Projection optical lithography apparatus

Claim 1

An optical system for exposing and developing a printed circuit photoresist layer having a thickness of approximately one micron, comprising a light source and a condenser lens and an objective lens and a substrate arranged in series along an optical axis, said substrate having a surface covered by said photoresist layer, said layer having an index of refraction n R , a planar mask disposed transversely of said axis between said lenses, said mask having an image adapted to be optically projected by said light source onto said photoresist layer of the substrate, a transparent gate adjacent to the side of said layer opposite from the substrate, said gate comprising an optical window aligned with said axis and a liquid engaging said side of the layer and having an index of refraction n L closer to n R than the index of refraction of air and being characterized by the capability of photographically developing said photoresist layer upon exposure of the latter to said light source, said liquid being retained by said window, a beamsplitter comprising a partially-transmissive partially-reflective mirror disposed on said optical axis between said mask and said objective lens whereby a portion of the light from said source reflected from said substrate passes through said beamsplitter, a viewing device aligned with said optical axis and having an image viewing plane optically coplaner with the plane of the said mask, and said viewing device being positioned to receive the reflected light passing through said beamsplitter, said image viewing plane being optically spaced from said substrate by a distance equal to the optical spacing between said substrate and said mask.