid nail polish composition.
Claim 7
Dependent Claim
31 words
The improved nail polish composition of claim 2, wherein the polyvinyl butyral resin is present in an amount of about 2.2 percent by weight of the improved liquid nail polish composition.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-09-05 | 1987-03-07 | 1987-09-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-09-05 | 1991-03-07 | 1991-09-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-09-05 | 1995-03-07 | 1995-09-06 | $7700.00 | Window Closed / Lapsed |