Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
112 words
A method of producing a surface relief pattern of predetermined configuration in a photosensitive material which comprises exposing said photosensitive material at a first position to a laser interference pattern, exposing said material at a second position to a laser interference pattern, said second position being a rotation of said photosensitive material or of said laser interference pattern about an axis perpendicular to said material's surface from said first positions, wherein at least one of said exposures is below the effective threshold for linear response of said material, the points of intersection of the two patterns being exposed above said threshold as a result of the combined exposures, and developing said material.
Claim 2
Independent Claim
112 words
A method of producing a surface relief pattern of predetermined configuration in a photosensitive material which comprises exposing said photosensitive material at a first position to a laser interference pattern, exposing said material at a second position to a laser interference pattern, said second position being a rotation of said photosensitive material or of said laser interference pattern about an axis perpendicular to said material's surface from said first positions, wherein at least one of said exposures is below the effective threshold for linear response of said material, the points of intersection of the two patterns being exposed above said threshold as a result of the combined exposures, and developing said material.
Claim 3
Dependent Claim
18 words
The method of claim 1, wherein each of said exposures are individually below said threshold of said material.
Claim 4
Dependent Claim
34 words
The method of claim 2, wherein said material is developed by contacting said photosensitive material with an etchant and the time of contact therewith is regulated so as to achieve the desired predetermined configuration.
Claim 5
Dependent Claim
18 words
The method of claim 3 wherein said contact with etchant is effected so as to obtain small holes.
Claim 6
Dependent Claim
18 words
The method of claim 3 wherein said contact with an etchant is effected so as to obtain spires.
Claim 7
Dependent Claim
19 words
The method of claim 1, wherein said photosensitive material is rotated from said first position to said second position.
Claim 8
Dependent Claim
19 words
The method of claim 6 wherein said first and second positions are at substantially right angles to each other.
Claim 9
Dependent Claim
59 words
The method of claim 7 wherein said photosensitive material is given a substantially uniform overall exposure with light to which it is sensitive in an amount below said threshold for linear response of said material before said photosensitive material is exposed to said laser interference pattern in said first position whereby a sinusoidal relief profile is obtained after development.
Claim 10
Dependent Claim
27 words
The method of claim 7 wherein said photoresist is only exposed to said laser interference patterns whereby a substantially square wave relief profile is obtained after development.
Claim 11
Dependent Claim
21 words
The method of claim 9 wherein said exposure in said first position is longer than said exposure in said second position.
Claim 12
Dependent Claim
23 words
The method of claim 10 wherein said contact with an etchant is effected so as to obtain small holes interconnected by flat areas.
Claim 13
Dependent Claim
24 words
The method of claim 11 wherein said contact with an etchant is effected so as to obtain a relief pattern of flat topped pedestals.
Claim 14
Dependent Claim
19 words
The method of claim 7 wherein said exposures are effected so as to generate reflection waves during said exposures.
Claim 15
Dependent Claim
24 words
The method of claim 13 wherein said photosensitive material is carried on a light transmitting substrate and said exposures are made through said substrate.
Claim 16
Dependent Claim
13 words
The method of claim 1, wherein said photosensitive material is a positive photoresist.
Claim 17
Dependent Claim
18 words
The method of claim 1 wherein said photosensitive material is pre-baked prior to exposure in said first position.
Claim 18
Dependent Claim
25 words
The method of claim 1, 15, 3, 4, 11, 13 or 14, wherein each of said interference patterns has at least 1000 lines per millimeter.