US4394438A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing an optically readable information carrier using deep U.V. radiation
Assignee: US Philips Corp
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Filing: 1981-08-10
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Granted: 1983-07-19
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Expires: 2001-08-10
Abstract
Abstract A method of manufacturing an optically readable information carrier in which a substrate 1 which is provided on at least one surface with a material which is sensitive to deep ultraviolet light having a wavelength from 190-300 nm, is exposed to deep ultraviolet light via a contact mask 2 which on one side has a layer 4 of a material which is not permeable to deep ultraviolet light in which an information track 5, 6 has been provided, after which the exposed plate is developed and if desired is provided with a reflection layer.
Inventors
- 👤 Pieter van Pelt
- 👤 Gerardus J. M. Lippits
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 15:42
CPC Classifications
G; G11; G11B; G11B7/00; G11B7/24; G11B7/26; G11B7/261; G03; G03F; G03F7/00; G03F7/0005; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
177 words
A method of manufacturing an optically readable information carrier in which a substrate plate is provided on one side or on both sides with an optical structure which structure comprises an information track of information areas situated alternatively at a higher and a lower level, characterized in that a substrate plate which is manufactured entirely from polymethylmethacrylate is exposed, according to a lithographic process, to deep ultraviolet light through a mask which is brought into contact with a surface of said substrate plate, said mask comprising a supporting plate which is transparent to deep ultraviolet light, said supporting plate being provided on the side facing the substrate with a layer of material impermeable to deep ultraviolet light, in which layer a pattern is provided corresponding to the optical structure to be provided in the substrate plate and the substrate plate thus exposed through said mask is then treated with a developer capable of disolving the exposed parts of said polymethylmethacrylate thereby dissolving the exposed parts of said polymethylmethylacrylate and forming an information track on said substrate plate.
Claim 2
Independent Claim
177 words
A method of manufacturing an optically readable information carrier in which a substrate plate is provided on one side or on both sides with an optical structure which structure comprises an information track of information areas situated alternatively at a higher and a lower level, characterized in that a substrate plate which is manufactured entirely from polymethylmethacrylate is exposed, according to a lithographic process, to deep ultraviolet light through a mask which is brought into contact with a surface of said substrate plate, said mask comprising a supporting plate which is transparent to deep ultraviolet light, said supporting plate being provided on the side facing the substrate with a layer of material impermeable to deep ultraviolet light, in which layer a pattern is provided corresponding to the optical structure to be provided in the substrate plate and the substrate plate thus exposed through said mask is then treated with a developer capable of disolving the exposed parts of said polymethylmethacrylate thereby dissolving the exposed parts of said polymethylmethylacrylate and forming an information track on said substrate plate.
Claim 3
Dependent Claim
43 words
A method as claimed in claim 1, characterized in that a mask is used which comprises a supporting plate manufactured from quartz which is provided on one side with a layer of metal or metal oxide in which the pattern has been etched.
Claim 4
Dependent Claim
136 words
A method as claimed in claim 1, characterized in that a mask is provided on one or both surfaces of a substrate plate manufactured from polymethylmethacrylate, said mask comprising a supporting plate of quartz and a layer of metal or metal-oxide provided on the side of the substrate plate in which layer a pattern has been etched, the substrate plate is exposed via the mask for 1-15 minutes to deep ultraviolet light having a wavelength from 200-240 nm originating from a gas discharge lamp having a metal vapour plasma and a light intensity from 150-1500 mJ/cm 2 on the substrate plate, the mask is removed and the exposed substrate plate is treated for at most a few minutes with a developer which comprises a mixture of methylisobutylketone and isopropanol or a mixture of isopropanol and water.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-07-18 | 1987-01-17 | 1987-07-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-07-18 | 1991-01-17 | 1991-07-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-07-18 | 1995-01-17 | 1995-07-19 | $7700.00 | Window Closed / Lapsed |