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US4402571A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for producing a surface relief pattern

Assignee: FIBER CRETE INTERNATIONAL Inc
•
Filing: 1981-02-17
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Granted: 1983-09-06
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Expires: 2001-02-17
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Abstract

Abstract Surface relief patterns of predetermined configuration are fabricated by a process which involves exposing a photosensitive material at a first position to a laser interference pattern, rotating said material about an axis perpendicular to its surface to a second position, exposing said material at said second position to a laser interference pattern, wherein at least one and preferably both of said exposures is individually below the effective threshold for linear response of said material, the points of intersection of the two fringe patterns being exposed above said threshold as a result of the combined exposures, and developing said material. The method provides a facile technique for the manufacture of surface relief patterns and is particularly useful when the pattern is of submicrometer size and difficult to manufacture by mechanical means.

Inventors

  • 👤 James J. Cowan
  • 👤 Arthur M. Gerber
  • 👤 Warren D. Slafer

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 18:43
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70408; G02; G02B; G02B5/00; G02B5/18; G02B5/1847; G02B5/1857; G03F7/0005; G03F7/001; G03F7/20; G03F7/2002; G03F7/2004; G03F7/2006; Y; Y10; Y10S; Y10S359/00; Y10S359/90

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 112 words
A method of producing a surface relief pattern of predetermined configuration in a photosensitive material which comprises exposing said photosensitive material at a first position to a laser interference pattern, exposing said material at a second position to a laser interference pattern, said second position being a rotation of said photosensitive material or of said laser interference pattern about an axis perpendicular to said material's surface from said first positions, wherein at least one of said exposures is below the effective threshold for linear response of said material, the points of intersection of the two patterns being exposed above said threshold as a result of the combined exposures, and developing said material.
Claim 2
Independent Claim 112 words
A method of producing a surface relief pattern of predetermined configuration in a photosensitive material which comprises exposing said photosensitive material at a first position to a laser interference pattern, exposing said material at a second position to a laser interference pattern, said second position being a rotation of said photosensitive material or of said laser interference pattern about an axis perpendicular to said material's surface from said first positions, wherein at least one of said exposures is below the effective threshold for linear response of said material, the points of intersection of the two patterns being exposed above said threshold as a result of the combined exposures, and developing said material.
Claim 3
Dependent Claim 18 words
The method of claim 1, wherein each of said exposures are individually below said threshold of said material.
Claim 4
Dependent Claim 34 words
The method of claim 2, wherein said material is developed by contacting said photosensitive material with an etchant and the time of contact therewith is regulated so as to achieve the desired predetermined configuration.
Claim 5
Dependent Claim 18 words
The method of claim 3 wherein said contact with etchant is effected so as to obtain small holes.
Claim 6
Dependent Claim 18 words
The method of claim 3 wherein said contact with an etchant is effected so as to obtain spires.
Claim 7
Dependent Claim 19 words
The method of claim 1, wherein said photosensitive material is rotated from said first position to said second position.
Claim 8
Dependent Claim 19 words
The method of claim 6 wherein said first and second positions are at substantially right angles to each other.
Claim 9
Dependent Claim 59 words
The method of claim 7 wherein said photosensitive material is given a substantially uniform overall exposure with light to which it is sensitive in an amount below said threshold for linear response of said material before said photosensitive material is exposed to said laser interference pattern in said first position whereby a sinusoidal relief profile is obtained after development.
Claim 10
Dependent Claim 27 words
The method of claim 7 wherein said photoresist is only exposed to said laser interference patterns whereby a substantially square wave relief profile is obtained after development.
Claim 11
Dependent Claim 21 words
The method of claim 9 wherein said exposure in said first position is longer than said exposure in said second position.
Claim 12
Dependent Claim 23 words
The method of claim 10 wherein said contact with an etchant is effected so as to obtain small holes interconnected by flat areas.
Claim 13
Dependent Claim 24 words
The method of claim 11 wherein said contact with an etchant is effected so as to obtain a relief pattern of flat topped pedestals.
Claim 14
Dependent Claim 19 words
The method of claim 7 wherein said exposures are effected so as to generate reflection waves during said exposures.
Claim 15
Dependent Claim 24 words
The method of claim 13 wherein said photosensitive material is carried on a light transmitting substrate and said exposures are made through said substrate.
Claim 16
Dependent Claim 13 words
The method of claim 1, wherein said photosensitive material is a positive photoresist.
Claim 17
Dependent Claim 18 words
The method of claim 1 wherein said photosensitive material is pre-baked prior to exposure in said first position.
Claim 18
Dependent Claim 25 words
The method of claim 1, 15, 3, 4, 11, 13 or 14, wherein each of said interference patterns has at least 1000 lines per millimeter.

References Cited (Backward Citations)

US3815969A Cited
US3957354A Cited
US4044939A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-09-05 1987-03-07 1987-09-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-09-05 1991-03-07 1991-09-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-09-05 1995-03-07 1995-09-06 $7700.00 Window Closed / Lapsed

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