US4376137A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating a bi-level magnetic bubble propagation circuit
Assignee: Boeing North American Inc
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Filing: 1981-03-09
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Granted: 1983-03-08
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Expires: 2001-03-09
Abstract
Abstract A bi-level magnetic bubble domain propagation structure in which the domain guide structure is formed by a spatially periodic pattern of permalloy implemented on two discrete levels separated by a substantially vertical gap. The structure forms a complementary pattern of contiguous disks, and the complementary image of such disks.
Inventors
- 👤 Isoris S. Gergis
- 👤 Wai-Tak P. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 06:54
CPC Classifications
H; H01; H01F; H01F41/00; H01F41/32; H01F41/34
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
142 words
A method of fabricating a magnetic bubble domain propagation structure comprising the steps of: providing on a body a magnetic garnet layer in which magnetic bubble domains can be propagated; depositing a first layer of dielectric material on said magnetic garnet layer; depositing a layer of photoresist on said first layer of dielectric material; selectively removing portions of said layer of photoresist to form a first pattern of photoresist on said dielectric layer; depositing a second layer of dielectric material on the pattern of photoresist and the exposed first layer of dielectric material; selectively removing portions of said second layer of dielectric material and said layer of photoresist so that the edge of the pattern of said first layer is aligned with edge of second layer; and depositing a single layer of permalloy over said first and second layers of dielectric material.
Claim 2
Independent Claim
142 words
A method of fabricating a magnetic bubble domain propagation structure comprising the steps of: providing on a body a magnetic garnet layer in which magnetic bubble domains can be propagated; depositing a first layer of dielectric material on said magnetic garnet layer; depositing a layer of photoresist on said first layer of dielectric material; selectively removing portions of said layer of photoresist to form a first pattern of photoresist on said dielectric layer; depositing a second layer of dielectric material on the pattern of photoresist and the exposed first layer of dielectric material; selectively removing portions of said second layer of dielectric material and said layer of photoresist so that the edge of the pattern of said first layer is aligned with edge of second layer; and depositing a single layer of permalloy over said first and second layers of dielectric material.
Claim 3
Dependent Claim
28 words
A method of fabricating a structure as defined in claim 1, wherein said steps of depositing a layer of dielectric material comprises depositing a layer of silicon dioxide.
Claim 4
Dependent Claim
28 words
A method of fabricating a structure as defined in claim 1, wherein said step of selectively removing said layer of dielectric material forms a pattern of contiguous disks.
Claim 5
Dependent Claim
32 words
A method of fabricating a structure as defined in claim 1, wherein said step of selectively removing said layer of dielectric material forms a pattern of a linear strip with trapezoidal indentations.
References Cited (Backward Citations)
US3988722A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-03-07 | 1986-09-06 | 1987-03-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-03-07 | 1990-09-06 | 1991-03-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-03-07 | 1994-09-06 | 1995-03-08 | $7700.00 | Window Closed / Lapsed |