US4397078A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits
Assignee: TELMEC CO Ltd
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Filing: 1981-08-03
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Granted: 1983-08-09
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Expires: 2001-08-03
Abstract
Abstract On a mask to be used in fabrication of semiconductor integrated circuits is formed an electrode outside of an integrated circuit pattern area with the same material as said pattern area in the same thickness as said pattern area, this mask is positioned above a wafer as separated therefrom at a minute gap distance, and the gap distance between the mask and the wafer is measured by detecting an electrostatic capacitance between the electrode and the wafer.
Inventors
- 👤 Issei Imahashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 19:54
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7049; G03F9/7053; G03F9/7003; G03F9/7023; G03F9/703; H; H10; H10P; H10P95/00; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/943; Y10S438/975
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
76 words
A method for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits, characterized by the steps of forming an electrode on a mask having a pattern of a semiconductor integrated circuit, positioning said mask as spaced from a wafer at a certain gap distance, and measuring said gap distance between said mask and said wafer by detecting an electrostatic capacitance between said electrode and said wafer.
Claim 2
Independent Claim
76 words
A method for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits, characterized by the steps of forming an electrode on a mask having a pattern of a semiconductor integrated circuit, positioning said mask as spaced from a wafer at a certain gap distance, and measuring said gap distance between said mask and said wafer by detecting an electrostatic capacitance between said electrode and said wafer.
Claim 3
Independent Claim
84 words
An apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits; characterized in that said apparatus comprises a mask consisting of a substrate and a pattern area for a semiconductor integrated circuit and an electrode formed on the outer surface of said substrate; a holder for holding said mask; a chuck for holding said wafer; and an electrostatic capacitance measuring device electrically connected between said electrode formed on said mask and said wafer.
Claim 4
Independent Claim
84 words
An apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits; characterized in that said apparatus comprises a mask consisting of a substrate and a pattern area for a semiconductor integrated circuit and an electrode formed on the outer surface of said substrate; a holder for holding said mask; a chuck for holding said wafer; and an electrostatic capacitance measuring device electrically connected between said electrode formed on said mask and said wafer.
Claim 5
Dependent Claim
96 words
A pattern printing apparatus provided with means for measuring a gap distance between a mask and wafer to be used in fabrication of semiconductor integrated circuits; characterized in that said apparatus comprises a mask consisting of a substrate and a pattern area for a semiconductor integrated circuit and an electrode formed on the outer surface of said substrate; a holder for holding said mask; a chuck for holding said wafer; a source of light or X-rays for photo-printing; and an electrostatic capacitance measuring device electrically connected between said electrode formed on said mask and said wafer.
Claim 6
Dependent Claim
96 words
A pattern printing apparatus provided with means for measuring a gap distance between a mask and wafer to be used in fabrication of semiconductor integrated circuits; characterized in that said apparatus comprises a mask consisting of a substrate and a pattern area for a semiconductor integrated circuit and an electrode formed on the outer surface of said substrate; a holder for holding said mask; a chuck for holding said wafer; a source of light or X-rays for photo-printing; and an electrostatic capacitance measuring device electrically connected between said electrode formed on said mask and said wafer.
Claim 7
Dependent Claim
48 words
An apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits as claimed in claim 2, further characterized in that said electrode is made of the same material as said pattern area for a semiconductor integrated circuit.
Claim 8
Dependent Claim
48 words
An apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits as claimed in claim 2, further characterized in that said electrode is formed in the same thickness as said pattern area for a semiconductor integrated circuit.
Claim 9
Dependent Claim
60 words
An apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits as claimed in claim 2, further characterized in that said holder includes a contact member adapted to electrically connect said electrode formed on said mask to said electrostatic capacitance measuring device upon holding said mask on said holder.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-08-08 | 1987-02-07 | 1987-08-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-08-08 | 1991-02-07 | 1991-08-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-08-08 | 1995-02-07 | 1995-08-09 | $7700.00 | Window Closed / Lapsed |